Method of producing electrooptical device and method of producing driving substrate for driving electrooptical device

ABSTRACT

A single-crystal silicon layer is formed by graphoepitaxy from a low-melting-point metal layer which contains dissolved polycrystalline or amorphous silicon, or from a melt of a silicon-containing low-melting-point metal, using step differences formed on a substrate as a seed for the epitaxial growth. This single-crystal silicon layer is used as dual-gate MOSTFTS, or bottom-gate MOSTFTS, of an electrooptical device such as an LCD integrating a display section and a peripheral-driving-circuit section. This process enables production of a uniform single-crystal silicon thin-film having high electron/hole mobility at a relatively low temperature. The display section includes LDD-nMOSTFTs or pMOSTFTs having high switching characteristics and a low leakage current. The peripheral-driving-circuit section includes cMOSTFTs, nMOSTFTs, pMOSTFTs, or a combination thereof, having high driving ability.

BACKGROUND OF THE INVENTION

The present invention relates to a method of producing an electroopticaldevice and also to a method of producing a driving substrate for such anelectrooptical device, the method being particularly suitable forproduction of, for example, a liquid crystal display device having anactive region and a passive region, wherein the active region includinga thin-film insulating-gate field-effect transistor of dual-gate type(hereinafter referred to as dual-gate MOSTFT)or of a bottom-gate type(hereinafter referred to as bottom-gate MOSTFT) using a single-crystalsilicon layer grown by graphoepitaxy on an insulating substrate. Thebottom-gate MOSTFT includes both an inverse-stagger NSI type and aninverse stagger ISI type MOSTFTS.

Various types of active-matrix liquid crystal displays are known: forexample, a liquid crystal display having a display section usingamorphous silicon for TFTS and an IC for an external driving circuit; aliquid crystal display integrating a driving circuit and a displaysection using solid-phase-deposited polycrystalline silicon for TFTS, asdisclosed in Japanese Patent Application Laid-Open No. 6-242433); and aliquid crystal display device integrating a driving circuit and adisplay section using excimer laser annealing polycrystalline siliconTFTs, as disclosed in Japanese Patent Application Laid-Open No.7-131030.

Although these known amorphous silicon TFTs have high productivity, theyare not suitable for production of p-channel MOSTFTs (hereinafterreferred to as pMOSTFTs) due to a low electron mobility of 0.5 to 1.0cm²/v·sec. Since a peripheral driving section using pMOSTFTs and adisplay section cannot be formed on the same substrate, the driver ICmust be an external component, which is mounted by, for example, a tapeautomated bonding (TAB) method, causing an impediment to reduction ofthe cost. This configuration inhibits production of high-resolutiondevices. Furthermore, the electron mobility as small as 0.5 to 1.0cm²/v·sec can produce only a small ON current; hence, the size of thetransistors in the display section is inevitably large, resulting in asmall aperture ratio of pixels.

Conventional polycrystalline silicon TFTs have an electron mobility of70 to 100 cm²/v·sec and can facilitate production of high-resolutiondevices, so that liquid crystal displays (LCDS) which usepolycrystalline silicon and which are integrated with driving circuitsare becoming conspicuous. The above electron mobility, however, isinsufficient for driving a large LCD of 15 inches or more, and thus ICsfor an external driving circuit are still required.

TFTs using polycrystalline silicon formed by a solid-phase depositionprocess require annealing at a temperature of 600° C. or more for ten ormore hours and thermal oxidation at approximately 1,000° C. to form agate SiO₂ layer, necessitating the use of a semiconductor productionapparatus. Thus, the wafer size is limited to 8 to 12 inches and the useof expensive heat-resistant quartz glass is inevitable, causing animpediment to reduction in the cost. Thus, the use of such TFTs islimited to EVF and audiovisual (AV) projectors.

Polycrystalline silicon TFTs produced by excimer laser annealing havemany problems, including unstable output of the excimer lasers, lowproductivity, increasing price of the apparatus with increasing size,low yield and low quality.

These problems are pronounced when large glass substrates having a sidelength of, for example, 1 meter are used.

SUMMARY OF THE INVENTION

It is an object of the present invention is to make it possible toproduce an active matrix substrate incorporating a high-performancedriver, as well as an electrooptical device which is typically a displaythin-film semiconductor device using such an active matrix substrate,through a uniform deposition of a single-crystal silicon layer havinghigh electron/hole mobility particularly in a peripheral-driving-circuitsection.

It is also an object of the present invention to implement a structurein which a display section and a peripheral-driving-circuit portion areintegrated, wherein the display section comprises an n-channel MOSTFT(referred to as “nMOSTFT”, hereinafter) or a pMOSTFT employing an LDD(Lightly Doped Drain) structure having high switching characteristic andoperable with reduced leak current, or a complementary insulating gatefield effect transistor (referred to as cMOSTFT) having high drivingperformance, while the peripheral-driving-circuit is constituted by acMOSTFT, nMOSTFT, pMOSTFT or a combination thereof.

It is also an object to implement a large-size display panel having highimage quality, high definition, narrow peripheral frame and highefficiency, while allowing the use of a large-sized glass substratehaving a comparatively low distortion point, and while achieving a highyield and reduction in the production cost due to elimination ofnecessity for the use of expensive production facilities, as well aseasy control of the threshold value which permits reduction in theelectrical resistance to offer high-speed of operation and greater sizeof the display.

To these ends, according to one aspect of the present invention, thereis provided a method of producing an electrooptical device having afirst substrate, i.e., a driving substrate, carrying a display sectionprovided with pixel electrodes, e.g., pixel electrodes arranged in theform of a matrix, and a peripheral-driving-circuit section provided on aperiphery of the display section, a second substrate, i.e., a countersubstrate, and an optical material such as a liquid crystal disposedbetween the first substrate and the second substrate, as well as amethod for producing the driving substrate for such an electroopticaldevice; the method comprising the steps of: a gate-forming step forforming a gate portion including a gate electrode and a gate insulatingfilm on one face of the first substrate; a step-forming step for forminga step difference on the one face of the first substrate; alayer-forming step for forming a polycrystalline or amorphous siliconlayer having a predetermined thickness on the first substrate having thegate portion and the step difference and then forming alow-melting-point metal layer on or under the polycrystalline oramorphous silicon layer, or of forming a low-melting-point metal layercontaining silicon on the first substrate having the step difference; aheating step for dissolving silicon of the polycrystalline or amorphouslayer or of the low-melting-point metal layer into the low-melting-pointmetal layer by heating; a deposition step for depositing on the firstsubstrate a single-crystal semiconductor layer by allowing the siliconof the polycrystalline or amorphous silicon layer or of thelow-melting-point metal layer to grow by graphoepitaxy by a coolingtreatment using as a seed the step difference on the substrate; atreating step for effecting a predetermined treatment on thesingle-crystal semiconductor layer, thereby forming a channel region, asource region and a drain region; and a step for forming a firstthin-film transistor MOSTFT) of dual-gate type having the gate portionson the above and below the channel region and constituting at least partof the peripheral-driving-circuit section. In accordance with thepresent invention, the thin-film transistor may be either a field effecttransistor (FET) or a bipolar transistor, and the FET may be either aMOSFET or a junction type.

The present invention offers the following remarkable advantages (A) to(G), by virtue of the use of a single-crystal silicon layer as adual-gate MOSTFT of a peripheral driving circuit as a driving substratesuch as an active matrix substrate or as a dual-gate MOSTFT of aperipheral driving circuit of an electrooptical device such as an LCD ofthe type having a display-driver integrated structure, wherein thesingle-crystal silicon layer is graphoepitaxially grown from apolycrystalline or amorphous silicon layer or from a low-melting-pointmetal layer using the step difference formed on the substrate as a seed.

(A) It is possible to produce an electrooptical device such as a displaythin-film semiconductor device incorporating a high-performance driver,by virtue of the use of a single-crystal silicon layer having a highelectron mobility of 540 cm²/v·sec or higher that has been grown bygraphoepitaxy conducted by using as a seed the bottom corner of a stepof a predetermined size and shape formed on a substrate. Preferably, thestep is formed to provide an indented section having such across-section that both side faces of the indented section areperpendicular to the bottom or slanted to form a basilar angle of notgreater than 90° with respect to the bottom face of the indentedsection.

(B) Since the single-crystal silicon thin-film has high electron andhole mobility, single-crystal silicon top-gate MOSTFTs can form astructure having a display section and a peripheral driving circuitsection integrated with each other, wherein the display section hasnMOSTFTs, pMOSTFTS or cMOSTFTs having high switching characteristicsand, preferably, a lightly-doped drain (LDD) structure that reduces leakcurrent through reducing the electric field intensity, while theperipheral driving circuit includes cMOSTFTs, nMOSTFTs, pMOSTFTs, or acombination thereof, having high driving characteristics, wherebyproduction of a large display panel with high quality, high definition,a narrow frame, and high efficiency is facilitated. In contrast topMOSTFT that can hardly provide high hole mobility, the single-crystalsilicon thin-film has high hole mobility and, therefore, a peripheraldriving circuit for driving electrons and holes independently or incombination can be implemented and integrated with display TFTs of nMOS,pMOS or cMOS LDD-type. In a compact or small panel, either of a pair ofvertical peripheral driving circuits may be omitted.

(C) In particular, the use of dual-gate MOSTFTs in the peripheraldriving circuit makes it possible to obtain cMOS, nMOS or pMOSTFTshaving driving power 1.5 to 2.0 times as large that obtainable with theuse of single-gate TFTs, thus achieving higher performance and greaterdriving power of the TFTs, offering advantages particularly when TFTshaving large driving power are to be used in a local portion of theperipheral driving circuit. For instance, this feature not only allowsomission of one of a pair of peripheral vertical driver circuits butalso enables the present invention to be advantageously applied toorganic ELs and FEDS. Furthermore, the dual-gate structure can easily bechanged to a top-gate type structure or a bottom-gate type structurethrough a selection of one of the upper and lower gates and, inaddition, ensures safe operation even in the event of a failure in oneof the upper.and lower gates because the other gate can safely be used.

(D) The polycrystalline or amorphous silicon layer can be formed by aplasma-enhanced or reduced-pressure CVD process at a substratetemperature of 100 to 400° C., by using the above-mentioned stepdifference as a seed for the graphoepitaxy, and the low-melting-pointmetal layer can be formed by a vacuum evaporation process or asputtering process and, in addition, the above-mentioned epitaxialgrowth of silicon can be achieved at a comparatively low heatingtemperature of, for example, 930° C., so that the single-crystal siliconlayer can be uniformly formed on the insulating substrate at arelatively low temperature of, for example, 400 to 450° C.

(E) The method in accordance with the present invention does not includeannealing at a middle temperature (approximately 600° C.) for more thanten hours and excimer laser annealing that are required in solid-phasegrowth, thus offering a greater yield and reduction in the productioncost due to elimination of the use of an expensive production facility.

(F) In the graphoepitaxy in the present invention, a single-crystalsilicon thin-film having a variety of P-type impurity concentration andhigh mobility can be readily produced by adjusting the ratio ofpolycrystalline silicon or amorphous silicon to a low-melting-pointmetal, the heating temperature of the substrate, and the cooling rate,thus enabling easy control of the threshold voltage (Vth) of the device,which in turn enables the device to operate at a high speed due toreduced resistance.

(G) The low-melting-point metal layer containing polycrystalline oramorphous silicon when deposited may be doped with an adequate amount ofGroup III or V impurity, such as boron, phosphorus, antimony, arsenic,bismuth or aluminum, so that the type and the concentration of theimpurity in the epitaxial single-crystal silicon, that is, the type(P-type or N-type) and the carrier concentration, are controllable.

In accordance with the present invention, it is preferred to form theaforementioned step difference in the insulating substrate or in adiffusion barrier such as a film of silicon nitride (referred to as SiN,hereinafter) or both in the insulating substrate and the diffusionbarrier, so as to provide an indented section having such across-section that both side faces of the indented section areperpendicular to the bottom or slanted to form a basilar angle of notgreater than 90° with respect to the bottom face of the indentedsection, and to use this step difference as a seed for the graphoepitaxyof the single-crystal silicon layer. Preferably, the step difference isformed along at least one side of a device region including the channelregion, the source region and the drain region of the first thin-filmtransistor. When a passive device such as a resistor is formed of theaforementioned single-crystal silicon layer, the step difference isformed along at least one side of the device region in which theresistor is formed.

The first thin-film transistor such as MOSTFT may be formed inside,outside or both inside and outside the indented section defined by thestep difference.

The step difference may be formed by a dry etching process, such as areactive ion etching process, and the polycrystalline or amorphoussilicon layer is formed preferably by a low-temperature depositionprocess at a substrate temperature of 100 to 400° C., for example, areduced-pressure CVD process, a catalytic CVD process, a plasma-enhancedCVD process, or a sputtering process so that the thickness becomesseveral μm to 0.005 μm, followed by the deposition of thelow-melting-point metal layer by a vacuum evaporation process or asputtering process so that the thickness becomes several tens to severalhundreds times the thickness of the polycrystalline or amorphous siliconlayer, and then the aforesaid heating treatment is executed.

In this case, the low-melting-point metal layer may be formed above orbelow the polycrystalline or amorphous silicon layer formed by thelow-temperature deposition process. Alternatively, the aforementionedlow-melting-point metal layer containing silicon is deposited and thensubjected to the heating treatment.

The substrate may be an insulating substrate, for example, a glasssubstrate or a heat-resistant organic substrate, and thelow-melting-point metal layer may be formed of at least one metalselected from the group consisting of indium, gallium, tin, bismuth,lead, zinc, antimony and aluminum.

When the low-melting-point metal layer is formed of indium, this layeris heated preferably at 850 to 1,100° C. and more preferably 900 to 950°C. in a hydrogen-based atmosphere (pure hydrogen, a nitrogen-hydrogenmixture, or an argon-hydrogen mixture) to form an indium-silicon meltand, when the low-melting-point metal layer is formed of indium-gallium,this layer is heated preferably at 300 to 1,100° C. and more preferably350 to 600° C. in a hydrogen-based atmosphere to form anindium-gallium-silicon melt, whereas, when the low-melting-point metallayer is formed of gallium, this layer is heated preferably at 400 to1,100° C. and more preferably 420 to 600° C. in a hydrogen-basedatmosphere to form a gallium-silicon melt. The substrate may beuniformly heated using an electrical furnace or a lamp or,alternatively, a predetermined region of the substrate may be locallyheated using laser or electron beams.

With reference to FIG. 11, the melting point of the silicon-containinglow-melting-point metal decreases as the content of thelow-melting-point metal increases. The indium melt layer containingsilicon, e.g., by 1 percent by weight, is formed at a substratetemperature of 850 to 1,100° C. when indium is used, because such asubstrate temperature facilitates use of glass having low heatresistance, such as crystallized glass, in addition to quartz glass, asa substrate. A gallium melt layer containing 1 percent by weight ofsilicon may be formed at a temperature of 400 to 1,100° C. on any glasssubstrate.

When indium-gallium-silicon or gallium-silicon is used, a glasssubstrate having a low distortion point or a heat-resistant organicsubstrate can be used, so that a semiconductive crystalline layer can beformed on a large glass substrate having an area of, for example, 1 m²,which is inexpensive and can readily be prepared in the form of a rolledlong glass sheet. A single-crystal silicon thin-film can be formedcontinuously or discontinuously on the long glass or organic substrateby the described process employing graphoepitaxy.

Since the components of the glass having the low distortion pointrapidly diffuse into the upper layer, a thin diffusion-barrier layercomposed of, for example, silicon nitride having a thickness of 50 to200 nm is preferably formed to suppress such diffusion. Thus, thepolycrystalline or amorphous silicon layer or a silicon-containinglow-melting-point metal layer is formed on the diffusion-barrier layer.

The silicon-containing low-melting-point metal layer is slowly cooled sothat the single-crystal silicon layer is deposited by graphoepitaxyusing the step difference as a seed, and then the low-melting-pointmetal layer is removed by, for example, hydrochloric acid, followed by apredetermined treatment to form an active device and a passive device.

After the low-melting-point metal layer such as of indium deposited onthe single-crystal silicon layer after the cooling is dissolved andremoved by, for example, hydrochloric acid, only a trace amount(approximately 10¹⁶ atoms/cc) of indium remains in the silicon layer, sothat the single-crystal silicon layer becomes a p-type thin-filmsemiconductor. This layer is advantageous for production of a nMOSTFT.An n-type impurity such as phosphorus may be ion-implanted into theentire surface or selective regions of the single-crystal silicon layerto form an n-type single-crystal silicon thin-film, whereby a pMOSTFTcan also be obtained. A cMOSTFT can also be formed. The polycrystallineor amorphous silicon layer or the silicon-containing low-melting-pointmetal layer may be doped with a Group III or V impurity having a largesolubility, such as boron, phosphorus, antimony, arsenic, or bismuth, ina proper amount, during the deposition of this layer so as to controlthe type and/or the concentration of the impurity in the epitaxiallygrown silicon layer, that is, to control the doping type (n- or p-)and/or the concentration of the carrier.

Accordingly, the single-crystal silicon layer grown by graphoepitaxy onthe substrate is used as a channel region, a source region and a drainregion of a dual-gate MOSTFT which constitutes at least a part of theperipheral driving circuit, the type and the concentration of eachregion being controllable, as described above.

Thin-film transistors in the peripheral-driving-circuit section and thedisplay section may constitute n-channel, p-channel or complementaryinsulating-gate field-effect transistors: for example, a thin-filmtransistor may comprise a combination of a complementary type and ann-channel type, a complementary type and a p-channel type, or acomplementary type, an n-channel type and a p-channel type. Preferablyat least a part of the thin-film transistors in theperipheral-driving-circuit section and/or the display section has alightly-doped drain (LDD) structure of a single type having a LDDsection between the gate and the source or drain, or of a double typehaving LDD sections between the gate and source and between the gate andthe drain, respectively.

Preferably, the MOSTFT constitutes an LDD-type TFT of an nMOS, a pMOS ora cMOS in the display section, and a cMOSTFT, an nMOSTFT, a pMOSTFT, ora mixture thereof, in the peripheral-driving-circuit section.

The MOSTFT is preferably formed on at least one of the interior and theexterior of the indented section of the substrate.

In such a case, the step difference is formed on one surface of thefirst substrate, and a single-crystal, polycrystalline or amorphoussilicon layer is formed on the surface having the step difference. Thesingle-crystal, polycrystalline or amorphous silicon layer is used as achannel region, a source region and a drain region of a second thin-filmtransistor, and at least one gate section is provided above and/or belowthe channel region. That is, the second thin-film transistor may be atop-gate, bottom-gate or dual-gate thin-film transistor.

In this case also, the step difference forms an indented section havinga cross-section in which a side face is perpendicular to or slanted tothe bottom face so as to have a basilar angle of preferably 90° or less,and the step difference functions as a seed for graphoepitaxy of thesingle-crystal silicon layer.

The second thin-film transistor may be formed in a region including theindented section defined by the step difference formed in the firstsubstrate and/or the film formed on the first substrate, and thegraphoepitaxial single-crystal silicon layer may be used to form thesource, drain and channel regions of the second thin-film transistor, asin the case of the first thin-film transistor.

In this second thin-film transistor also, the type and the concentrationof the Group III or V impurity in the single-crystal, polycrystalline oramorphous silicon layer may be controlled as described above, and a stepdifference may be formed along at least one side of a device regionincluding the channel region, the source region and the drain region ofthe second thin-film transistor. A gate electrode below thesingle-crystal, polycrystalline or amorphous silicon layer is preferablytrapezoidal at the side end section. A diffusion-barrier layer may beprovided between the first substrate and the single-crystal,polycrystalline or amorphous silicon layer.

The source or drain electrodes of the first and/or second thin-filmtransistors are preferably formed on a region including the stepdifference.

The first thin-film transistor may comprise at least the dual-gate typeamong a top-gate type having a gate section above the channel region, abottom-gate type having a gate section below the channel region, and adual-gate type having one gate section above and one below the channelregion, and the switching device may comprise one of a top-gate secondthin-film transistor, a bottom-gate second thin-film transistor and adual-gate second thin-film transistor.

In this case, the gate section formed below the channel region in thebottom-gate or dual-gate second thin-film transistor preferablycomprises a heat resistant material, and an upper-gate electrode of thesecond thin-film transistor and a gate electrode of the first thin-filmtransistor may comprise a common material.

The peripheral-driving-circuit section may comprise, in addition to theabove-mentioned first thin-film transistor, at least one of a top-gate,bottom-gate or dual-gate thin-film transistor having a channel region ofa polycrystalline or amorphous silicon layer and a gate region formedabove or below the channel region, and may further comprise a diode, aresistor, a capacitor and an inductor, each comprising a single-crystal,polycrystalline or amorphous silicon layer.

Thin-film transistors in the peripheral driving circuit and/or thedisplay section have a single-gate or a multi-gate configuration.

Preferably, when the n- or p-channel thin-film transistor in theperipheral-driving-circuit section and/or the display section is adual-gate type, the upper or a lower-gate electrode is electricallyopened or a given negative voltage for the n-channel type or a givenpositive voltage for the p-channel type is applied so that the dual-gatetype thin-film transistors operate as bottom- or top-gate type thin-filmtransistors.

The thin-film transistor in the peripheral-driving-circuit section maybe the first thin-film transistor of an n-channel, p-channel orcomplementary type, and the thin-film transistor in the display sectionmay be an n-channel, p-channel or complementary type when the channelregion is a single-crystal silicon layer, a polycrystalline siliconlayer, or an amorphous silicon layer.

After the single-crystal silicon layer is deposited, an upper-gatesection including a gate insulating film and a gate electrode may beformed on the single-crystal silicon layer, and the single-crystalsilicon layer may be doped with a Group III or V impurity through theupper-gate section to form the channel region, the source region and thedrain region.

When the second thin-film transistor is a bottom-gate type or adual-gate type, a lower-gate electrode composed of a heat resistantmaterial is provided below the channel region, and a gate insulatingfilm is formed on the gate electrode to form a lower-gate section, andthe second thin-film transistor is formed by the same steps includingthe step for forming the step difference as those in the first thin-filmtransistor. In such a case the upper-gate electrode of the secondthin-film transistor and the gate electrode of the first thin-filmtransistor may be composed of a common material.

The single-crystal silicon layer formed on the lower-gate section may bedoped with a Group III or V impurity to form a source region and a drainregion, followed by an activation treatment.

The source and drain regions of the second thin-film transistor may beformed by ion-implantation of the above impurity on the single-crystalsilicon layer through a resist mask and may be subjected to activationtreatment, and the gate electrode of the first thin-film transistor, andthe upper-gate electrode of the second thin-film transistor, ifnecessary, may be formed after the formation of the gate insulatingfilm.

When the thin-film transistor is a top-gate type, the source and drainregions of the first and second thin-film transistors may be formed onthe single-crystal silicon layer by ion implantation of the impuritythrough a resist mask and may be subjected to activation treatment, andthen the gate sections including the gate insulating films and the gateelectrodes of the first and second thin-film transistors may be formed.

Alternatively, when the thin-film transistor is of the top-gate type,the gate sections including the gate insulating films and the gateelectrodes of the first and second thin-film transistors may be formed,and then the source and drain regions of the first and second thin-filmtransistors may be formed on the single-crystal silicon layer by ionimplantation of the impurity through a resist mask, followed by anactivation treatment.

The resist mask used when the LDD structure was formed may be leftunremoved and the ion implantation for forming the source and drainregions may be performed through a resist mask which covers theremaining mask.

The substrate may be optically opaque or transparent, and may beprovided with pixel electrodes for a reflective or transmissive display.

The display section may have a lamination configuration of the pixelelectrodes and a color filter layer which may be formed on a displayarray, whereby the aperture ratio and the luminance are improved andcosts can be decreased due to omission of a color filter substrate andimproved productivity.

When the pixel electrodes are reflective electrodes, unevenness ispreferably imparted to a resin film so that the resin film has optimizedreflective characteristics and viewing-angle characteristics, and thenthe pixel electrodes are formed, whereas, when the pixel electrodes aretransparent electrodes, the surface is preferably planarized by atransparent planarization film and then the pixel electrodes are formedon the planarized plane.

The display section is illuminated or dimmed by being driven by theabove-described MOSTFT: for instance, the display section may comprise,for example, a liquid crystal display (LCD), an electroluminescent (EL)display, a field emission display (FED), a light-emitting polymerdisplay (LEPD), or a light-emitting diode (LED) display. In this case,the arrangement may be such that a plurality of pixel electrodes arearranged in a matrix in the display section and a switching device isconnected to each pixel electrode.

In accordance with a second aspect of the present invention, there isprovided a method of producing an electrooptical device having a firstsubstrate, i.e., a driving substrate, carrying a display sectionprovided with pixel electrodes, e.g., pixel electrodes arranged in theform of a matrix, and a peripheral-driving-circuit section proivded on aperiphery of the display section, a second substrate, i.e., a countersubstrate, and an optical material such as a liquid crystald disposedbetween the first substrate and the second substrate, as well as amethod for producing the driving substrate for such an electroopticaldevice, the method comprising the steps of:

a gete-forming step for forming a gate portion including a gaqteelectrode andd a gate insulating filim on one face of the firstsubstrate;

a step-forming step for forming a step difference on the one face of thefirst substrate;

a layer-forming step for forming a melt layer of a low-melting-pointmetal containing silicon on the first substrate having the gate portionand the step difference;

a deposition step for deposititing a single-crystal silicon layer byallowing the silicon of the melt layer to grow by graphoepitaxy by acooling treatment using as a seed the step difference on the substrate;

a step for effecting a predetermined treatment on the single-crystalsilicon layer, thereby forming a channel region, a source region and adrain region; and

a step for forming a first thin-film transistor (MOSTFT) of dual gatetype having the gate portions on the above and below the channel regionand constituting at least part of the peripheral-driving-sircuitsection. In accordance with the second aspect of the present invention,the thin-film transistor may be either a field effect transistor (FET)or a bipolar transistor, and the FET may be either a MOSTFT or ajunction type.

The second aspect of the present invention offers the followingremarkable advantages (A) to (G), by virture of the use of asingle-crystal silicon layer as a dual-gate MOSTFT of a peripheraldriving circuit as a driving substrate such as an active matrixsubstrate or as a dual-gate MOSTFT of a peripheral driving circuit of anelectrooptical device such as an LCD of the type having a display-driverintegrated structure, wherein the single-crystal silicon layer isgraphoepitaxially grown from a melt of a low-melting-point metalcontaining silicon using the step difference formed on the substrate asa seed.

(A) It is possible to produce an electrooptical device such as a displaythin-film semiconductor device incorporating a high-performance driver,by virtue of the use of a single-crystal silicon layer having a highelectron mobility of 540 cm²/v·sec or higher that has been grown bygraphoepitaxy conducted by using as a seed the bottom corner of a stepof a predetermined size and shape formed on a substrate. Preferably, thestep is formed to provide an indented section having such across-section that both side faces of the indented section areperpendicular to the bottom or slanted to form a basilar angle of notgreater than 90° with respect to the bottom face of the indentedsection.

(B) Since the single-crystal silicon thin-film has high electron andhole mobility, single-crystal silicon top-gate MOSTFTs can form astructure having a display section and a peripheral driving circuitsection integrated with each other, wherein the display section hasnMOSTFTs, pMOSTFTs or cMOSTFTs having high switching characteristicsand, preferably, a lightly-doped drain (LDD) structure that reduces leakcurrent through reducing the electric field intensity, while theperipheral driving circuit includes cMOSTFTs, nMOSTFTs, pMOSTFTs, or acombination thereof, having high driving characteristics, wherebyproduction of a large display panel with high quality, high definition,a narrow frame, and high efficiency is facilitated. In contrast topMOSTFT that can hardly provide high hole mobility, the single-crystalsilicon thin-film has high hole mobility and, therefore, a peripheraldriving circuit for driving electrons and holes independently or incombination can be implemented and integrated with display TFTs of nMOS,pMOS or cMOS LDD-type. In compact to medium-sized panels, one of a pairof vertical peripheral driving circuits may be omitted.

(C) In particular, the use of dual-gate MOSTFTs in the peripheraldriving circuit makes it possible to obtain cMOS, nMOS or pMOSTFTshaving driving power 1.5 to 2.0 times as large that obtainable with theuse of single-gate TFTS, thus achieving higher performance and greaterdriving power of the TFTs, offering advantages particularly when TFTshaving large driving power are to be used in a local portion of theperipheral driving circuit. For instance, this feature not only allowsomission of one of a pair of peripheral vertical driver circuits butalso enables the present invention to be advantageously applied toorganic ELs and FEDS. Furthermore, the dual-gate structure can easily bechanged to a top-gate type structure or a bottom-gate type structurethrough a selection of one of the upper and lower gates and, inaddition, ensures safe operation even in the event of a failure in oneof the upper and lower gates because the other gate can safely be used.

(D) The melt of the low-melting-point metal is prepared at a temperatureof, for example, 350° C., by using the above-mentioned step differenceas a seed for the graphoepitaxy, and the melt can be fromed on thesubstrate which is heated at a temperature slightly higher than thetemperature of the melt by an application process, so that thesingle-crystal silicon film can be uniformly formed at a relatively lowtemperature of, for example, 300 to 400° C.

(E) The method in accordance with the present invention does not includeannealing at a middle temperature (approximately 600° C.) for more thanten hours and excimer laser annealing that are required in solid-phasegrowth, thus offering a greater yield and reduction in the productioncost due to elimination of the use of an expensive production facility.

(F) In the graphoepitaxy, a single-crystal silicon layer having avariety of P-type impurity concentration and high mobility can bereadily produced by adjusting the composition ratio of the melt, thetemperature of the melt, the heating temperature of the substrate, andthe cooling rate, thus enabling easy control of the threshold voltage(Vth) of the device, which in turn enables the device to operate at ahigh speed due to reduced resistance.

(G) The melt layer of the low-melting-point metal containing silicon maybe doped with an adequate amount of Group III or V impurity, such asboron, phosphorus, antimony, arsenic, bismuth or aluminum, so that thetype and the concentration of the impurity in the epitaxialsingle-crystal silicon layer, that is, the type (P-type or N-type) andthe carrier concentration, are controllable.

The step difference may be formed by a dry etching process, such as areactive ion etching process, and the melt of the low-melting-pointmetal containing 2.0 to 0.005 percent by weight of, for example, 1percent by weight of silicon may be applied to the heated insulatingsubstrate and maintained for a predetermined period, for example,several to several tens of minutes, and then a cooling treatment may beperformed. This can provide a single-crystal silicon layer having athickness of several to 0.005 μm, for example, 1 μm.

The substrate may be an insulating substrate, for example, a glasssubstrate or a heat-resistant organic substrate, and thelow-melting-point metal may comprise at least one metal selected fromthe group consisting of indium, gallium, tin, bismuth, lead, zinc,antimony, and aluminum.

When the low-melting-point metal comprises indium, the melt may beapplied to the insulating substrate heated preferably at a temperatureof 850 to 1,100° C. and more preferably 900 to 950° C. and when thelow-meting-point metal comprises indium-gallium, the melt may be appliedto the insulating substrate heated preferably at a temperature of 300 to1,100° C. and more preferably 350 to 600° C., whereas when thelow-melting-point layer comprises gallium, the melt may be applied tothe insulating substrate heated preferably at a temperature of 400 to1,100° C. and more preferably 420 to 600° C. The substrate may beuniformly heated using an electrical furnace or a lamp or,alternatively, a predetermined region of the substrate may be locallyheated using laser or electron beams.

With reference to FIG. 11, the melting point of the silicon-containinglow-melting-point metal decreases as the content of thelow-melting-point metal increases. The indium melt layer containingsilicon, e.g., by 1 percent by weight, is formed at a substratetemperature of 850 to 1,100° C. when indium is used, because such asubstrate temperature facilitates use of glass having low heatresistance, such as crystallized glass, in addition to quartz glass, asa substrate. A gallium melt layer containing 1 percent by weight ofsilicon may be formed at a temperature of 400 to 1,100° C. on any glasssubstrate.

When indium-gallium-silicon or gallium-silicon is used, a glasssubstrate having a low distortion point or a heat-resistant organicsubstrate can be used, so that a semiconductive crystalline layer can beformed on a large glass substrate having an area of, for example, 1 m²,which is inexpensive and can readily be prepared in the form of a rolledlong glass sheet. A single-crystal silicon thin-film can be formedcontinuously or discontinuously on the long glass or organic substrateby the described process employing graphoepitaxy.

While the substrate is cooled after being maintained for a fixed periodin the aforementioned application process, a dipping process in whichthe glass substrate is dipped with the melt and maintained for a fixedperiod and then, the substrate is gradually pulled up, or a floatingprocess in which the substrate is cooled while being moved in the meltor while the surface of the substrate is being moved at an adequatespeed may be employed. The thickness of an eptaxially grown layer, andthe carrier impurity concentration can be controlled by the compositionratio and the temperature of the melt and the pulling-up speed. Thesubstrate can be continuously or intermittently processed by theapplication process, dipping process and floating process, so that massproductivity is increased.

Since the components of the glass having the low distortion pointrapidly diffuse into the upper layer, a thin diffusion-barrier layercomposed of, for example, silicon nitride having a thickness of 50 to200 nm is preferably formed to suppress such diffusion. Thus, thepolycrystalline or amorphous silicon layer or a silicon-containinglow-melting-point metal layer is formed on the diffusion-barrier layer.

The silicon-containing low-melting-point metal layer is slowly cooled sothat the single-crystal silicon layer is deposited by graphoepitaxyusing the step difference as a seed, and then the low-melting-pointmetal layer is removed by, for example, hydrochloric acid, followed by apredetermined treatment to form an active device and a passive device.

After the low-melting-point metal layer such as of indium deposited onthe single-crystal silicon layer after the cooling is dissolved andremoved by, for example, hydrochloric acid, only a trace amount(approximately 10¹⁶ atoms/cc) of indium remains in the silicon layer, sothat the single-crystal silicon layer becomes a p-type thin-filmsemiconductor. This layer is advantageous for production of a nMOSTFT.An n-type impurity such as phosphorus may be ion-implanted into theentire surface or selective regions of the single-crystal silicon layerto form an n-type single-crystal silicon thin-film, whereby a pMOSTFTcan also be obtained. A cMOSTFT can also be formed. The polycrystallineor amorphous silicon layer or the silicon-containing low-melting-pointmetal layer may be doped with a Group III or V impurity having a largesolubility, such as boron, phosphorus, antimony, arsenic, or bismuth, ina proper amount, during the deposition of this layer so as to controlthe type and/or the concentration of the impurity in the epitaxiallygrown silicon layer, that is, to control the doping type (n- or p-)and/or the concentration of the carrier.

Accordingly, the single-crystal silicon layer grown by graphoepitaxy onthe substrate is used as a channel region, a source region and a drainregion of a top-gate MOSTFT which constitutes at least a part of theperipheral driving circuit, the type and the concentration of eachregion being controllable, as described above.

Thin-film transistors in the peripheral-driving-circuit section and thedisplay section may constitute n-channel, p-channel or complementaryinsulating-gate field-effect transistors: for example, a thin-filmtransistor may comprise a combination of a complementary type and ann-channel type, a complementary type and a p-channel type, or acomplementary type, an n-channel type and a p-channel type. Preferablyat least a part of the thin-film transistors in theperipheral-driving-circuit section and/or the display section has alightly-doped drain (LDD) structure of a single type having a LDDsection between the gate and the source or drain, or of a double typehaving LDD sections between the gate and source and between the gate andthe drain, respectively.

Preferably, the MOSTFT constitutes an LDD-type TFT of an nMOS, a pMOS ora cMOS in the display section, and a cMOSTFT, an nMOSTFT, a pMOSTFT, ora mixture thereof, in the peripheral-driving-circuit section.

The MOSTFT is preferably formed on at least one of the interior and theexterior of the indented section of the substrate.

In such a case, the step difference is formed on one surface of thefirst substrate, and a single-crystal, polycrystalline or amorphoussilicon layer is formed on the surface having the step difference. Thesingle-crystal, polycrystalline or amorphous silicon layer is used as achannel region, a source region and a drain region of a second thin-filmtransistor, and at least one gate section is provided above and/or belowthe channel region. That is, the second thin-film transistor may be atop-gate, bottom-gate or dual-gate thin-film transistor.

In this case also, the step difference forms an indented section havinga cross-section in which a side face is perpendicular to or slanted tothe bottom face so as to have a basilar angle of preferably 90° or less,and the step difference functions as a seed for graphoepitaxy of thesingle-crystal silicon layer.

The second thin-film transistor may be formed in a region including theindented section defined by the step difference formed in the firstsubstrate and/or the film formed on the first substrate, and thegraphoepitaxial single-crystal silicon layer may be used to form thesource, drain and channel regions of the second thin-film transistor, asin the case of the first thin-film transistor.

In this second thin-film transistor also, the type and the concentrationof the Group III or V impurity in the single-crystal, polycrystalline oramorphous silicon layer may be controlled as described above, and a stepdifference may be formed along at least one side of a device regionincluding the channel region, the source region and the drain region ofthe second thin-film transistor. A gate electrode below thesingle-crystal, polycrystalline or amorphous silicon layer is preferablytrapezoidal at the side end section. A diffusion-barrier layer may beprovided between the first substrate and the single-crystal,polycrystalline or amorphous silicon layer.

The source or drain electrodes of the first and/or second thin-filmtransistors are preferably formed on a region including the stepdifference.

The first thin-film transistor may comprise at least the top-gate typeamong a top-gate type having a gate section above the channel region, abottom-gate type having a gate section below the channel region, and adual-gate type having one gate section above and one below the channelregion, and the switching device may comprise one of a top-gate secondthin-film transistor, a bottom-gate second thin-film transistor and adual-gate second thin-film transistor.

In this case, the gate section formed below the channel region in thebottom-gate or dual-gate second thin-film transistor preferablycomprises a heat resistant material, and an upper-gate electrode of thesecond thin-film transistor and a gate electrode of the first thin-filmtransistor may comprise a common material.

The peripheral-driving-circuit section may comprise, in addition to theabove-mentioned first thin-film transistor, at least one of a top-gate,bottom-gate or dual-gate thin-film transistor having a channel region ofa polycrystalline or amorphous silicon layer and a gate region formedabove or below the channel region, and may further comprise a diode, aresistor, a capacitor and an inductor, each comprising a single-crystal,polycrystalline or amorphous silicon layer.

Thin-film transistors in the peripheral driving circuit and/or thedisplay section have a single-gate or a multi-gate configuration.

Preferably, when the n- or p-channel thin-film transistor in theperipheral-driving-circuit section and/or the display section is adual-gate type, the upper or a lower-gate electrode is electricallyopened or a given negative voltage for the n-channel type or a givenpositive voltage for the p-channel type is applied so that the dual-gatetype thin-film transistors operate as bottom- or top-gate type thin-filmtransistors.

The thin-film transistor in the peripheral-driving-circuit section maybe the first thin-film transistor of an n-channel, p-channel orcomplementary type, and the thin-film transistor in the display sectionmay be an n-channel, p-channel or complementary type when the channelregion is a single-crystal silicon layer, a polycrystalline siliconlayer, or an amorphous silicon layer.

After the single-crystal silicon layer is deposited, an upper-gatesection including a gate insulating film and a gate electrode may beformed on the single-crystal silicon layer, and the single-crystalsilicon layer may be doped with a Group III or V impurity through theupper-gate section to form the channel region, the source region and thedrain region.

When the second thin-film transistor is a bottom-gate type or adual-gate type, a lower-gate electrode composed of a heat resistantmaterial is provided below the channel region, and a gate insulatingfilm is formed on the gate electrode to form a lower-gate section, andthe second thin-film transistor is formed by the same steps includingthe step for forming the step difference as those in the first thin-filmtransistor. In such a case the upper-gate electrode of the secondthin-film transistor and the gate electrode of the first thin-filmtransistor may be composed of a common material.

The single-crystal silicon layer formed on the lower-gate section may bedoped with a Group III or V impurity to form a source region and a drainregion, followed by an activation treatment.

The source and drain regions of the second thin-film transistor may beformed by ion-implantation of the above impurity on the single-crystalsilicon layer through a resist mask and may be subjected to activationtreatment, and the gate electrode of the first thin-film transistor, andthe upper-gate electrode of the second thin-film transistor, ifnecessary, may be formed after the formation of the gate insulatingfilm.

When the thin-film transistor is a top-gate type, the source and drainregions of the first and second thin-film transistors may be formed onthe single-crystal silicon layer by ion implantation of the impuritythrough a resist mask and may be subjected to activation treatment, andthen the gate sections including the gate insulating films and the gateelectrodes of the first and second thin-film transistors may be formed.

Alternatively, when the thin-film transistor is of the top-gate type,the gate sections including the gate insulating films and the gateelectrodes of the first and second thin-film transistors may be formed,and then the source and drain regions of the first and second thin-filmtransistors may be formed on the single-crystal silicon layer by ionimplantation of the impurity through a resist mask, followed by anactivation treatment.

The resist mask used when the LDD structure was formed may be leftunremoved and the ion implantation for forming the source and drainregions may be performed through a resist mask which covers theremaining mask.

The substrate may be optically opaque or transparent, and may beprovided with pixel electrodes for a reflective or transmissive display.

The display section may have a lamination configuration of the pixelelectrodes and a color filter layer which may be formed on a displayarray, whereby the aperture ratio and the luminance are improved andcosts can be decreased due to omission of a color filter substrate andimproved productivity.

When the pixel electrodes are reflective electrodes, unevenness ispreferably imparted to a resin film so that the resin film has optimizedreflective characteristics and viewing-angle characteristics, and thenthe pixel electrodes are formed, whereas, when the pixel electrodes aretransparent electrodes, the surface is preferably planarized by atransparent planarization film and then the pixel electrodes are formedon the planarized plane.

The display section is illuminated or dimmed by being driven by theabove-described MOSTFT: for instance, the display section may comprise,for example, a liquid crystal display (LCD), an electroluminescent (EL)display, a field emission display (FED), a light-emitting polymerdisplay (LEPD), or a light-emitting diode (LED) display. In this case,the arrangement may be such that a plurality of pixel electrodes arearranged in a matrix in the display section and a switching device isconnected to each pixel electrode.

In accordance with a third aspect of the present invention, there isprovided a method of producing an electrooptical device, as well as amethod of producing a driving substrate for such an electroopticaldevice, having a first substrate carrying a display section providedwith pixel electrodes and a peripheral-driving-circuit section providedon a periphery of the display section, a second substrate, and anoptical material disposed between the first substrate and the secondsubstrate; the method comprising the steps of: a gate-forming step forforming a gate portion including a gate electrode and a gate insulatingfilm on one face of the first substrate; a step-forming step for forminga step difference on the one face of the first substrate; alayer-forming step for forming a polycrystalline or amorphous siliconlayer having a predetermined thickness on the first substrate having thegate portion and the step difference and then forming alow-melting-point metal layer on or under the polycrystalline oramorphous silicon layer, or of forming a low-melting-point metal layercontaining silicon on the first substrate having the step difference; aheating step for dissolving silicon of the polycrystalline or amorphouslayer or of the low-melting-point metal layer into the low-melting-pointmetal layer by heating; a deposition step for depositing on the firstsubstrate a single-crystal silicon layer by allowing the silicon of thepolycrystalline or amorphous silicon layer or of the low-melting-pointmetal layer to grow by graphoepitaxy by a cooling treatment using as aseed the step difference on the substrate; a step for effecting apredetermined treatment on the single-crystal silicon layer, therebyforming a channel region, a source region and a drain region; and a stepfor forming a first thin-film transistor of bottom-gate type having thegate portions on the below the channel region and constituting at leastpart of the peripheral-driving-circuit section. The above-mentionedthin-film transistor may be a field effect transistor (FET) or a bipolartransistor. The FET, when used, may be a MOS-type FET or a junction-typeFET.

In accordance with this aspect of the present invention, the sameadvantages as those offered by the first aspect of the invention areobtainable, except for the advantage derived in the first aspect fromthe use of the dual-gate structure of the thin-film transistor.

In accordance with the present invention, it is preferred to form theaforementioned step difference in the insulating substrate or in adiffusion barrier such as a film of silicon nitride (referred to as SiN,hereinafter) or both in the insulating substrate and the diffusionbarrier, so as to provide an indented section having such across-section that both side faces of the indented section areperpendicular to the bottom or slanted to form a basilar angle of notgreater than 90° with respect to the bottom face of the indentedsection, and to use this step difference as a seed for the graphoepitaxyof the single-crystal silicon layer. Preferably, the step difference isformed along at least one side of a device region including the channelregion, the source region and the drain region of the first thin-filmtransistor. When a passive device such as a resistor is formed of theaforementioned single-crystal silicon layer, the step difference isformed along at least one side of the device region in which theresistor is formed.

The first thin-film transistor such as MOSTFT may be formed inside,outside or both inside and outside the indented section defined by thestep difference.

The step difference may be formed by a dry etching process, such as areactive ion etching process, and the polycrystalline or amorphoussilicon layer is formed preferably by a low-temperature depositionprocess at a substrate temperature of 100 to 400° C., for example, areduced-pressure CVD process, a catalytic CVD process, a plasma-enhancedCVD process, or a sputtering process so that the thickness becomesseveral μm to 0.005 μm, followed by the deposition of thelow-melting-point metal layer by a vacuum evaporation process or asputtering process so that the thickness becomes several tens to severalhundreds times the thickness of the polycrystalline or amorphous siliconlayer, and then the heating treatment is executed.

In this case, the low-melting-point metal layer may be formed above orbelow the polycrystalline or amorphous silicon layer formed by thelow-temperature deposition process. Alternatively, the aforementionedlow-melting-point metal layer containing silicon is deposited and thensubjected to the heating treatment.

The substrate may be an insulating substrate, for example, a glasssubstrate or a heat-resistant organic substrate, and thelow-melting-point metal layer may be formed of at least one metalselected from the group consisting of indium, gallium, tin, bismuth,lead, zinc, antimony and aluminum.

When the low-melting-point metal layer is formed of indium, this layeris heated preferably at 850 to 1,100° C. and more preferably 900 to 950°C. in a hydrogen-based atmosphere (pure hydrogen, a nitrogen-hydrogenmixture, or an argon-hydrogen mixture) to form an indium-silicon meltand, when the low-melting-point metal layer is formed of indium-gallium,this layer is heated preferably at 300 to 1,100° C. and more preferably350 to 600° C. in a hydrogen-based atmosphere to form anindium-gallium-silicon melt, whereas, when the low-melting-point metallayer is formed of gallium, this layer is heated preferably at 400 to1,100° C. and more preferably 420 to 600° C. in a hydrogen-basedatmosphere to form a gallium-silicon melt. The substrate may beuniformly heated using an electrical furnace or a lamp or,alternatively, a predetermined region of the substrate may be locallyheated using laser or electron beams.

With reference to FIG. 11, the melting point of the silicon-containinglow-melting-point metal decreases as the content of thelow-melting-point metal increases. The indium melt layer containingsilicon, e.g., by 1 percent by weight, is formed at a substratetemperature of 850 to 1,100° C. when indium is used, because such asubstrate temperature facilitates use of glass having low heatresistance, such as crystallized glass, in addition to quartz glass, asa substrate. A gallium melt layer containing 1 percent by weight ofsilicon may be formed at a temperature of 400 to 1,100° C. on any glasssubstrate.

When indium-gallium-silicon or gallium-silicon is used, a glasssubstrate having a low distortion point or a heat-resistant organicsubstrate can be used, so that a single-crystal silicon layer can beformed on a large glass substrate having an area of, for example, 1 m²,which is inexpensive and can readily be prepared in the form of a rolledlong glass sheet.

Since the components of the glass having the low distortion pointrapidly diffuse into the upper layer, a thin diffusion-barrier layercomposed of, for example, silicon nitride having a thickness of 50 to200 nm is preferably formed to suppress such diffusion. Thus, thepolycrystalline or amorphous silicon layer or a silicon-containinglow-melting-point metal layer is formed on the diffusion-barrier layer.

The silicon-containing low-melting-point metal layer is slowly cooled sothat the single-crystal silicon layer is deposited by graphoepitaxyusing the step difference as a seed, and then the low-melting-pointmetal layer is removed by, for example, hydrochloric acid, followed by apredetermined treatment to form an active device and a passive device.

After the low-melting-point metal layer such as of indium deposited onthe single-crystal silicon layer after the cooling is dissolved andremoved by, for example, hydrochloric acid, only a trace amount(approximately 10¹⁶ atoms/cc) of indium remains in the silicon layer, sothat the single-crystal silicon layer becomes a p-type thin-filmsemiconductor. This layer is advantageous for production of a nMOSTFT.An n-type impurity such as phosphorus may be ion-implanted into theentire surface or selective regions of the single-crystal silicon layerto form an n-type single-crystal silicon thin-film, whereby a pMOSTFTcan also be obtained. A cMOSTFT can also be formed. A cMOSTFT can alsobe formed. The polycrystalline or amorphous silicon layer or thesilicon-containing low-melting-point metal layer may be doped with aGroup III or V impurity having a large solubility, such as boron,phosphorus, antimony, arsenic, or bismuth, in a proper amount, duringthe deposition of this layer so as to control the type and/or theconcentration of the impurity in the epitaxially grown silicon layer,that is, to control the doping type (n- or p-) and/or the concentrationof the carrier.

Accordingly, the single-crystal silicon layer grown by graphoepitaxy onthe substrate is used as a channel region, a source region and a drainregion of a dual-gate MOSTFT which constitutes at least a part of theperipheral driving circuit, the type and the concentration of eachregion being controllable, as described above.

Thin-film transistors in the peripheral-driving-circuit section and thedisplay section may constitute n-channel, p-channel or complementaryinsulating-gate field-effect transistors: for example, a thin-filmtransistor may comprise a combination of a complementary type and ann-channel type, a complementary type and a p-channel type, or acomplementary type, an n-channel type and a p-channel type. Preferablyat least a part of the thin-film transistors in theperipheral-driving-circuit section and/or the display section has alightly-doped drain (LDD) structure of a single type having a LDDsection between the gate and the source or drain, or of a double typehaving LDD sections between the gate and source and between the gate andthe drain, respectively.

Preferably, the MOSTFT constitutes an LDD-type TFT of an nMOS, a pMOS ora cMOS in the display section, and a cMOSTFT, an nMOSTFT, a pMOSTFT, ora mixture thereof, in the peripheral-driving-circuit section.

The MOSTFT is preferably formed on at least one of the interior and theexterior of the indented section of the substrate.

In such a case, the step difference is formed on one surface of thefirst substrate, and a single-crystal, polycrystalline or amorphoussilicon layer is formed on the surface having the step difference. Thesingle-crystal, polycrystalline or amorphous silicon layer is used as achannel region, a source region and a drain region of a second thin-filmtransistor, and at least one gate section is provided above and/or belowthe channel region. That is, the second thin-film transistor may be atop-gate, bottom-gate or dual-gate thin-film transistor.

In this case also, the step difference forms an indented section havinga cross-section in which a side face is perpendicular to or slanted tothe bottom face so as to have a basilar angle of preferably 90° or less,and the step difference functions as a seed for graphoepitaxy of thesingle-crystal silicon layer.

The second thin-film transistor may be formed in a region including theindented section defined by the step difference formed in the firstsubstrate and/or the film formed on the first substrate, and thegraphoepitaxial single-crystal silicon layer may be used to form thesource, drain and channel regions of the second thin-film transistor, asin the case of the first thin-film transistor.

In this second thin-film transistor also, the type and the concentrationof the Group III or V impurity in the single-crystal, polycrystalline oramorphous silicon layer may be controlled as described above, and a stepdifference may be formed along at least one side of a device regionincluding the channel region, the source region and the drain region ofthe second thin-film transistor. A gate electrode below thesingle-crystal, polycrystalline or amorphous silicon layer is preferablytrapezoidal at the side end section. A diffusion-barrier layer may beprovided between the first substrate and the single-crystal,polycrystalline or amorphous silicon layer.

The source or drain electrodes of the first and/or second thin-filmtransistors are preferably formed on a region including the stepdifference.

The first thin-film transistor may comprise at least the bottom-gatetype among a top-gate type having a gate section above the channelregion, a bottom-gate type having a gate section below the channelregion, and a dual-gate type having one gate section above and one belowthe channel region, and the switching device may comprise one of atop-gate second thin-film transistor, a bottom-gate second thin-filmtransistor and a dual-gate second thin-film transistor.

In this case, the gate section formed below the channel region in thebottom-gate or dual-gate second thin-film transistor preferablycomprises a heat resistant material, and an upper-gate electrode of thesecond thin-film transistor and a gate electrode of the first thin-filmtransistor may comprise a common material.

The peripheral-driving-circuit section may comprise, in addition to theabove-mentioned first thin-film transistor, at least one of a top-gate,bottom-gate or dual-gate thin-film transistor having a channel region ofa polycrystalline or amorphous silicon layer and a gate region formedabove or below the channel region, and may further comprise a diode, aresistor, a capacitor and an inductor, each comprising a single-crystal,polycrystalline or amorphous silicon layer.

Thin-film transistors in the peripheral driving circuit and/or thedisplay section have a single-gate or a multi-gate configuration.

Preferably, when the n- or p-channel thin-film transistor in theperipheral-driving-circuit section and/or the display section is adual-gate type, the upper or a lower-gate electrode is electricallyopened or a given negative voltage for the n-channel type or a givenpositive voltage for the p-channel type is applied so that the dual-gatetype thin-film transistors operate as bottom- or top-gate type thin-filmtransistors.

The thin-film transistor in the peripheral-driving-circuit section maybe the first thin-film transistor of an n-channel, p-channel orcomplementary type, and the thin-film transistor in the display sectionmay be an n-channel, p-channel or complementary type when the channelregion is a single-crystal silicon layer, a polycrystalline siliconlayer, or an amorphous silicon layer.

After the single-crystal silicon layer is deposited, an upper-gatesection including a gate insulating film and a gate electrode may beformed on the single-crystal silicon layer, and the single-crystalsilicon layer may be doped with a Group III or V impurity through theupper-gate section to form the channel region, the source region and thedrain region.

When the second thin-film transistor is a bottom-gate type or adual-gate type, a lower-gate electrode composed of a heat resistantmaterial is provided below the channel region, and a gate insulatingfilm is formed on the gate electrode to form a lower-gate section, andthe second thin-film transistor is formed by the same steps includingthe step for forming the step difference as those in the first thin-filmtransistor. In such a case the upper-gate electrode of the secondthin-film transistor and the gate electrode of the first thin-filmtransistor may be composed of a common material.

The single-crystal silicon layer formed on the lower-gate section may bedoped with a Group III or V impurity to form a source region and a drainregion, followed by an activation treatment.

The source and drain regions of the second thin-film transistor may beformed by ion-implantation of the above impurity on the single-crystalsilicon layer through a resist mask and may be subjected to activationtreatment, and the gate electrode of the second thin-film transistor maybe formed after the formation of the gate insulating film.

The method also may be such that, when the second thin-film transistoris of the top-gate type, the source and drain regions of the first andsecond thin-film transistors are formed by ion implantation of theabove-mentioned impurities through a mask constituted by a resist,followed by an activation treatment, and thereafter a gate portioncomposed of a gate insulating film and the gate electrode of the secondthin-film transistor is formed.

The method also may be such that, when the second thin-film transistoris of the top-gate type, a gate portion of the second thin-filmtransistor, composed of a gate insulating film and a gate electrode madeof a heat-resistant material, is formed after the deposition of thesingle-crystal silicon layer, and the source and drain regions of thefirst and second thin-film transistors are formed by ion implantation ofthe above-mentioned impurities through a mask constituted by theabove-mentioned gate portion and a resist, followed by an activationtreatment.

The resist mask used when the LDD structure was formed may be leftunremoved and the ion implantation for forming the source and drainregions may be performed through a resist mask which covers theremaining mask.

The substrate may be optically opaque or transparent, and may beprovided with pixel electrodes for a reflective or transmissive display.

The display section may have a lamination configuration of the pixelelectrodes and a color filter layer which may be formed on a displayarray, whereby the aperture ratio and the luminance are improved andcosts can be decreased due to omission of a color filter substrate andimproved productivity.

When the pixel electrodes are reflective electrodes, unevenness ispreferably imparted to a resin film so that the resin film has optimizedreflective characteristics and viewing-angle characteristics, and thenthe pixel electrodes are formed, whereas, when the pixel electrodes aretransparent electrodes, the surface is preferably planarized by atransparent planarization film and then the pixel electrodes are formedon the planarized plane.

The display section is illuminated or dimmed by being driven by theabove-described MOSTFT: for instance, the display section may comprise,for example, a liquid crystal display (LCD), an electroluminescent (EL)display, a field emission display (FED), a light-emitting polymerdisplay (LEPD), or a light-emitting diode (LED) display. In this case,the arrangement may be such that a plurality of pixel electrodes arearranged in a matrix in the display section and a switching device isconnected to each pixel electrode.

In accordance with a fourth aspect of the present invention, there isprovided a method of producing an electrooptical device, as well as amethod of producing a driving substrate for such an electroopticaldevice, having a first substrate carrying a display section providedwith pixel electrodes and a peripheral-driving-circuit section providedon a periphery of the display section, a second substrate, and anoptical material disposed between the first substrate and the secondsubstrate; the method comprising the steps of: a gate-forming step forforming a gate portion including a gate electrode and a gate insulatingfilm on one face of the first substrate; a step-forming step for forminga step difference on the one face of the first substrate; alayer-forming step for forming a melt layer of a low-melting-point metalcontaining silicon on the first substrate having the gate portion andthe step difference; a deposition step for depositing a single-crystalsilicon layer by allowing the silicon of the melt layer to grow bygraphoepitaxy by a cooling treatment using as a seed the step differenceon the substrate; a step for effecting a predetermined treatment on thesingle-crystal silicon layer, thereby forming a channel region, a sourceregion and a drain region; and a step for forming a first thin-filmtransistor of bottom-gate type having the gate portions on the below thechannel region and constituting at least part of theperipheral-driving-circuit section. The above-mentioned thin-filmtransistor may be a field effect transistor (FET) or a bipolartransistor. The FET, when used, may be a MOS-type FET or a junction-typeFET.

In accordance with this aspect of the present invention, the sameadvantages as those offered by the first aspect of the invention areobtainable, except for the advantage derived in the first aspect fromthe use of the dual-gate structure of the thin-film transistor. Inaddition, this aspect offers the following advantage by virtue of theuse of the melt layer of silicon-containing low-melting-point metal.

Namely, the melt of the low-melting-point metal can be prepared at acomparatively low temperature of, for example, 350° C., and can easilybe applied to the substrate having the step differences serving as theseed, provided that the substrate has been heated to a temperatureslightly above the temperature at which the melt is prepared. Thus, asingle-crystal silicon layer can uniformly be formed at a comparativelylow temperature of from, for example, 350 to 400° C.

In the graphoepitaxy in used in this aspect of the present invention, asingle-crystal silicon thin-film having a variety of P-type impurityconcentration and high mobility can be readily produced by adjusting thecomposition ratio of the melt of the melting-point metal, thetemperature of the melt, the heating temperature of the substrate, andthe cooling rate, thus enabling easy control of the threshold voltage(Vth) of the device, which in turn enables the device to operate at ahigh speed due to reduced resistance.

The melt layer of the silicon-containing low-melting-point metal may bedoped with an adequate amount of Group III or V impurity, such as boron,phosphorus, antimony, arsenic, bismuth or aluminum, so that the type andthe concentration of the impurity in the epitaxial single-crystalsilicon, that is, the type (P-type or N-type) and the carrierconcentration, are controllable.

Other features of the fourth aspect are substantially the same as thoseof the first, second and third aspects of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A to 1C are cross-sectional views showing production steps of aliquid crystal display (LCD) in accordance with a first embodiment of afirst aspect of the present invention;

FIGS. 2A to 2C are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the first embodiment ofthe present invention;

FIGS. 3A to 3C are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the first embodiment ofthe present invention;

FIGS. 4A to 4C are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the first embodiment ofthe present invention;

FIGS. 5A to 5C are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the first embodiment ofthe present invention;

FIGS. 6A to 6C are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the first embodiment ofthe present invention;

FIGS. 7A to 7C are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the first embodiment ofthe present invention;

FIG. 8 is a cross-sectional view of a critical portion of the LCD of thefirst embodiment;

FIGS. 9A and 9B are schematic perspective views showing deposition ofsilicon crystals on an amorphous substrate;

FIGS. 10A to 10F are cross-sectional views showing the shapes of thestep difference and the orientation of the deposited silicon crystal ingraphoepitaxy;

FIGS. 11A and 11B are equilibrium diagrams of a Si—In alloy and a Si—Gaalloy, respectively;

FIG. 12 is a schematic perspective view of a LCD in accordance with afirst embodiment of the present invention;

FIG. 13 is an equivalent circuit diagram of the LCD in accordance withthe first embodiment of the present invention;

FIG. 14 is a schematic block diagram of the LCD in accordance with thefirst embodiment of the present invention;

FIGS. 15A to 15C are cross-sectional views showing production steps of aLCD in accordance with a second embodiment of the present invention;

FIGS. 16A and 16B are cross-sectional views showing production steps ofa LCD in accordance with a third embodiment of the present invention;

FIGS. 17A-17C are cross-sectional views showing production steps of aLCD in accordance with a fourth embodiment of the present invention;

FIG. 18 is a cross-sectional view of a critical portion of the LCD ofthe second embodiment;

FIGS. 19A to 19D are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the fourth embodiment ofthe present invention;

FIGS. 20A to 20C are cross-sectional views showing production steps of aLCD in accordance with a seventh embodiment of the present invention;

FIGS. 21A to 21D are cross-sectional views showing production steps ofthe LCD in accordance with the seventh embodiment of the presentinvention;

FIGS. 22A to 22E are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the seventh embodiment ofthe present invention;

FIGS. 23A to 23D are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the seventh embodiment ofthe present invention;

FIGS. 24A to 24D are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the seventh embodiment ofthe present invention;

FIGS. 25A to 25C are cross-sectional views showing production steps ofthe LCD in accordance with the seventh embodiment of the presentinvention;

FIGS. 26A to 26D are cross-sectional views showing production steps ofthe LCD in accordance with the seventh embodiment of the presentinvention;

FIGS. 27A to 27D are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the seventh embodiment ofthe present invention;

FIGS. 28A to 28C are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the seventh embodiment ofthe present invention;

FIGS. 29A and 29B are cross-sectional views showing production steps ofa LCD in accordance with an eighth embodiment of the present invention;

FIGS. 30A to 30C are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the eighth embodiment ofthe present invention;

FIGS. 31A and 31B are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the eighth embodiment ofthe present invention;

FIGS. 32A and 32B are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the eighth embodiment ofthe present invention;

FIGS. 33A to 33C are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the eighth embodiment ofthe present invention;

FIGS. 34A to 34C are cross-sectional views showing the subsequentproduction steps of the LCD in accordance with the eighth embodiment ofthe present invention;

FIGS. 35A to 35C are cross-sectional views of main portions in theproduction steps of the LCD in accordance with the eighth embodiment ofthe present invention;

FIGS. 36A and 36B are cross-sectional views of main portions in theproduction steps of the LCD in accordance with the eighth embodiment ofthe present invention;

FIGS. 37A to 37E are plan views and cross-sectional views of variousTFTs in a LCD in accordance with a ninth embodiment of the presentinvention;

FIGS. 38A to 38C are cross-sectional views of various TFTs in the LCDunder production in accordance with the ninth embodiment of the presentinvention;

FIG. 39 is a cross-sectional view of the LCD in accordance with theninth embodiment of the present invention;

FIGS. 40A and 40B are a cross-sectional view of a critical portion of anLCD in accordance with a tenth embodiment of the present invention;

FIGS. 41A and 41B are cross-sectional views of critical portions of TFTsin the LCD in accordance with the tenth embodiment of the presentinvention;

FIGS. 42A to 42C are equivalent circuit diagrams of TFTS in the LCD inaccordance with the tenth embodiment of the present invention;

FIGS. 43A and 43B are cross-sectional views of TFTs in a LCD inaccordance with an eleventh embodiment of the present invention;

FIGS. 44 to 52 are tables showing various combinations of TFTs in adisplay section and a peripheral-driving-circuit section of a LCD inaccordance with a twelfth embodiment of the present invention;

FIGS. 53A to 53C are outline schematic views of devices in accordancewith a thirteenth embodiment of the present invention;

FIG. 54 is a table showing combinations of TFTs in the display sectionand the peripheral-driving-circuit section of the LCD in accordance withthe thirteenth embodiment of the present invention;

FIG. 55 is a schematic view of a device in accordance with a fourteenthembodiment of the present invention; and

FIGS. 56A and 56B are cross-sectional views of an EL device and an FED,respectively, in accordance with a fifteenth embodiment of the presentinvention;

FIGS. 57A and 57B are sectional views showing steps of a process forproducing an LCD in accordance with a first embodiment of a secondaspect of the present invention;

FIGS. 58A to 58C are sectional views showing steps of a process forproducing an LCD in accordance with a second embodiment of a secondaspect of the present invention;

FIG. 59 is a sectional view of a critical portion of the LCD of thesecond embodiment;

FIGS. 60A to 60C are sectional views showing subsequent steps of theprocess for producing the LCD of the second embodiment of the secondaspect of the present invention;

FIGS. 61A to 61D are sectional views showing steps of a process forproducing an LCD of a fifth embodiment of the second aspect of thepresent invention;

FIGS. 62A to 62D are sectional views showing subsequent steps of theprocess for producing LCD of the fifth embodiment of the second aspectof the present invention;

FIGS. 63A to 63C are sectional views showing steps of a process forproducing an LCD in accordance with a first embodiment of a third aspectof the present invention;

FIGS. 64A to 64C are sectional views showing subsequent steps of theprocess for producing LCD in accordance with the first embodiment of thethird aspect of the present invention;

FIGS. 65A to 65C are sectional views showing subsequent steps of theprocess for producing LCD in accordance with the first embodiment of thethird aspect of the present invention;

FIGS. 66A to 66C are sectional views showing subsequent steps of theprocess for producing LCD in accordance with the first embodiment of asecond aspect of the present invention;

FIGS. 67A to 67C are sectional views showing steps of a process forproducing an LCD in accordance with a fourth embodiment of the thirdaspect of the present invention;

FIGS. 68A to 68B are sectional views showing steps of a process forproducing an LCD in accordance with an eighth embodiment of the thirdaspect of the present invention;

FIGS. 69A to 69C are sectional views showing steps of the process forproducing an LCD in accordance with the eighth embodiment of the thirdaspect of the present invention;

FIGS. 70 to 78 are tables showing various combinations of TFTs in adisplay section and a peripheral-driving-circuit section of a LCD inaccordance with a twelfth embodiment of the third aspect of the presentinvention;

FIGS. 79A to 79C are sectional views showing critical portions of an LCDin accordance with a fifth embodiment of a fourth aspect of the presentinvention:

FIGS. 80A to 80D are sectional views showing steps of a process forproducing the LCD of the fifth embodiment of the fourth aspect of thepresent invention;

FIGS. 81A to 81C are sectional views showing steps of a process forproducing the LCD of the fifth embodiment of the fourth aspect of thepresent invention;

DESCRIPTION OF THE PREFERRED EMBODIMENTS

The present invention will now be described in more detail withreference to the following preferred embodiments.

A description will first be given of first to fifteenth embodiments ofthe first aspect of the present invention which employs alow-melting-point metal layer and which has the step of forming adual-gate first thin-film transistor.

FIG. 1A to FIG. 14 show a first embodiment of the first aspect of thepresent invention.

The first embodiment relates to an active-matrix reflective liquidcrystal display (LCD) having a peripheral driving circuit incorporatingdual-gate MOSTFTs formed by a single-crystal silicon layer which areformed by graphoepitaxy of indium-silicon at high temperature using as aseed an indented section defined by a step difference provided on asubstrate as a seed. FIGS. 12 to 14 show an overall layout of thereflective LCD.

With reference to FIG. 12, the active-matrix reflective LCD has a flatpanel configuration including a main substrate 1 (active-matrixsubstrate) and a counter substrate 32 which are bonded to each otherwith a spacer provided therebetween (not shown in this Figure), and thespace between the main substrate 1 and the counter substrate 32 isfilled with a liquid crystal (not shown in this Figure). Provided on asurface of the main substrate 1 are a display section which includespixel electrodes 29 or 41 arranged in a matrix and switching devices 112for driving the pixel electrodes, and peripheral driving circuitsections connected to the display section.

Each switching device in the display section is composed of an nMOS,pMOS, or cMOS top-gate TFT having a LDD structure in accordance with thepresent invention. Also, in the peripheral-driving-circuit sections,cMOS, nMOS and/or pMOS dual-gate MOSTFTs in accordance with the presentinvention are formed as circuit components. One of theperipheral-driving-circuit sections includes a horizontal drivingcircuit which drives the TFTs of the pixels in a line-by-line fashionwhile supplying these pixels with data signals, whereas the other of theperipheral-driving-circuit portions is a vertical driving circuit whichdrives the gates of the TFTs of the pixels on the scan-line-basis, boththe horizontal and vertical driving circuits being arranged on bothperipheral sides of the display section. These driving circuits may be adot-sequential analog type or a line-sequential digital type.

With reference to FIG. 13, the TFTs are arranged at intersections ofgate bus lines and orthogonal data bus lines, and are activated to writeimage information into liquid crystal capacitors (C_(LC)) and the chargein the liquid crystal capacitors is retained until the next informationis written. Since the channel resistance of each TFT is not sufficientto retain the information, a storage capacitor (C_(S)), serving as anauxiliary capacitor, may be provided in parallel to the liquid crystalcapacitor to compensate for a drop of voltage across the liquid crystaldue to a leakage current. Characteristics required for TFTs used in thepixel or display region are different from characteristics required forTFTs used in the peripheral driving circuits: namely, an importantproperty of the TFTs in the pixel region is to control an OFF currentand to retain an ON current. Providing TFTs having a LDD structure inthe display section can reduce an electric field between the gate andthe drain and thus reduces the effective electric field applied to thechannel region, the OFF current and a change in characteristics. Theproduction process, however, is complicated, the size of the device isinevitably increased, and the ON current is decreased. Thus, the designsmust be optimized to meet the respective purposes.

Among the usable liquid crystals are TN liquid crystals (nematic liquidcrystals used in a TN mode of active-matrix driving), super-twistednematic (STN) liquid crystals, guest-host (GH) liquid crystals, phasechange (PC) liquid crystals, ferroelectric liquid crystals (FLCs),antiferroelectric liquid crystals (AFLCs), and polymer dispersion-typeliquid crystals (PDLCs).

The system of and the method for driving the peripheral driving circuitswill now be briefly described with reference to FIG. 14. The drivingcircuits include a gate driving circuit and a data driving circuit eachof which must implement a shift register. Each shift resistor generallymay be a cMOS circuit including both pMOSTFTs and nMOSTFTs or may be acircuit including either pMOSTFTs or nMOSTFTs, among which suitably usedis a cMOSTFT or cMOS circuit in view of the operational speed,reliability, and low power consumption.

The scanning driving circuit includes shift registers and buffers andsupplies pulses to lines in synchronism with a horizontal scanningperiod. The data driving circuit may be a dot-sequential driving systemor a line-sequential driving system, but the dot-sequential drivingsystem as illustrated has a relatively simplified configuration andwrites display signals directly into pixels through analog switchesunder control of the shift registers. The signals are sequentiallywritten into pixels in a line within a scanning time for the line (R, Gand B in the drawing schematically represent red, green and bluepixels).

With reference to FIGS. 1A to 10F, the active-matrix reflective LCD inthis embodiment will be described in accordance with the productionsteps. In FIGS. 1A to 6C, the left side of each drawing shows theproduction steps for the display section and the right side shows theproduction steps for the peripheral-driving-circuit section.

Referring first to FIG. 1A, a film 71 of about 500 to 600 nm thick isformed from a molybdenum/tantalum (Mo—Ta) alloy by sputtering on a majorsurface of an insulating substrate 1 made of, for example, a quartzglass or a transparent crystalline glass.

Then, as shown in FIG. 1B, a photoresist 70 is formed in a given patternand the Mo—Ta film 71 is taper-etched through a mask constituted by thephotoresist 70, whereby a gate electrode 71 is formed to have side facesthat are gently slanted at an angle of 20 to 45 degrees to provide asubstantially trapezoidal cross-section.

Then, as shown in FIG. 1C, a gate insulating film composed of an SiNfilm 72 (about 100 nm thick) and an SiO₂ film 73 (about 200 nm thick)laminated in this order is deposited by, for example, a plasma CVDprocess on the substrate 1 having the molybdenum.tantalum alloy film 71,after removal of the photoresist 70.

Subsequently, as shown in FIG. 2A, a photoresist 2 having a givenpattern is formed in at least a TFT-forming region, and the surface isirradiated with, for example, F⁺ ions 3 of CF₄ plasma through the maskconstituted by the photoresist 2, and a plurality of step differences 4having a given shape and a given size are formed in the gate insulatingfilm (and further in the substrate 1) by typical photolithography, suchas reactive ion etching (RIE), and then by etching (photoetching).

The insulating substrate 1 may be composed of a highly-heat-resistantsubstrate having a diameter of 8 to 12 inches and a thickness of 700 to800 μm, such as quartz glass, crystallized glass, or ceramic, althoughin a transmissive LCD described below an opaque ceramic substrate cannotbe used. The step differences 4 function as seeds for graphoepitaxy ofsingle-crystal silicon. Each step difference 4 has, for example, a depthd of 0.3 to 0.4 μm, a width w of 2 to 10 μm, and a length l of 10 to 20μm (in the direction perpendicular to the drawing sheet). The basilarangle defined by the bottom face and the side face is a right angle. Inorder to prevent diffusion of ions such as Na ions from the glasssubstrate, an SiN film of, for example, 50 to 200 nm thick and, asdesired, a silicon oxide film (referred to as SiO₂ film, hereinafter)of, for example, 100 nm thick may be formed on the glass substrate, inadvance of the steps described heretofore.

With reference to FIG. 2B, after the photoresist layer 2 is removed, apolycrystalline silicon film 5 having a thickness of several μm to 0.005μm, for example, 0.1 μm, is deposited on the entire surface includingthe step differences 4 by a known catalytic CVD process, aplasma-enhanced CVD process, or a sputtering process. Since both sidefaces of the underlying gate electrode 71 are gently slanted, impedimentto epitaxial growth attributable to the presence of the step differences4 does not occur on these side faces, whereby a single-crystal siliconlayer 7 grows on these side faces without discontinuity. Although anamorphous silicon film may be formed in place of the polycrystallinesilicon film 5, the polycrystalline silicon film 5 will be described asa typical example in this embodiment.

Then, as shown in FIG. 2C, an indium film 6 is formed on the polysiliconfilm 5 by a MOCVD process, a sputtering process or a vacuum evaporationprocess using trimethylindium, in which the thickness of the indium film6 is, for example, 10 to 15 μm which is several ten to several hundredtimes the thickness of the polycrystalline silicon film 5.

The substrate 1 is placed in a hydrogen-based atmosphere, such ashydrogen, a nitrogen-hydrogen mixture, or an argon-hydrogen mixture at atemperature not higher than 1,000° C., preferably 900 to 930° C., for 5minutes. The polycrystalline silicon 5 is thereby melted into the meltof the indium film 6. Silicon in this melt can be precipitated at atemperature which is significantly lower than the original precipitationtemperature. The substrate 1 may be uniformly heated using an electricalfurnace etc or, alternatively, a predetermined region, for example, aTFT-forming region of the substrate 1 may be locally heated using laseror electron beams.

Then, the substrate 1 is gradually cooled so that silicon dissolved inindium is deposited by graphoepitaxy, using the bottom corner of eachstep difference 4 as a seed, as show in FIG. 3A, whereby a P-typesingle-crystal silicon layer 7 having a thickness of, for example,approximately 0.1 μm is formed.

In the single-crystal silicon layer 7 as deposited, a (100) plane isepitaxially grown on the substrate, and this is known as graphoepitaxy.With reference to FIGS. 9A and 9B, a vertical wall, such as theabove-mentioned step difference 4, is formed on the amorphous substrate1, such as a glass substrate and an epitaxial layer is formed thereon,so that the (100) plane of a single-crystal is grown along the side faceof the step difference 4 as shown in FIG. 9B, whereas a crystal havingrandom plane orientation is grown on a flat amorphous substrate 1, asshown in FIG. 9A. The size of the single-crystal grain increases inproportion to the temperature and the time: when the temperature islowered or when the time is shortened, the distance between the stepdifferences should be decreased. The orientation of the grown crystalcan be controlled by changing the shape of the step differences, asshown in FIGS. 10A to 10F. When MOS transistors are formed, the (100)plane is most frequently used. Accordingly, the step difference 4 canhave any cross-sectional shape which facilitates crystal growth, forexample, the angle at the bottom corner (basilat angle) may be a rightangle or, alternatively, the side wall may be inclined inwardly oroutwardly towards the lower end. The basilar angle of the stepdifference 4 is preferably 90° or less and the bottom corner ispreferably slightly rounded.

With reference to FIG. 3B, after the deposition of the single-crystalsilicon layer by graphoepitaxy on the substrate 1, the indium film 6Adeposited on the surface is removed using hydrochloric acid or sulfuricacid, followed by post-treatment to avoid the formation of a low-gradesilicon oxide film, whereby a bottom-gate MOSTFT and a top-gate MOSTFTare formed in the peripheral-driving-circuit section and in the displaysection, respectively, using the single-crystal silicon layer 7 as thechannel regions.

The single-crystal silicon layer 7 deposited by graphoepitaxy containsis a p-type layer due to its indium content, and the concentration ofthe P-type impurity fluctuates, so that adjustment of the specificresistance is performed by doping with p-type impurity ions such as B⁺at 10 kV and at a dosage of 2.7×10¹¹ atoms/cm, with the p-channel MOSTFTsection masked by a photoresist (not shown in the drawing). Withreference to FIG. 3C, in order to control the concentration of theimpurity in the pMOSTFT-forming region, the nMOSTFT section is maskedwith a photoresist 60 and is doped with n-type impurity ions 65 such asP⁺ at 10 kV and at a dosage of 1×10¹¹ atoms/cm² to form an n-type well7A.

With reference to FIG. 4A, a SiO₂ film having a thickness ofapproximately 200 nm and then a SiN film having a thickness ofapproximately 100 nm are continuously deposited on the entiresingle-crystal silicon layer 7 by a plasma-enhanced CVD process, ahigh-density plasma-enhanced CVD process or a catalytic CVD process toform a gate insulating film 8, followed by a sputtering to deposit amolybdenum-tantalum (Mo—Ta) alloy film 9 of 500 to 600 nm thereon.

With reference to FIG. 4B, photoresist patterns 10 are formed in thestep difference regions (indented sections) of the TFT sections in thedisplay region and outside the step difference regions of the TFTsections of the peripheral driving region by any conventionalphotolithographic process, and a continuous etching is executed, wherebygate electrodes 11 of the Mo—Ta alloy film and gate insulating films 12of SiN—SiO₂ are formed and the single-crystal silicon layer 7 isexposed. The Mo—Ta alloy film 9 is etched using an acidic etchant, SiNis etched by plasma etching using CF₄ gas, and SiO₂ is etched using ahydrofluoric acidic etchant.

With reference to FIG. 4C, all of the nMOSs and pMOSTFTs in theperipheral driving region, as well as the gate sections of the nMOSTFTsin the display region, are covered with a photoresist 13, and theexposed source and drain regions of the nMOSTFTs are doped with, forexample, phosphorus ions 14 by ion implantation at 20 kV and at a dosageof 5×10¹³ atoms/cm² to form LDD sections 15 of an N⁻-type layer byself-alignment.

With reference to FIG. 5A, all of the pMOSTFTs in the peripheral drivingregion, the gate sections of the nMOSTFTs in the peripheral drivingregion, and the gate sections and the LDD sections of the nMOSTFTs inthe display region are covered with a photoresist 16, and the exposedregions are doped with phosphorus or arsenic ions 17 by ion implantationat 20 kV and at a dosage of 5×10¹⁵ atoms/cm² to form source sections 18,drain sections 19 and the LDD sections 15 of an N⁺-type layer of thenMOSTFTs.

With reference to FIG. 5B, all of the nMOSTFTs in the peripheral drivingregion and the display region and the gate sections of the pMOSTFTs inthe peripheral driving region are covered with a photoresist 20, and theexposed regions are doped with boron ions 21 by ion implantation at 10kV and at a dosage of 5×10¹⁵ atoms/cm² to form source sections 22 anddrain sections 23 of an P⁺-type layer of the pMOSTFTS. In the case of annMOS peripheral driving circuit, this step is not necessary since thecircuit does not have a pMOSTFT.

With reference to FIG. 5C, in order to island the active device sectionsincluding TFTs and diodes and the passive device sections includingresistors and inductors, photoresist layers 24 are provided on all ofthe active device sections and the passive device sections in theperipheral driving region and the display section, and thesingle-crystal silicon layer 7 in other sections is removed by aconventional photolithographic process or an etching process using ahydrofluoric acid solution.

With reference to FIG. 6A, a SiO₂ film having a thickness ofapproximately 200 nm and then a phosphosilicate glass (PSG) film havinga thickness of approximately 300 nm are continuously deposited to form aprotective film 25 on the entire surface by a plasma-enhanced CVDprocess, a high-density plasma-enhanced CVD process or a catalytic CVDprocess.

In such a state, the single-crystal silicon layer is activated.Activation treatment is performed at approximately 1,000° C. forapproximately 10 seconds using, for example, a halogen lamp, and thegate electrode composed of the Mo—Ta alloy having a high melting pointis durable during the annealing for activation. The Mo—Ta alloy can beused not only for the gate section but also as lead lines over a widerange. In the activation, excimer laser annealing requiring high processcosts is generally not used. If excimer laser annealing is used,overlapping scanning of 90% or more is preferably performed on theentire surface or selectively the active device section and the passivedevice section using XeCl (wavelength: 308 nm).

With reference to FIG. 6B, contact holes are formed for all of thesource-drain sections of the TFTS in the peripheral driving circuit andthe source sections of the TFTs in the display region, by a conventionalphotolithographic process and an etching process.

A film having a thickness of 500 to 600 nm is formed on the entiresurface, from aluminum or an aluminum alloy, e.g., an aluminum alloycontaining 1 wt % Si or 1 to 2 wt % copper and, by a conventionalphotolithographic process and an etching process, source electrodes 26of all TFTs both in the peripheral driving circuit section and thedisplay section, as well as the drain electrodes 27 in the peripheraldriving circuit section, are formed, simultaneously with the formationof data lines and gate lines. The structure thus formed is subjected tosintering at approximately 400° C. for 1 hour in a forming gas (N₂+H₂).

With reference to FIG. 6C, an insulating film 36 composed of a PSG filmwith a thickness of approximately 300 nm and a SiN film with a thicknessof approximately 300 nm is formed on the entire surface by aplasma-enhanced CVD process, a high-density plasma-enhanced CVD process,or a catalytic CVD process. Next, contact holes are formed for the drainsections of TFTs in the display region. It is not necessary to removethe SiO₂, PSG and SiN films in the pixel sections.

Basic requirements of a reflective liquid crystal display are to reflectthe light incident on the display towards the interior of the liquidcrystal panel and, at the same time, to scatter the light. This isbecause the direction of the incident light is uncertain whereas theposition of the observer with respect to the display is substantiallyfixed. Thus, the reflector must be designed on an assumption that pointlight sources are present at arbitrary positions. As shown in FIG. 7A, aphotosensitive resin film 28 having a thickness of 2 to 3 μm is formedon the entire surface by spin coating and, as shown in FIG. 7B, anuneven pattern is formed in at least the pixel region by a conventionalphotolithographic process and an etching process so that the pixelsection has optimized reflective characteristics and viewing-anglecharacteristics, followed by a reflow to form a lower portion of thereflective face of an uneven surface 28A. Contact holes aresimultaneously formed in the resin film for the drain sections of TFTsin the display region.

With reference to 7C, a sputtering film having a thickness of 400 to 500nm is deposited from aluminum or an aluminum alloy, e.g., an alloycontaining 1 wt % Si, on the entire surface, and the sputtering film atthe region other than the pixel sections is removed by a generalphotolithographic process and an etching process, thereby to form anuneven aluminum reflective sections 29 which are connected to the drainsections 19. The reflective sections 29 are used as pixel electrodes fordisplaying. Next, these are subjected to sintering at approximately 300°C. for 1 hour in a forming gas to enhance the contact. Silver or asilver alloy may be used instead of aluminum to increase thereflectance.

As described above, a single-crystal silicon layer 7 is formed byhigh-temperature graphoepitaxy using the step differences as the seeds,and an active-matrix substrate 30 integrating a display section and aperipheral-driving-circuit section is produced by forming, both in thedisplay section and in the peripheral-driving circuit section whichemploy the single-crystal silicon layer 7, top-gate nMOSLDD-TFTs andcMOS circuits which are composed of dual-gate pMOSTFTs and dual-gatenMOSTFTs.

With reference to FIG. 8, a method of producing a reflective liquidcrystal display using the active-matrix substrate (driving substrate) 30will now be described. Hereinafter, the active-matrix substrate isreferred to as a TFT substrate.

When a liquid crystal cell in this LCD is produced by double-sideassembly (suitable for medium to large liquid crystal panels of 2 inchesor greater), polyimide alignment films 33 and 34 are formed one surfaceof the TFT substrate 30 and on a device-mounting surface of a counterelectrode 32 having a solid indium tin oxide (ITO) electrode,respectively. The polyimide alignment films are formed by roll coatingor spin coating so that thicknesses are in a range of 50 to 100 nm andare cured at 180° C. for 2 hours.

The TFT substrate 30 and the counter substrate 32 are aligned by rubbingor by an optical method. Although rubbing may be performed using cottonor rayon, cotton is preferable in view of dust produced by rubbing andretardation. In optical alignment, liquid crystal molecules are alignedby noncontact linearly polarized UV light irradiation. Polymer alignmentfilm can also be formed by polarized or unpolarized light which isdiagonally incident, such polymer films being, for example, polymethylmethacrylate polymers containing azobenzene.

After washing, a common material is applied to the TFT substrate 30whereas a sealing agent is applied to the counter electrode 32. Thewashing is conducted with water or IPA (isopropyl alcohol), for thepurpose of removing buffing dust. The common material may be an acrylic,an epoxy-acrylate or epoxy adhesive containing a conductive filler,while the sealing agent may be an acrylic, an epoxy-acrylate or epoxyadhesive. Although curing may be performed by heating, UV irradiation,or a combination thereof, a combination of heating and UV irradiation ispreferable due to high overlapping alignment accuracy and ready workingoperations.

Spacers are distributed on the counter substrate 32 to form a given gapand the counter substrate 32 is overlapped with the TFT substrate 30.After achieving alignment such that an alignment mark of the countersubstrate 32 is precisely aligned to an alignment mark of the TFTsubstrate 30, the sealing agent is preliminarily cured by UVirradiation, and then cured by heat at once.

Then, independent liquid crystal panels each having the TFT substrate 30and the counter electrode 32 are formed by scribe-break process.

The gap between the two substrates 30 and 32 is filled with a liquidcrystal 35 through an injection port which is then sealed with anUV-curable adhesive, and washing with isopropyl alcohol is executed. Anytype of liquid crystal may be used, and a nematic liquid crystal used ina twisted nematic mode having high-speed response is generally used.

The liquid crystal 35 is aligned by heating and a subsequent quenching.

Flexible lead lines are connected to the panel electrode extractionsection of the TFT substrate 30 by thermal compressive bonding using ananisotropic conductive film, and then a polarizer is bonded to thecounter electrode 32.

When the liquid crystal panel is produced by single-side assembly(suitable for compact liquid crystal panels of 2 inches or smaller),polyimide alignment films 33 and 34 are formed one surface of the TFTsubstrate 30 and on a device-mounting surface of the counter electrode32, respectively, and then these substrates 30 and 32 are aligned byrubbing or noncontact optical alignment using linearly polarized UVlight.

The TFT substrate 30 and the counter substrate 32 are divided intosegments by dicing or scribing and are washed with water or isopropylalcohol. A common material is applied to each divided TFT substrate 30whereas a sealing agent containing spacers is applied to each countersubstrate 32, and these substrates are overlapped with each other. Thesubsequent process is substantially the same as above.

In the above-described reflective LCD, he counter substrate 32 of thereflective LCD is a color filter (CF) substrate having a color filterlayer 46 provided below the ITO electrodes 31. The light incident to thecounter substrate 32 is effectively reflected by the reflective film 29and is emitted from the counter substrate 32.

Besides the substrate structure as shown in FIG. 8, the TFT substratemay have an on-chip color filter (OCCF) structure in which the TFTsubstrate 30 has a color filter, wherein ITO electrodes or ITOelectrodes with a black masks are directly bonded to the counterelectrode 32.

When the auxiliary storage capacitor (Cs) described before withreference to FIG. 13 is provided in the pixel section, a dielectriclayer (not shown in the drawing) provided on the substrate 1 isconnected to the drain region 19 of the single-crystal silicon.

As described above, this embodiment offers the following noticeableadvantages.

(A) The step differences 4 having a predetermined size and a shape areformed on the substrate 1, and the single-crystal silicon layer 7 isdeposited by high-temperature graphoepitaxy using the bottom corner ofeach step difference as a seed (heating during the graphoepitaxy isperformed at a relatively low temperature of 900 to 930° C.), whereby asingle-crystal silicon layer 7 having a high electron mobility of 540cm²/v·sec or more is obtained to enable production of a LCD havinghigh-performance drivers.

(B) The single-crystal silicon layer has higher electron or holemobility, comparable with that of a single-crystal silicon substrate andis higher than that of conventional amorphous or polycrystalline siliconthin-films, so that single-crystal silicon dual-gate MOSTFTs using thissingle-crystal silicon layer can implement an integral structurecomposed of a display section and a peripheral-driving-circuit section,wherein the display section has nMOSTFTs, pMOSTFTs or cMOSTFTs with LDDstructures that offer high switching performance and low-leak currentcharacteristics, while the peripheral-driving-circuit section includescMOSTFTs, nMOSTFTs and/or pMOSTFTs which exhibit high drivingperformance, thus implementing a display panel having high imagequality, high definition, a narrow frame, a large screen and a highluminescent efficiency. Since the single-crystal silicon layer 7 hassufficiently high hole mobility, the peripheral driving circuit candrive by using only electrons or holes, or by a combination thereof, andcan be combined with the display TFTs having pMOSTFT or cMOSTFTs withLDD structures, thus realizing an integrated panel structure. In compactto medium-sized panels, one of a pair of vertical peripheral drivingcircuits may be omitted.

(C) In particular, the use of dual-gate MOSTFTs in the peripheraldriving circuit makes it possible to obtain cMOS, nMOS or pMOSTFTshaving driving power 1.5 to 2.0 times as large that obtainable with theuse of single-gate TFTs, thus achieving higher performance and greaterdriving power of the TFTs, offering advantages particularly when TFTshaving large driving power are to be used in a local portion of theperipheral driving circuit. Furthermore, the dual-gate structure caneasily be changed to a top-gate type structure or a bottom-gate typestructure through a selection of one of the upper and lower gates and,in addition, ensures safe operation even in the event of a failure inone of the upper and lower gates because the other gate can safely beused.

(D) The polycrystalline or amorphous silicon layer 5 can be formed by aplasma-enhanced CVD process or a reduced-pressure CVD process at asubstrate temperature of 100 to 400° C,, while the low-melting-pointmetal layer 6 can be formed by a vacuum evaporation process or asputtering process and, in addition, heating during graphoepitaxy can beperformed at 930° C. or less, so that the single-crystal silicon layer 7can be uniformly formed on the insulating substrate at a relatively lowtemperature of, for example, 900 to 930° C. or less. Quartz glass,crystallized glass or ceramic can be used as a substrate.

(E) Since this process does not require long-term annealing at a mediumtemperature nor excimer annealing, which is essential for solid phaseepitaxy, this process has high productivity and does not requireexpensive facilities, resulting in reduced production costs.

(F) In the high-temperature graphoepitaxy, a single-crystal siliconlayer having a variety of p-type impurity concentrations and a highmobility can be readily produced by controlling the ratio of indium tosilicon, the heating temperature of the substrate, and the cooling rate,allowing the threshold voltage (Vth) to be readily controlled to reducethe resistance to facilitate high-speed operations.

(G) When a color filter is provided on the display array, the apertureratio of the display panel and the luminance are improved, and costs aredecreased due to omission of a color filter substrate and improvedproductivity.

FIGS. 15A to 15C show a second embodiment of the first aspect of thepresent invention.

This embodiment also is an active-matrix reflective LCD as is the caseof the first embodiment, but is different from the first embodiment inthat, after the processing shown in FIG. 2A, for example, an indium film6 having a thickness of 10 to 20 μm is formed on the entire surfaceincluding the step differences 4 by a sputtering process or a vacuumevaporation process, as shown in FIG. 15A.

With reference to FIG. 15B, an amorphous silicon film 5 having athickness of several μm to 0.005 μm (for example, 0.1 μm) is formed onthe indium film 6 by a known plasma-enhanced CVD process.

Since the temperature for forming the silicon film must notsignificantly exceed the melting point of the low-melting-point metal 6(156° C. for indium or 29.77° C. for gallium), it is difficult to form apolycrystalline silicon film which is optimally formed at 600° C. to650° C. Therefore, the amorphous silicon film 5 is formed on the indiumfilm 6 by a plasma-enhanced CVD process.

The substrate 1 is maintained in a hydrogen atmosphere at 1,000° C. orless (particularly 900 to 930° C.) for approximately 5 minutes so thatthe amorphous silicon film 5 is dissolved in the indium melt.

With reference to FIG. 15C, the substrate 1 is gradually cooled so thatthe silicon dissolved in the indium melt is deposited by graphoepitaxyon the substrate 1 using the step differences 4 as the seeds, whereby asingle-crystal silicon layer 7 having a thickness of, for example,approximately 0.1 μm is formed.

In this case, the (100) plane of the single-crystal silicon layer 7 isdeposited on the substrate by epitaxy as described before, and theorientation of the crystal layer can be controlled by changing the shapeof the step differences as shown in FIGS. 9A to 9F.

After the deposition of the single-crystal silicon layer 7 bygraphoepitaxy on the substrate 1, indium at the surface is removed byhydrochloric acid as in the first embodiment, and each TFT in thedisplay section and the peripheral-driving-circuit section is producedafter effecting a predetermined treatment on the single-crystal siliconlayer 7.

In this embodiment, heat-melting and cooling treatments are performedafter forming the amorphous silicon layer 5 on the low-melt-point metallayer 6 which is formed to cover the step differences 4, but thegraphoepitaxial growth of the single-crystal silicon from the melt ofthe low-melt-point metal takes place as in the case of the precedingembodiment.

FIGS. 16A and 16B show a third embodiment of the first aspect of thepresent invention.

This embodiment also is an active-matrix reflective LCD as is the caseof the first embodiment, but is different from the first embodiment inthat, after the processing shown in FIG. 2A, an indium film 6A having athickness of 10 to 20 μm and containing a given amount (for exampleapproximately 1 percent by weight) of silicon is formed on the entiresurface including the step differences 4 by a sputtering process or avacuum evaporation process, as shown in FIG. 16A.

The substrate 1 is maintained in a hydrogen atmosphere at 1,000° C. orless (particularly 900 to 930° C.) for approximately 5 minutes, so thatthe silicon is dissolved in the indium melt.

The substrate 1 is gradually cooled so that the silicon dissolved in theindium melt is deposited by graphoepitaxy on the substrate 1 using thestep differences 4 as a seed, whereby a single-crystal silicon layer 7having a thickness of approximately 0.1 μm is formed, as shown in FIG.16B.

The (100) plane of the single-crystal silicon layer 7 is deposited onthe substrate by epitaxy as described before, and the orientation of thecrystal layer can be controlled by changing the shape of the stepdifferences as shown in FIGS. 9A to 9F.

After the deposition of the single-crystal silicon layer 7 bygraphoepitaxy, indium at the surface is removed by hydrochloric acid asin the first embodiment, and each TFT in the display section and theperipheral-driving-circuit section is produced after effecting apredetermined treatment on the single-crystal silicon layer 7.

In this embodiment, heat-melting and cooling treatments are performedafter forming the amorphous silicon layer 5 on the low-melt-point metallayer 6 which is formed to cover the step differences 4, but thegraphoepitaxial growth of the single-crystal silicon from the melt ofthe low-melt-point metal takes place as in the case of the precedingembodiment.

FIGS. 17A and 19D show a fourth embodiment of the first aspect of thepresent invention.

This embodiment has, as in the case of the first embodiment, top-gateMOSTFTs in the display section and dual-gate MOSTFTs in the peripheraldriving circuit section, but pertains to a transmissive LCD, unlike thefirst embodiment. More specifically, in this embodiment, thetransmissive LCD is produced by following the procedure as Steps shownin FIG. 1A to FIG. 6C as in the first embodiment, but in the subsequentprocess, contact holes 19 for the drain sections of TFTs in the displaysection are formed in insulating films 25 and 36, as shown in FIG. 17A,and the unnecessary SiO₂ film, PSG film and Si film in the pixel-openingsection are removed to improve the transmittance.

Thus, an opaque ceramic substrate cannot be used.

With reference to FIG. 17B, a planarization film 28B, which is composedof an acrylic photosensitive transparent resin and has a thickness of 2to 3 μm, is formed on the entire surface by spin coating etc., and thencontact holes for drains of TFTs in the displaying section (displayTFTS) are formed in the transparent resin 28B, followed by curing of thetransparent resin 28B executed under a given condition.

With reference to FIG. 17C, an ITO film having a thickness of 130 to 150nm is formed on the entire surface by sputtering, and then an ITOtransparent electrodes 41 in contact with the drain section 19 in thedisplay region are formed by photolithography and etching. Next, aheat-treatment in a forming gas at 200 to 250° C. for 1 hour isperformed to reduce the contact resistance between the drain of each TFTin the display section and the ITO and to improve the transparency ofthe ITO.

Then, a transmissive LCD is assembled combining this TFT substrate 1with a counter substrate 32 as in the first embodiment, as shown in FIG.18. In this embodiment, however, a polarizer is provided also on the TFTsubstrate. Although transmission light runs in this transmissive LCD asshown by a solid line in the drawing, the arrangement may be such thattransmission light is available from the counter substrate 32.

An on-chip color-filter (OCCF) structure and an on-chip black (OCB)structure can be made from this transmissive LCD, as follows.

After performing Steps shown in FIGS. 1A to 6A, contact holes are alsoformed at the drain sections of the PSG-SiO₂ insulating film 25 as shownin FIG. 19A, and an aluminum embedded layer 41A for a drain electrode isformed, followed by deposition of the SiN-PSG insulating film 36.

With reference to FIG. 19B, a photoresist 61 containing a red, green orblue pigment having a thickness of 1 to 1.5 μm is formed on thecorresponding color segments and, as shown in FIG. 19C, color filterlayers 61(R), 61(G) and 61(B) are formed by a general photolithographicprocess in such a pattern as to leave the colors only at predeterminedlocations corresponding to the pixels. (OCCF structure). Contact holesare also formed at the drain sections. This embodiment excludes the useof an opaque ceramics substrates and substrates made oflow-transmissivity glass or heat-resistant resin.

With reference to FIG. 19C, a metal shading layer 43 servable as a blackmask layer is formed over the contact holes communicating with thedrains of the display TFTs and over the color filter layer, by apatterning process using a metal. For example, a molybdenum film havinga thickness of 200 to 250 nm is formed by a sputtering process and isthen patterned to form a given shape for shading the display TFTs (OCBstructure).

With reference to FIG. 19D, a planarization film 28B composed of atransparent resin is formed, and then ITO transparent electrodes 41 areformed so as to connect to the shading layer 43 through the contactholes provided in the planarization film.

The color filter 61 and the shading layer (black mask) 43 formed on thedisplay array section improves the aperture ratio of the liquid crystaldisplay panel and decreases electrical power consumption of the displaymodule including a back light.

A fifth embodiment of the first aspect of the present invention will nowbe described.

This embodiment relates to an active-matrix reflective liquid crystaldisplay (LCD) including top-gate MOSTFTs formed of a single-crystalsilicon layer which is deposited by low-temperature graphoepitaxy froman indium-gallium-silicon or gallium-silicon melt, using as seeds stepdifferences (indents) on a glass substrate having a low distortionpoint.

In contrast to the first embodiment, the substrate 1 used in thisembodiment is a glass substrate having a low distortion point or maximumusable temperature as low as 600° C. or so, such as borosilicate glassor aluminosilicate glass, as the substrate employed in Step shown inFIG. 1A. Such a glass is inexpensive and can easily be produced in largesizes, e.g., 500 mm×600 mm×0.1 to 1.1 mm can be formed using long rolledglass. Obviously, quartz and crystallized glass may be used as well.

After forming the step differences 4 as in the preceding embodiments, anindium-gallium (or gallium) film is formed in Step shown in FIG. 2C onthe polycrystalline silicon film S by a MOCVD, sputtering or vacuumevaporation process using trimethyl indium gallium or trimethyl galliumso that the thickness thereof becomes several ten to several hundredtimes the thickness of the polycrystalline silicon film 5, for example,the thickness becomes 10 to 20 μm.

The substrate 1 is maintained in a hydrogen atmosphere at 300 to 600° C.(or 420 to 600° C.) for 5 minutes. As a result, the polycrystallinesilicon 6 (or amorphous silicon) is dissolved into the indium-gallium orgallium melt. Silicon in the melt is precipitated at a temperature whichis lower than the temperature for pure silicon.

When the substrate 1 is gradually cooled, as shown in FIG. 3A, silicondissolved in indium-gallium (or indium) is deposited by graphoepitaxy onthe bottom corners of the step differences 4 serving as seeds to form asingle-crystal silicon layer 7 having a thickness of, for example, 0.1μm.

In this case also, the (100) plane of the single-crystal silicon layer 7is deposited on the substrate by epitaxy and the orientation of thecrystal layer can be controlled by changing the shape of the stepdifferences 4, as shown in FIGS. 9A to 9F.

After the deposition of the single-crystal silicon layer 7 bygraphoepitaxy on the substrate 1, indium and gallium at the surface areremoved by hydrochloric acid or sulfuric acid, as shown in FIG. 2C.

Using the single-crystal silicon layer 7, top-gate MOSTFTs are formed inthe display section and bottom-gate MOSTFTs are formed in theperipheral-driving-circuit section, as in the first embodiment. Thestructure shown in FIG. 8 may also be employed in this embodiment.

This embodiment has the following noticeable advantages, in addition tothe advantages of the first embodiment.

(A) The single-crystal silicon layer 7 can be more uniformly formed onthe glass substrate 1 by graphoepitaxy at a lower temperature ofapproximately 300 to 600° C. (or 420 to 600° C.).

(B) This process enables the formation of the single-crystal siliconlayer on an insulating substrate such as an organic substrate, otherthan the glass substrate, allowing the use of any inexpensive materialhaving a low distortion point and improved physical properties as thesubstrate, thus facilitating production of large-size substrates.Accordingly, a thin, long and rolled glass or organic substrate providedwith a single-crystal silicon layer can be produced using such amaterial at a reduced cost and with high productivity. When theconstituents in the glass substrate are diffused into the upper layerand affect the transistor characteristics, a thin barrier layer, forexample, a silicon nitride layer having a thickness of 50 to 200 nm, ispreferably provided, in order to suppress such a diffusion.

(C) In the low-temperature graphoepitaxy, a single-crystal silicon layerhaving a variety of p-type impurity concentrations and a high mobilitycan be readily produced by controlling the ratio of indium to gallium ofthe indium-gallium film, the heating temperature of the substrate, andthe cooling rate, thus facilitating the control of the threshold voltage(Vth) and reducing the resistance to afford high-speed operation.

A sixth embodiment of the first aspect of the present invention will nowbe described.

In contrast to the preceding fifth embodiment, this embodiment relatesto a transmissive LCD in which a single-crystal silicon layer is formedby low-temperature graphoepitaxy using an indium-gallium film, as in thefourth embodiment.

Using the single-crystal silicon layer, the transmissive LCD is producedby the process shown in FIG. 17A to FIG. 19D, as in the fourthembodiment. Opaque ceramic substrates and opaque or translucent organicsubstrates are not suitable for the transmissive LCD.

Accordingly, this embodiment has the advantages of both the fourth andfifth embodiments. Thus, this embodiment offers the following advantagesin addition to those produced by the first embodiment: borosilicateglass and heat-resistant organic materials which are inexpensive andfacilitate the formation of long thin rolled substrates can be used asthe substrate 1; the conductive type and Vth of the single-crystalsilicon layer can be readily adjusted by the ratio of indium to gallium;and the color filter 42 and the black mask 43 provided on the displayarray section improve the aperture ratio of the liquid crystal displaypanel and decreases electrical power consumption of the display moduleincluding a back light.

FIGS. 20A to 28C show a seventh embodiment of the first aspect of thepresent invention.

In this embodiment, the peripheral-driving-circuit section includes acMOS driving circuit including dual-gate-type pMOSTFTs and nMOSTFTs asin the first embodiment. The display section is of a reflective type andincludes TFTs having various gate configurations arranged in a variety ocombinations.

The display section shown in FIG. 20A includes top-gate nMOSLDD-TFTs asin the first embodiment, while the display section shown in FIG. 20Bincludes bottom-gate nMOSLDD-TFTs, whereas the display section shown inFIG. 20C includes dual-gate nMOSLDD-TFTs. These bottom-gate anddual-gate MOSTFTs can be produced by the same process for the dual-gateMOSTFTs of the peripheral-driving-circuit section, as will be describedlater, the dual-gate MOSTFT having higher driving ability and beingsuitable for high-speed switching by virtue of the presence of upper andlower gates and, furthermore, the upper or lower gate may be selectivelyused to implement a top- or bottom-gate type during operation.

In the bottom-gate MOSTFT shown in FIG. 20B, a gate electrode 71 iscomposed of, for example, molybdenum-tantalum, and a gate insulting filmis composed of a SiN film 72 and a SiO₂ film 73. A channel region and soforth using the single-crystal silicon layer are formed on the gateinsulating film as in the case of the dual-gate MOSTFT of theperipheral-driving-circuit section. The dual-gate MOSTFT shown in FIG.20C has the lower-gate section substantially the same as that in thebottom-gate MOSTFT, whereas the upper-gate section includes anupper-gate electrode 83 formed on a gate insulating film 82 composed ofa SiO₂ film and a SiN film. In all the cases, each gate section isformed in the exterior of the step difference 4 which serves as a seedfor graphoepitaxy.

A method of producing the above-mentioned bottom-gate MOSTFT will bedescribed with reference to FIGS. 21A to 25C, and a method of producingthe dual-gate MOSTFT will be described with reference to FIGS. 26A to28C. The method of producing the dual-gate MOSTFT in theperipheral-driving-circuit section is the same as that described beforewith reference to FIGS. 1A to 6C and is therefore not illustrated.

With reference to FIG. 21A, in the production of the bottom-gate MOSTFTin the display section, a molybdenum-tantalum alloy film 71 having athickness of 500 to 600 nm is formed on a substrate 1 by sputtering.

With reference to FIG. 21B, a photoresist 70 having a given pattern isformed by a processing which is the same as that described withreference to FIG. 1B, and the molybdenum-tantalum alloy film 71 issubjected to taper etching using the photoresist 70 as a mask to form agate electrode 71 having a trapezoidal side base 71 a with an angle of20 to 45 degrees.

With reference to FIG. 21C, the processing which is the same as thatshown in FIG. 1C is conducted in which, after the photoresist 70 isremoved, a SiN film 72 having a thickness of approximately 100 nm andthen a SiO₂ film 73 having a thickness of approximately 200 nm aredeposited on the substrate 1 including the molybdenum-tantalum alloyfilm 71, by a plasma-enhanced CVD process, thereby to form a gateinsulating film.

With reference to FIG. 21D, the same process as that described before inconnection with FIG. 2A is executed in which a photoresist 2 having agiven pattern is formed in at least the TFT-forming region, and aplurality of step differences 4 having a proper shape and size areformed in the gate insulating film and further in the substrate 1through a mask constituted by the photoresist 2, as described above. Thestep differences 4 function as seeds during graphoepitaxy of thesingle-crystal silicon layer as will be described later, and have adepth d of 0.3 to 0.4 μm, a width of 2 to 3 μm, a length of 10 to 20 μmperpendicular to the drawing sheet, and an basilar angle (between thebottom and the side wall) which is a right angle.

Then, after removal of the photoresist 2, the same processing as FIG. 2Bis conducted to form a polysilicon film 5, as in FIG. 22A.

The same processing as that shown in FIG. 2C is conducted so as todeposit a film 6 of indium, or of indium-gallium, as shown in FIG. 22B.

Then, the same process as FIG. 3A is executed to cause graphoepitaxialgrowth of a single-crystal silicon, whereby a single-crystal siliconlayer of a thickness of, for example, 0.1 μm or so is deposited. In thisprocess, the side faces 71 a of the underlying gate electrode 71 aregently tapered, so that these side faces do not cause impediment to theepitaxial growth on the seeds constituted by the step differences,whereby the single-crystal silicon layer 7 can grow on these side faceswithout discontinuity.

Then, the film 6A of indium is removed as shown in FIG. 22D and, afterexecution of Steps shown in FIGS. 3C to 4B, the processing which is thesame as that of FIG. 4C is executed in which the gate section of thenMOSTFTs in the display section are covered by the photoresist 13, andsource and drain regions of the nMOSTFTs left exposed are doped by ionimplantation with phosphor ions 14, whereby an LDD section 15 composedof an N-type layer is formed by self-alignment. In this process, thebottom-gate electrode 71 permits easy recognition of the heightdifferences or pattern, thus facilitating positioning of the photoresist13, i.e., mask alignment, thereby suppressing misalignment.

With reference to FIG. 23A, the gate section and the LDD section of thenMOSTFT are covered with a photoresist 16 and the exposed region isdoped with phosphorus or arsenic ions 17 by ion implantation to form asource section 18 and a drain section 19 composed of an N⁺-type layer ofthe nMOSTFT, as in Step shown in FIG. 5A.

With reference to FIG. 23B, the entire nMOSTFT is covered with aphotoresist 20 and then doped with boron ions 21 by ion implantation toform a source section and a drain section of the p³⁰ layer of thepMOSTFTs in the peripheral-driving-circuit section, as in Step shown inFIG. 5B.

With reference to FIG. 23C, a photoresist 24 is provided and then thesingle-crystal silicon layer is selectively removed by conventionalphotolithography and etching to island the active device section and thepassive device section, as in Step shown in FIG. 5C.

With reference to FIG. 23D, a SiO₂ film 53 having a thickness ofapproximately 300 nm and then a phosphosilicate glass (PSG) film 54having a thickness of approximately 300 nm are formed on the entiresurface by a plasma-enhanced CVD process, a high-density plasma-enhancedCVD process, or a catalytic CVD process, as in Step shown in FIG. 6A.The SiO₂ film 53 and the PSG film 54 correspond to the aforementionedprotective film 25. The single-crystal silicon layer is then subjectedto an activation treatment as described before.

With reference to FIG. 24A, contact holes are formed for the sourcesections by conventional photolithography and etching, as in Steps shownin FIG. 6B. An aluminum sputtering film having a thickness of 400 to 500nm is formed on the entire surface, and source electrodes 26 of theTFTs, data lines and gate lines are simultaneously formed byconventional photolithography and etching. The substrate is thensintered in a forming gas at approximately 400° C for 1 hour.

With reference to FIG. 24B, an insulating film 36 composed of a PSG filmhaving a thickness of approximately 300 nm and a SiN film having athickness of approximately 300 nm is formed on the entire surface by ahigh-density plasma-enhanced CVD process or a catalytic CVD process, andcontact holes are formed at the drain sections of display TFTs, as inFIG. 6C.

With reference to FIG. 24C, a photosensitive resin film 28 having athickness of 2 to 3 μm is formed by spin coating, as in Step 16 shown inFIG. 7A, followed by a Step shown in FIG. 24D in which an uneven patternis formed and then subjected to reflow to form a lower portion of areflective layer having an uneven surface 28A so that the pixel sectionhas optimized reflective and viewing-angle characteristics. At the sametime, contact holes are formed in the resin for allowing contact of thedrain sections of the display TFTs.

With reference to FIG. 24D, an aluminum sputtering film having athickness of 400 to 500 nm is formed on the entire surface, and then anuneven aluminum reflective section 29 connecting to the drain sections19 of the display TFTs is formed by conventional photolithography andetching, as in Step shown in FIG. 7C.

As described above, the resulting active-matrix substrate 30 integratesa display section and a peripheral-driving-circuit section, in which thedisplay section includes bottom-gate nMOSLDD-TFTs using thesingle-crystal silicon layer 7 formed by high-temperature graphoepitaxyon the step differences 4 as a seed, while theperipheral-driving-circuit section includes a cMOS driving circuithaving dual-gate pMOSTFTs and dual-gate nMOSTFTs.

FIGS. 25A to 25C show the formation of the gate insulating film of theabove-mentioned bottom-gate MOSTFT in the display section by anodicoxidation of molybdenum-tantalum.

After the step of FIG. 21B, the molybdenum-tantalum alloy film 71 issubjected to conventional anodic oxidation treatment, as shown in FIG.25A, to form on the surface a gate insulating film 74 composed of Ta₂O₅and having a thickness of 100 to 200 nm.

Next, with reference to FIG. 25B, the step differences 4 are formed anda single-crystal layer 7 is deposited thereon graphoepitaxy, as in thesteps shown in FIGS. 21D to 22D, followed by execution of processingsimilar to those of FIGS. 22D to 24D to form an active matrix substrate30 as shown in FIG. 25C.

When the dual-gate MOSTFTs are produced in the display section, theprocesses are executed in the same way as those shown in FIGS. 21A to22D.

More specifically, with reference to FIG. 26A, step differences 4 areformed in the substrate 1 through the insulating films 72 and 73, andthen a single-crystal silicon layer 7 is deposited by graphoepitaxy onthe step differences 4 as a seed. Next, a step which is the same as thatshown in FIG. 4A is executed so that a SiO₂ film having a thickness ofapproximately 200 nm and then a SiN film having a thickness ofapproximately 100 nm are successively formed on the entire surface ofthe single-crystal silicon layer 7 by a plasma-enhanced CVD process or acatalytic CVD process, thereby to form an insulating film 80corresponding to the insulating film 8. Then, a molybdenum-tantalumalloy film 81 having a thickness of 500 to 600 nm, corresponding to thesputtering film 9, is formed by sputtering.

With reference to FIG. 26B, processing which is the same as that shownin FIG. 4B is executed: namely, a photoresist pattern 10 is formed andis subjected to continuous etching to form a top-gate electrode 82(corresponding to the gate electrode 12) composed of themolybdenum-tantalum alloy and a gate insulating film (corresponding tothe gate insulating film 11), thereby exposing the single-crystalsilicon layer 7.

With reference to FIG. 26C, the same processing as that shown in FIG. 4Cis executed: namely, the top-gate section of the nMOSTFT is covered witha photoresist 13, and the exposed source and drain regions of thenMOSTFT for display are doped with phosphorus ions 14 by ionimplantation to form an N⁻-type LDD section 15.

With reference to FIG. 26D, the same processing as that shown in FIG. 5Ais executed: namely, the gate section and the LDD section of the nMOSTFTare covered with a photoresist 16, and the exposed region is doped withphosphorus or arsenic ions 17 by ion implantation, thereby to form asource section 18 and a drain section 19 of nMOSTFT composed of anN⁺-type layer.

With reference to FIG. 27A, the same processing as that shown in FIG. 5Bis performed: namely, the gate section of the pMOSTFT is covered with aphotoresist 20 and the exposed region is doped with boron ions 21 by ionimplantation to form a source section and a drain section of the pMOSTFTcomposed of a P⁺-layer in the peripheral-driving-circuit section.

With reference to FIG. 27B, the same processing as that shown in FIG. 5Cis executed: namely, a photoresist layer 24 is provided and thesingle-crystal silicon layer is selectively removed at portions otherthan the active and passive device sections by conventionalphotolithography and etching, thereby to island the active devicesection and the passive device section.

With reference to FIG. 27C, the same process as that shown in FIG. 6A isperformed: namely, a SiO₂ film 53 having a thickness of approximately200 nm and a phosphosilicate glass (PSG) glass 54 having a thickness ofapproximately 300 nm are formed on the entire surface by aplasma-enhanced CVD process, a high-density plasma-enhanced CVD process,or a catalytic CVD process. These films 53 and 54 correspond to theaforesaid protective film 25. Then, an activation treatment is effectedon the single-crystal silicon layer 7.

With reference to FIG. 27D, the same processing as that shown in FIG. 6Bis executed; namely, contact holes are formed for the source sections.5B. An aluminum sputtering film having a thickness of 400 to 500 nm isformed on the entire surface, and then source electrodes 26, data linesand gate lines are simultaneously formed by conventionalphotolithography and etching.

With reference to FIG. 28A, the same processing as that shown in FIG. 6Cis executed: namely, an insulating film 36 including a PSG film having athickness of approximately 300 nm and a SiN film having a thickness ofapproximately 300 nm is formed on the entire surface, and contact holesare formed for the drain sections of the display TFTS.

With reference to FIG. 28B, a photosensitive resin film 28 having athickness of 2 to 3 μm is formed on the entire surface by, for example,spin coating. With reference to FIG. 28C, Steps which are the same asthose of FIGS. 7B and 7C are performed: namely, a lower portion of areflective face comprising an uneven surface 28A is formed in at leastthe pixel section, contact holes are formed for the drain sections ofthe display TFTs, and an uneven aluminum reflective section 29connecting to the drain sections 19 of the display TFTs are formed sothat optimum reflective and viewing-angle characteristics are achieved.

The resulting active-matrix substrate 30 integrates a display sectionand a peripheral-driving-circuit section, in which the display sectionincludes dual-gate nMOSLDD-TFTs and the peripheral-driving-circuitsection includes a cMOS driving circuit having dual-gate nMOSTFTs anddual-gate pMOSTFTs, wherein these TFTs are formed by using thesingle-crystal silicon layer 7 deposited by high-temperaturegraphoepitaxy on the step differences 4 as seeds.

FIGS. 29A to 36B show an eighth embodiment of the first aspect of thepresent invention.

In this embodiment, the gate electrode at the top gate section iscomposed of a material having relatively low thermal resistance, such asaluminum, unlike the preceding embodiments.

For the purpose of forming top-gate MOSTFTs in the display section whileforming dual-gate MOSTFTs in the peripheral-driving-circuit section, thesame steps as those shown in FIGS. 1A to 3B are executed as in the firstembodiment and, thereafter, an N-type well 7A is formed in the pMOSTFTsections of the peripheral-driving-circuit section, as shown in FIG.29A.

With reference to FIG. 29B, all of the nMOSTFTs and pMOSTFTs in theperipheral-driving-circuit section and the gate sections of the nMOSTFTsin the display section are covered with a photoresist 13, and theexposed source and drain regions of the nMOSTFTs are doped withphosphorus ions 14 by ion implantation, for example, at 20 kV and at adosage of 5×10¹³ atoms/cm² to form by self-alignment a LDD section 15composed of an N⁻-type layer.

With reference to FIG. 30A, all of the pMOSTFTs in theperipheral-driving-circuit section, the gate sections of the nMOSTFTs inthe peripheral-driving-circuit section, and the gate section and the LDDsection of the nMOSTFTs in the display section are covered with aphotoresist 16, and the exposed region is doped with phosphorus orarsenic ions 17, for example, at 20 kV and at a dosage of 5×10¹⁵atoms/cm² by ion implantation, thereby to form a source section 18,drain section 19 and an LDD section 15 of nMOSTFT composed of an N⁺-typelayer. Preferably, the resist 13 is left unremoved, as shown by thedotted line in the drawing, and the resist 16 is provided so as to coverthe resist 13, so that, in the formation process of the resist 16, amask is readily aligned with high accuracy by using the resist 13 as areference, thus diminishing the risk of misalignment.

With reference to FIG. 30B, all of the nMOSTFTs in theperipheral-driving-circuit section and all of the NMOSTFTS and the gatesections of the pMOSTFTs in the display section are covered with aphotoresist 20, and the exposed regions are doped with boron ions 21 byion implantation at 10 kV and at a dose of 5×10¹⁵ atoms/cm² to formsource sections 22 and drain sections 23 of the pMOSTFTS composed of aP⁺-type layer.

With reference to FIG. 30C, after the removal of the resist 20, thesingle-crystal silicon layers 7 and 7A are activated in the same way asthat described before, followed by deposition of a gate insulating film12 and a gate electrode material layer 11 which is of aluminum oraluminum alloy containing 1 percent y weight of Si. The gate electrodematerial layer 11 may be formed by a vacuum evaporation process or asputtering process.

After a patterning of the respective gate sections, the active devicesection and the passive device section are isolated, in the same way asthat described before and, as shown in FIG. 31A, a SiO₂ film having athickness of approximately 200 nm and then a phosphosilicate glass (PSG)film having a thickness of approximately 300 nm are deposited on theentire surface, thereby to form a protective film 25.

With reference to FIG. 31B, contact holes are formed for the source anddrain sections of all TFTs in the peripheral-driving-circuit section andthe source sections of the display TFTs, by conventionalphotolithography and etching.

A film having a thickness of 500 to 600 nm is formed on the entiresurface by sputtering, with aluminum or an aluminum alloy containing 1weight percent of Si and, thereafter, the source electrodes 26 of allTFTs in the peripheral-driving-circuit section and the display section,drain electrodes 27 in the peripheral-driving-circuit section, datalines and gate lines are simultaneously formed by conventionalphotolithography and etching. The substrate is then subjected tosintering treatment in a forming gas (N₂ +H₂) at approximately 400° C.for 1 hour.

Then, Steps which are the same as those shown in FIG. 6C to FIG. 7C areexecuted, whereby an active-matrix substrate 30 is obtained integratinga display section and a peripheral-driving-circuit section by using thesingle-crystal silicon layer 7, in which the display section includestop-gate nMOSLDD-TFTs having gate electrodes of aluminum or aluminumalloy containing 1 weight percent of Si, while theperipheral-driving-circuit section has a cMOS driving circuit havingdual-gate pMOSTFTs and dual-gate nMOSTFTs.

Since the aluminum or aluminum-alloy gate electrodes 11 are formed afterthe activation treatment of the single-crystal silicon layer 7, the gateelectrode material is not subject to the heat during the activationtreatment, so that inexpensive material having relatively low heatresistance, such as aluminum or 1 wt % Si aluminum alloy, can be used asthe gate electrode, offering a wider selection of the electrodematerials. This applies also to the case where the display sectionincludes bottom-gate MOSTFTs.

For implementing a configuration in which dual-gate MOSTFTs are formedboth in the display section and the peripheral-driving-circuit section,respectively, the processes shown in FIGS. 21A to 22D are performed, andthen an N-type well 7A is formed at the pMOSTFT section in theperipheral-driving-circuit section, as shown in FIG. 32A.

With reference to FIG. 32B, the TFT s in the display section are dopedwith phosphorus ions 14 to form LDD sections 15, as in the step shown inFIG. 22E.

With reference to FIG. 33A, the same processing as that shown in FIG.23A is executed: namely, the nMOSTFT sections in the display section andthe peripheral-driving-circuit section are doped with phosphorus ions 17to form N⁺-type source regions 18 and drain regions 19.

With reference to FIG. 33B, the same process as that shown in FIG. 23Bis executed: namely, the pMOSTFT section in theperipheral-driving-circuit section is doped with boron ions 21 to form aP⁺-type source region 22 and a drain region 23.

With reference to FIG. 33C, after the removal of the resist 20, thesingle-crystal silicon layer 7 is patterned to island the active devicesection and the passive device section and, thereafter, as shown in FIG.34A, the single-crystal silicon layers 7 and 7A are activated in thesame way as that described before, followed by formation of a gateinsulating film 80 in the display section and formation of a gateinsulating film 12 in the peripheral-driving-circuit section,respectively.

With reference to FIG. 34B, an aluminum film sputtered on the entiresurface is patterned to form upper-gate electrodes 83 in the displaysection and upper-gate electrodes 11 in the peripheral-driving-circuitsection.

With reference to FIG. 34C, a SiO₂ film having a thickness ofapproximately 200 nm and then a PSG film having a thickness ofapproximately 300 nm are deposited to form a protective film 25.

Source electrodes 26 of all TFTs in the peripheral-driving-circuitsection and the display section and drain electrodes 27 in theperipheral-driving-circuit section are formed by the same process asthat described before, whereby an active-matrix substrate 30 is obtainedintegrating the display section and the peripheral-driving-circuitsection using the single-crystal silicon layer 7, wherein the displaysection includes dual-gate nMOSLDD-TFTs having aluminum top gateelectrodes, while the peripheral-driving-circuit section includes a CMOSdriving circuit having dual-gate pMOSLDD-TFTs and dual-gate nMOSTFTs.

Since the gate electrodes 11 and 83 are formed after the activationtreatment of the single-crystal silicon layer in this embodiment, thegate electrode material does not undergo the heat applied during theactivation treatment, so that any inexpensive material having relativelylow heat resistance, such as aluminum, may be used for the gateelectrode, thus widening the selection of the electrode materials. Thesource electrodes 26 (and the drain electrodes also) may besimultaneously formed in Step shown in FIG. 34B, thus offeringadvantages in the production process.

When the bottom-gate or top-gate or dual-gate MOSTFTs are formed in anyof above-described embodiments, the single-crystal silicon layer 7deposited on the step difference 4 may have discontinuity or thinnedportions, as schematically shown in FIG. 35A, leading to connectionfailure or increase in the resistance and, therefore, the sourceelectrode 26 (or the drain electrode 27) is preferably provided in aregion including the step difference 4 in order to ensure the connectionto the single-crystal silicon layer 7, as shown in FIGS. 35B and 35C.

As an alternative to Step shown in FIG. 2B or Step shown in FIG. 32B,after the formation of the top-gate insulating film on thesingle-crystal silicon layer 7, ion implantation and activationtreatment may be performed and then the top-gate electrodes and sourceand drain electrodes may be simultaneously formed.

The step differences 4 are formed in the substrate 1 (and in theoverlying SiN film) in the described embodiment as shown in FIG. 36A,this is only illustrative and the step differences 4 may be formed on aSiN film 51 on the substrate 1 so that the SiN film 51 inhibitsdiffusion of ions from the glass substrate 1. The arrangement also maybe such that the gate insulating films 72 and 73 are formed in place ofthe SiN film 51 or on the SiN film 51 and the step differences areformed in these gate insulating films.

FIG. 37A to FIG. 39 show a ninth embodiment of the present invention.

In this embodiment, TFTs are formed at the exterior of the stepdifferences 4, that is, in regions other than the step differences 4. Inthese drawings, the single-crystal silicon layer 7 and the gateelectrodes 11, source electrodes 26 and drain electrodes 27 are shownonly schematically.

FIG. 37A to FIG. 37E show top-gate MOSTFTS. Referring first to FIG. 37A,the indented section formed by the step difference 4 is located alongand on one side of the source region, and the gate insulating film 12and the gate electrodes 11 are formed on the areas of the single-crystalsilicon layer 7 where there is no indented section. FIG. 37B shows anarrangement in which the indented section has an L-like shape, with oneleg extending along the side of the source region and the other legextending in the direction of length of the channel down to the end ofthe drain region. FIG. 37C shows an arrangement in which the indentedsection has a rectangular form with four sides surrounding the TFTactive region. FIG. 37D shows an arrangement in which the indentedsection has three sides. In FIG. 37E, an indented section has an L-shapewith two sides. In all these cases, adjacent indented sections 4 arediscrete and isolated from each other.

Thus, the indented sections or step differences 4 may have any suitableshape, and the TFTs are formed on the areas other than these stepdifferences 4, so that the TFTs can be fabricated without difficulty.

FIGS. 38A to 38C show bottom-gate MOSTFTs. Any type of step difference 4shown in FIGS. 36A to 36E may be employed also in this type of MOSTFTs.In FIG. 38A corresponding to FIG. 37A, the bottom-gate MOSTFT is formedon the flat portion other than the step difference 4. Likewise, FIG. 38Bcorresponds to FIG. 37B, and FIG. 38C corresponds to FIG. 37C or 37D.

FIG. 39 shows a dual-gate MOSTFT. Any type of step difference 4 shown inFIGS. 37A to 37E may also be employed in this type. For example, thedual-gate MOSTFT may be formed on the flat portion in the interior ofthe step difference 4 shown in FIG. 37C or 37D.

FIGS. 40A to 42 show a tenth embodiment of the present invention.

FIGS. 40A and 40B show a self-alignment type LDD-TFT, for example, adouble-gate MOSTFT including a plurality of top-gate MOSLDD-TFTs.

A gate electrode 11 has two branches, that is, a first gate 11A and asecond gate 11B, wherein the first gate 11A is used for a first LDD-TFT51 and the second gate is used for a second LDD-TFT 52, and preferablyAn N⁺-type region 100 is provided in the center of the single-crystalsilicon layer between these gates in order to decrease resistance.Different voltages may be applied to these gates and, in the event thatone gate has become inoperable due to any reason, the other gate willperform transfer of carriers between the source and the drain, thusoffering high reliability of the device. The first LDD-TFT 51 and thesecond LDD-TFT 52 are connected in series and function as a thin-filmtransistor for driving a pixel, so that the voltage applied between thesource and the drain of each thin-film transistor can be significantlyreduced in the OFF mode of operation. Thus, the leakage current in theOFF mode can be reduced, resulting in improved contrast and imagequality in the liquid crystal display. Since these two LDD transistorsare connected to each other only through the semiconductor layer whichis the same as the low-concentration drain region, the conductivedistance between the transistors can be shortened, avoiding an increasein the transistor area despite the dual LDD transistor configuration.The first and second gates may be isolated from each other forindependent operation.

FIG. 41A shows a double gate configuration of bottom-gate MOSTFTs, andFIG. 41B shows a double gate configuration of dual-gate MOSTFTS.

These double-gate MOSTFTs have the same advantages as those in theabove-described top-gate type. Use of dual-gate structure offers afurther advantage in that, if one gate section is not operable in thedual-gate type, the other gate section can be used.

FIGS. 42A to 42C are equivalent circuit diagrams of the respective typesof the double-gate configuration. The gate may be branched or dividedinto three or more, although in the illustrated embodiment it isbranched into two. In the double- or multi-gate configuration, thebranched gate electrodes having the same potential, or gate electrodesisolated by the division and having the same potential or differentpotentials, may be provided in the channel region.

FIGS. 43A and 43B show an eleventh embodiment of the present invention,wherein one of the upper and lower-gate sections of a dual-gate typenMOSTFT is used in a transistor operation, whereas the other operates asfollows.

In an nMOSTFT shown in FIG. 43A, an appropriate negative voltage isconstantly applied to the gate electrode at the top gate side to reducethe leakage current in the back channel. When the top gate electrode isopened, this is used as a bottom-gate type. In FIG. 43B, an appropriatenegative voltage is constantly applied to the gate electrode at thebottom gate side to reduce the leakage current in the back channel. Whenthe bottom gate electrode is opened, this is used as a top-gate type. Incase of a pMOSTFT, leakage current in the back channel can be reduced byconstantly applying an appropriate positive voltage to the gateelectrode.

The interface between the single-crystal silicon layer 7 and theinsulating film has low crystallinity and readily causes a leakagecurrent, but the above-mentioned negative voltage applied to the gateelectrode can effectively reduce the leakage current. This advantage isadded to that offered by the LDD structure. Furthermore, the bottom gateelectrode shades the light incident on the substrate 1, so that theleakage current caused by the incident light can be reduced.

FIG. 44 to FIG. 52 show a twelfth embodiment of the present invention.

As described above, the top-gate, bottom-gate and dual gate TFTs havedifferent structures, functions and characteristics. A variety ofcombinations of these TFTs may be employed in the display section andthe peripheral-driving-circuit section to obtain various advantageouseffects.

For example, as shown in FIG. 44, when any one of the top-gate MOSTFT,the bottom-gate MOSTFT and the dual-gate MOSTFT is used in the displaysection, at least the dual-gate type is used alone or in a combinationwith at least one of the other types, in the peripheral-driving-circuitsection. In this case, there are 12 types of combination identified byNos. 1 to 12. When a dual-gate structure is employed in the MOSTFT inthe peripheral-driving-circuit section, this dual-gate structurefunctions as a top-gate type or a bottom-gate type by selecting theupper or lower gate, and the dual-gate type structure also is preferredwhen a local portion of the peripheral driving circuit requires TFTshaving large driving power. For example, electrooptical devices usingorganic EL or FED will require such TFTs having large driving power.

A variety of combinations (Nos. 1 to 216) of channel conduction typesare available for the MOSTFTs to be used in theperipheral-driving-circuit section and the display section,specifically: FIGS. 45 and 46 show combinations possible when theMOSTFTs in the display section do not have a LDD structure; FIGS. 47 and48 show combinations possible when the MOSTFTS in the display sectionhave a LDD structure; FIGS. 49 and 50 show combinations possible whenthe peripheral-driving-circuit section includes TFTs having a LDDstructure; and FIGS. 51 and 52 show combinations possible when both theperipheral-driving-circuit section and the display section include TFTshaving a LDD structure.

Thus, the details of the combinations shown in FIG. 44 are shown inFIGS. 45 to 52. These combinations are also available when theperipheral-driving-circuit section includes the top-gate MOSTFT and theother-type MOSTFT(s). These combinations are applicable not only whenthe channel regions of the TFTs are formed of a single-crystal siliconbut also when the channel region of the TFT is formed of polycrystallinesilicon or amorphous silicon (only in the display section).

FIG. 53A to FIG. 54 show a thirteenth embodiment of the presentinvention.

This embodiment is an active-matrix LCD which includes TFTs having highdriving power and using the above-mentioned single-crystal silicon layerin the peripheral-driving-circuit section, in order to attain a greaterdriving power. This, however, is not exclusive and the TFTs may employnot only dual-gate MOSTFTs but also other gate types together with thedual-gate type, as well as a variety of channel conduction types, andmay further include MOSTFTs using polycrystalline silicon layer. Incontrast, the MOSTFTs of the display section preferably use asingle-crystal silicon layer, although they may use a polycrystalline oramorphous silicon layer or at least two out of the three types ofsilicon layers in combination. It is to be noted, however, when thedisplay section is constituted by nMOSTFTs, a single-crystal orpolycrystalline silicon layer is preferably used because such types ofsilicon layer enables a reduction in the areas of TFTS and is preferredto amorphous silicon also from the viewpoint of reduction in pixeldefects, although a practically acceptable switching speed is stillattainable also with the amorphous silicon layer. Polysilicon, inaddition to single-crystal silicon, may be formed during graphoepitaxy,thereby forming a continuous grain silicon (CGS) structure which can beadvantageously used for the formation of the active device and thepassive device in some cases.

FIGS. 53A to 53C show possible combinations of various MOSTFTs. FIG. 54shows the details of these combinations. The use of single-crystalsilicon causes improved current driving ability. The use of asingle-crystal silicon serves to improve current driving power, thusoffering advantages such as a reduction in the device size, an increasein the screen size, and an increase in the aperture ratio.

In the peripheral-driving-circuit section, an electric circuitintegrating diodes, capacitors, resistors, and inductors, in addition tothe MOSTFTS, can be consolidated on the insulating substrate such as aglass substrate.

FIG. 55 shows a fourteenth embodiment of the present invention.

This embodiment implements a passive-matrix drive, in contrast to thepreceding embodiments that are focused on active-matrix driveconfigurations.

In this embodiment, therefore, the display section does not haveswitching devices such as MOSTFTS, and modulation of the incident orreflected light in the display section is performed only by thevariation in the voltage applied between a pair of electrodes formed ontwo opposing substrates. Examples of such modulation devices includereflective or transmissive LCDS, organic or inorganic EL devices(electroluminescent devices), FEDs (field emission display devices),LEPDs (light-emitting polymer display devices), and LEDs (light-emittingdiodes).

FIGS. 56A and 56B show a fifteenth embodiment of the present invention.

This embodiment is directed to an electrooptical device other than anLCD, such as an organic or inorganic EL device (electroluminescentdevice), FED (field emission display device), LEPD (light-emittingpolymer display device), and LED (light-emitting diode).

FIG. 56A shows an active-matrix EL device, comprising a substrate 1, anorganic EL layer 90 composed of, for example, an amorphous organiccompound or, alternatively, an inorganic EL layer such as of ZnS:Mn,formed on the substrate 1, a transparent ITO electrode 41 provided belowthe EL layer 90, and a cathode 91 is formed on the EL layer 90, wherebycolored light is emitted through a color filter 61 in response to avoltage applied to these electrodes 41 and 91.

In order to apply a data voltage to the transparent electrode 41 byactive-matrix drive, the substrate 1 is provided with a single-crystalsilicon n MOSTFT, i.e., nMOSLDD-TFT, formed thereon by using asingle-crystal silicon layer deposited by graphoepitaxy on a stepdifference 4 serving as a seed on the substrate 1. Similar TFTs are alsoformed in a peripheral driving circuit. Since this EL device is drivenby MOSLDD-TFTs using the single-crystal silicon layer, the EL device hasa high switching rate and a reduced leakage current. The color filter 61may be omitted if the EL layer 90 emits a specified color.

Since the EL device requires a high driving voltage, the peripheraldriving circuit preferably has driver devices having high dielectricstrength, such as high-dielectric-strength cMOSTFTs and bipolar devices,in addition to the MOSTFTs.

FIG. 56B shows a passive-matrix FED in which, when a voltage is appliedbetween electrodes 92 and 93, electrons are emitted from a cold cathode94 in a vacuum section 98 between two opposing glass substrates 1 and32, and are incident on a fluorescent layer 96 under selection by a gateline 95, whereby light having a predetermined color is emitted.

The emitter line 92 is connected to a peripheral driving circuit and isdriven by a data voltage, the peripheral driving circuit includingMOSTFTs using a single-crystal silicon layer based on the presentinvention and contributing to high-speed driving of the emitter line 92.In FIG. 55B, numeral 99 represents a resistance film. In this FED, theabove-mentioned MOSTFT may be connected to each pixel electrode so thatthe FED is driven by an active-matrix system.

When a conventional light-emitting polymer is used instead of the ELlayer 90 in the EL device shown in FIG. 56A, this device functions as apassive-matrix or an active-matrix light-emitting polymer device (LEPD).In the FED shown in FIG. 56B, a diamond thin-film may be used as thecathode to implement a device similar to FED. In a light emitting diode,a light emitting section composed of a gallium-based film, such asgallium-aluminum-arsenic, may be driven by MOSTFTs of single-crystalsilicon epitaxially grown in accordance with the present invention.

The above-described embodiments of the present invention may have thefollowing modifications without departing from the spirit of the presentinvention.

When the polycrystalline silicon film 5 is deposited, the film 5 may bedoped with a Group III or V element having high solubility, e.g., boron,phosphorus, antimony, arsenic, aluminum, gallium, indium, or bismuth, inan adequate amount to control the channel conductive type (P or N) ofand the carrier content in the epitaxial silicon layer 7.

The second or third embodiment may be applied to the fifth embodimentwhich uses an indium-gallium alloy or metallic gallium.

In order to avoid diffusion of ions from the glass substrate, a SiN filmhaving a thickness of, for example, 50 to 200 nm and a SiO₂ film havinga thickness of 100 nm, if necessary, may be formed on the substratesurface, and the above-described step differences 4 may be formed inthese films. The step differences may be formed by ion milling insteadof the above-mentioned RIE process.

Although the single-crystal silicon layer in accordance with the presentinvention can suitably be employed for the production of TFTS of aperipheral-driving-circuit section, such single-crystal silicon layermay be used for production of, for example, active regions, such asdiodes, and passive regions, such as resistors and inductors, ofdevices.

A description will now be given of first to thirteenth embodiments ofthe second aspect of the present invention which employs a melt layer ofa low-melting-point metal and which has the step of forming a dual-gatefirst thin-film transistor.

FIGS. 1A to 1C, FIGS. 57A and 57B, FIG. 3A to FIG. 14 show a firstembodiment of the second aspect of the present invention.

The first embodiment relates to an active-matrix reflective liquidcrystal display (LCD) having a peripheral driving circuit incorporatingdual-gate MOSTFTs formed by a single-crystal silicon layer which isformed by graphoepitacy of indium-silicon melt at high temperature usingas a seed an indented section difined by a step difference provided on asubstrate. FIGS. 12 to 14 show an overall layout of the reflective LCD.

With reference to FIG. 12, the active-matrix reflective LCD has a flatpanel configuration including a main substrate 1 (active-matrixsubstrate) and a counter substrate 32 which are bonded to each otherwith a spacer provided therebetween (not shown in this Figure), and thespace between the main substrate 1 and the counter substrate 32 isfilled with a liquid crystal (not shown in this Figure). Provided on asurface of the main substrate 1 are a display section which includespixel electrodes 29 or 41 arranged in a matrix and switching devices 112for driving the pixel electrodes, and peripheral driving circuitsections connected to the display section.

Each switching device in the display section is composed of an nMOS,pMOS, or cMOS top-gate TFT having a LDD structure in accordance with thepresent invention. Also, in the peripheral-driving-circuit sections,cMOS, nMOS and/or pMOS dual-gate MOSTFTs in accordance with the presentinvention are formed as circuit components. One of theperipheral-driving-circuit sections includes a horizontal drivingcircuit which drives the TFTs of the pixels in a line-by-line fashionwhile supplying these pixels with data signals, whereas the other of theperipheral-driving-circuit portions is a vertical driving circuit whichdrives the gates of the TFTs of the pixels on the scan-line-basis, boththe horizontal and vertical driving circuits being arranged on bothperipheral sides of the display section. These driving circuits may be adot-sequential analog type or a line-sequential digital type.

With reference to FIG. 13, the TFTs are arranged at intersections ofgate bus lines and orthogonal data bus lines, and are activated to writeimage information into liquid crystal capacitors (C_(LC)) and the chargein the liquid crystal capacitors is retained until the next informationis written. Since the channel resistance of each TFT is not sufficientto retain the information, a storage capacitor (C_(S)), serving as anauxiliary capacitor, may be provided in parallel to the liquid crystalcapacitor to compensate for a drop of voltage across the liquid crystaldue to a leakage current. Characteristics required for TFTs used in thepixel or display region are different from characteristics required forTFTs used in the peripheral driving circuits: namely, an importantproperty of the TFTs in the pixel region is to control an OFF currentand to retain an ON current. Providing TFTs having a LDD structure inthe display section can reduce an electric field between the gate andthe drain and thus reduces the effective electric field applied to thechannel region, the OFF current and a change in characteristics. Theproduction process, however, is complicated, the size of the device isinevitably increased, and the ON current is decreased. Thus, the designsmust be optimized to meet the respective purposes.

Among the usable liquid crystals are TN liquid crystals (nematic liquidcrystals used in a TN mode of active-matrix driving), super-twistednematic (STN) liquid crystals, guest-host (GH) liquid crystals, phasechange (PC) liquid crystals, ferroelectric liquid crystals (FLCs),antiferroelectric liquid crystals (AFLCs), and polymer dispersion-typeliquid crystals (PDLCs).

The system of and the method for driving the peripheral driving circuitswill now be briefly described with reference to FIG. 14. The drivingcircuits include a gate driving circuit and a data driving circuit eachof which must implement a shift resistor. Each shift resistor generallymay be a cMOS circuit including both pMOSTFTs and nMOSTFTs or may be acircuit including either pMOSTFTs or nMOSTFTs, among which suitably usedis a cMOSTFT or CMOS circuit in view of the operational speed,reliability, and low power consumption.

The scanning driving circuit includes shift registers and buffers andsupplies pulses to lines in synchronism with a horizontal scanningperiod. The data driving circuit may be a dot-sequential driving systemor a line-sequential driving system, but the dot-sequential drivingsystem as illustrated has a relatively simplified configuration andwrites display signals directly into pixels through analog switchesunder control of the shift registers. The signals are sequentiallywritten into pixels in a line within a scanning time for the line (R, Gand B in the drawing schematically represent red, green and bluepixels).

With reference to FIGS. 1A to 1C, FIGS. 57A and 57B, and FIGS. 3A to10B, the active-matrix reflective LCD in this embodiment will bedescribed in accordance with the production steps. In FIGS. 1A to 1C,FIGS. 57A and 57B, and FIGS. 3A to 6C, the left side of each drawingshows the production steps for the display section and the right sideshows the production steps for the peripheral-driving-circuit section.

Referring first to FIG. 1A, a film 71 of about 500 to 600 nm thick isformed from a molybdenum/tantalum (Mo—Ta) alloy by sputtering on a majorsurface of an insulating substrate 1 made of, for example, a quartzglass or a transparent crystalline glass.

Then, as shown in FIG. 1B, a photoresist 70 is formed in a given patternand the Mo-Ta film 71 is taper-etched through a mask constituted by thephotoresist 70, whereby a gate electrode 71 is formed to have side facesthat are gently slanted at an angle of 20 to 45 degrees to provide asubstantially trapezoidal cross-section.

Then, as shown in FIG. 1C, a gate insulating film composed of an SiNfilm 72 (about 100 nm thick) and an SiO₂ film 73 (about 200 nm thick)laminated in this order is deposited by, for example, a plasma CVDprocess on the substrate 1 having the molybdenum Etantalum alloy film71, after removal of the photoresist 70.

Subsequently, as shown in FIG. 57A, a photoresist 2 having a givenpattern is formed in at least a TFT-forming region, and the surface isirradiated with, for example, F⁺ ions 3 of CF₄ plasma through the maskconstituted by the photoresist 2, and a plurality of step differences 4having a given shape and a given size are formed in the gate insulatingfilm (and further in the substrate 1) by typical photolithography, suchas reactive ion etching (RIE), and then by etching (photoetching).

The insulating substrate 1 may be composed of a highly-heat-resistantsubstrate having a diameter of 8 to 12 inches and a thickness of 700 to800 μm, such as quartz glass, crystallized glass, or ceramic, althoughin a transmissive LCD described below an opaque ceramic substratecannnot be used. The step differences 4 function as seeds forgraphoeitaxy of single-crystal silicon. Each step difference 4 has, forexample, a depth d of 0.3 to 0.4 μm, a width w of 2 to 10 μm, and alength 1 of 10 to 20 μm (in the direction perpendicular to the drawingsheet). The basilar angle defined by the bottom face and the side faceis a right angle. In order to prevent diffusion of ions such as Na ionsfrom the glass substrate, an SiN film of, for example, 50 to 200 nmthick and, as desired, a silicon oxide film (referred to as SiO₂ film,hereinafter) of, for example, 100 nm thick may be formed on the glasssubstrate, in advance of the steps described heretofore.

With reference to FIG. 57B, after the photoresist layer 2 is removed, asilicon-indium melt containing about 1 percent by weight of silicon isapplied to the substrate 1 heated at a temperature of 900 to 930° C.Alternatively, the substrate 1 may be dipped with the melt. A processfor floating the substrate 1 by gradually moving the melt surface, a jetprocess, or a contact process under ultrasonic operation may beemployed.

Then, after being maintained for several to several tens of minutes, thesubstrate 1 is gradually cooled (pulled up in the case of dipping) sothat silicon dissolved in indium is deposited by graphoepitaxy, usingthe bottom corner of each step difference 4 as a seed, as shown in FIG.3A, whereby a P-type single-crystal silicon layer 7 having a thicknessof, for example, approximately 0.1 μm is formed. In this process, theside faces 71 a of the underlying gate electrode 71 are gently tapered,so that these side faces do not cause impediment to the epitaxial growthon the seeds constituted by the step differences, whereby thesingle-crystal silicon layer 7 can grow on these side faces withoutdiscontinuity. According to the dipping process and the floatingprocess, the composition of the melt, the temperature and the pulling-upspeed can be easily controlled, and the thickness of the epitaxiallygrown layer and the P-type carrier impurity concentration can be easilycontrolled.

In the single-crystal silicon layer 7 as deposited, a (100) plane isepitaxially grown on the substrate, and this is known as graphoepitaxy.With reference to FIGS. 9A and 9B, a vertical wall, such as theabove-mentioned step difference 4, is formed on the amorphous substrate1, such as a glass substrate and an epitaxial layer is formed thereon,so that the (100) plane of a single-crystal is grown along the side faceof the step difference 4 as shown in FIG. 9B, whereas a crystal havingrandom plane orientation is grown on a flat amorphous substrate 1, asshown in FIG. 9A. The size of the single-crystal grain increases inproportion to the temperature and the time: when the temperature islowered or when the time is shortened, the distance between the stepdifferences should be decreased. The orientation of the grown crystalcan be controlled by changing the shape of the step differences, asshown in FIGS. 10A to 10F. When MOS transistors are formed, the (100)plane is most frequently used. Accordingly, the step difference 4 canhave any cross-sectional shape which facilitates crystal growth, forexample, the angle at the bottom corner (basilar angle) may be a rightangle or, alternatively, the side wall may be inclined inwardly oroutwardly towards the lower end. The basilar angle of the stepdifference 4 is preferably 90° or less and the bottom corner ispreferably slightly rounded.

With reference to FIG. 3B, after the deposition of the single-crystalsilicon layer by graphoepitaxy on the substrate 1, the indium film 6Adeposited on the surface is removed using hydrochloric acid or sulfuricacid, followed by post-treatment to avoid the formation of a low-gradesilicon oxide film, whereby a dual-gate MOSTFT and a top-gate MOSTFT areformed in the peripheral-driving-circuit section and in the displaysection, respectively, using the single-crystal silicon layer 7 as thechannel regions.

The single-crystal silicon layer 7 deposited by graphoepitaxy containsis a p-type layer due to its indium content, and the concentration ofthe P-type impurity fluctuates, so that adjustment of the specificresistance is performed by doping with p-type impurity ions such as B⁺at 10 kV and at a dosage of 2.7×10¹¹.atoms/cm², with the p-channelMOSTFT section masked by a photoresist (not shown in the drawing). Withreference to FIG. 3C, in order to control the concentration of theimpurity in the pMOSTFT-forming region, the nMOSTFT section is maskedwith a photoresist 60 and is doped with n-type impurity ions 65 such asP⁺ at 10 kV and at a dosage of 1×10¹¹ atoms/cm² to form an n-type well7A.

With reference to FIG. 4A, a SiO₂ film having a thickness ofapproximately 200 nm and then a SiN film having a thickness ofapproximately 100 nm are continuously deposited on the entiresingle-crystal silicon layer 7 by a plasma-enhanced CVD process, ahigh-density plasma-enhanced CVD process or a catalytic CVD process toform a gate insulating film 8, followed by a sputtering to deposite amolybdenum-tantalum (Mo—Ta) alloy film 9 of 500 to 600 nm thereon.

With reference to FIG. 4B, photoresist patterns 10 are formed in thestep difference regions (indented sections) of the TFT sections in thedisplay region and outside the step difference regions of the TFTsections of the peripheral driving region by any convnetionalphotolithographic process, and a continuous etching is executed, wherebygate electrodes 11 of the Mo—Ta alloy film and gate insulating films 12of SiN—SiO₂ are formed and the single-crystal silicon layer 7 isexposed. The Mo—Ta alloy film 9 is etched using an acidic etchant, SiNis etched by plasma ethching using CF₄ gas, and SiO₂ is etched using ahydrofluoric acidic echant.

With reference to FIG. 4C, all of the nMOSs and pMOSTFTs in theperipheral driving region, as well as the gate sections of the nMOSTFTsin the display region, are covered with a photoresist 13, and theexposed source and drain regions of the nMOSTFTs are doped with, forexample, phosphorus ions 14 by ion implantation at 20 kV and at a dosageof 5×10¹³ atoms/cm² to form LDD sections 15 of an N⁻-type layer byself-alignment.

With reference to FIG. 5A, all of the nMOSTFTs in the peripheral drivingregion, the gate sections of the nMOSTFTs in the peripheral drivingregion, and the gate sections and the LDD sections of the nMOSTFTs inthe display region are covered with a photoresist 16, and the exposedregions are doped with phosphorus or arsenic ions 17 by ion implantationat 20 kV and at a dosage of 5×10¹⁵ atoms/cm² to form source sections 18,drain sections 19 and the LDD sections 15 of an N⁺-type laye rof thenMOSTFTs.

With reference to FIG. 5B, all of the nMOSTFTs in the peripheral drivingregion and the display region and the gate sections of the pMOSTFTs inthe peripheral driving region are covered with a photoresist 20, and theexposed regions are doped with boron ions 21 by ion implantation at 10kV and at a dosage of 5×10¹⁵ atoms/cm² to form source sections 22 anddrain sections 23 of a P⁺-type layer of the pMOSTFTs. In the case of anRMOS peripheral driving circuit, this step is not necessary since thecircuit does not have a pMOSTFT.

With reference to FIG. 5C, in order to island the active device sectionsincluding TFTs and diodes and the passive device sections includingresistors and inductors, photoresist layers 24 are provided on all ofthe active device sections and the passive device sections in theperipheral driving region and the display section, and thesingle-crystal silicon layer 7 in other sections is removed by aconventional photolithographic process or an etching process using ahydrofluoric acid solution.

With reference to FIG. 6A, a SiO₂ film having a thickness ofapproximately 200 nm and then a phosphosilicate glass (PSG) film havinga thickness of approximately 300 nm are continuously deposited to form aprotective film 25 on the entire surface by a plasma-enhanced CVDprocess, a high-density plasma-enhanced CVD process or a catalytic CVDprocess.

In such a state, the single-crystal silicon layer is activated.Activation treatment is performed at approximately 1,000° C. forapproximately 10 seconds using, for example, a halogen lamp, and thegate electrode composed of the Mo—Ta alloy having a high melting pointis durable during the annealing for activation. The Mo—Ta alloy can beused not only for the gate section but also as lead lines over a widerange. In the activation, excimer laser annealing requiring high processcosts is generally not used. If excimer laser annealing is used,overlapping scanning of 90% or more is preferably performed on theentire surface or selectively the active device section and the passivedevice section using XeCl (wavelength:308 nm).

With reference to FIG. 6B, contact holes are formed for all of thesource-drain sections of the TFTs in the peripheral driving circuit andthe source sections of the TFTs in the display region, by a conventionalphotolithographic process and an etching process.

A film having a thickness of 500 to 600 nm is formed on the entiresurface, from aluminum or an aluminum alloy, e.g., an aluminum alloycontaining 1 wt % Si or 1 to 2 wt % copper and, by a conventionalphotolithographic process and an etching process, source electrodes 26of all TFTs both in the peripheral driving circuit section and thedisplay section, as well as the drain electrodes 27 in the peripheraldriving circuit section, are formed, simultaneously with the formationof data lines and gate lines. The substrate is then subjected tosintering treatment in a forming gas (N₂+H₂) at approximately 400° C.for 1 hour.

With reference to FIG. 6C, an insulating film 36 composed of a PSG filmwith a thickness of approximately 300 nm and a SiN film with a thicknessof approximately 300 nm is formed on the entire surface by aplasma-enhanced CVD process, a high-density plasma-enhanced CVD process,or a catalytic CVD process. Next, contact holes are formed for the drainsections of TFTs in the display region. It is not necessary to removethe SiO₂, PSG and SiN films in the pixel sections.

Basic requirements of a reflective liquid crystal display are to reflectthe light incident on the display towards the interior of the liquidcrystal panel and, at the same time, to scatter the light. This isbecause the direction of the incident light is uncertain whereas theposition of the observer with respect to the display is substantiallyfixed. Thus, the reflector must be designed on an assumption that pointlight sources are present at arbitrary positions. As shown in FIG. 7A, aphotosensitive resin film 28 having a thickness of 2 to 3 μm is formedon the entire surface by spin coating and, as shown in FIG. 7B, anuneven pattern is formed in at least the pixel region by a conventionalphotolithographic process and an etching process so that the pixelsection has optimized reflective characteristics and viewing-anglecharacteristics, followed by a reflow to form a lower portion of thereflective face of an uneven surface 28A. At the same time, contactholes are formed in the resin for allowing contact of the drain sectionsof the display TFTs.

With reference to FIG. 7C, a sputtering film having a thickness of 400to 500 nm is deposited from aluminum or an aluminum allowy, e.g., anallowy containing 1 wt % Si, on the entire surface, and the sputteringfilm at the region other than the pixel sections is removed by a generalphotolithographic process and an ethcing process, thereby to form anuneven aluminum reflective sections 29 which are connected to the drainsections 19. The reflective sections 29 are used as pixel electrodes fordisplaying. Next, these are subjected to sintering at approximately 300°C. for 1 hour in a forming gas to enhance the contact. Silver or asilver alloy may be used instead of aluminum to increase thereflectance.

As described above, a single-crystal silicon layer 7 is formed byhigh-temperature graphoepitaxy using the step differences as the seeds,and an active-matrix substrate 30 integrating a display section and aperipheral-driving-circuit section is produced by forming, both in thedisplay section and in the peripheral-driving circuit section whichemploy the single-crystal silicon layer 7, top-gate nMOSLDD-TFTs andCMOS circuits which are composed of dual-gate pMOSTFTs and dual-gatenMOSTFTs.

With reference to FIG. 8, a method of producing a reflective liquidcrystal display using the active-matrix substrate (driving substrate) 30will now be described. Hereinafter, the active-matrix substrate isreferred to as a TFT substrate.

When a liquid crystal cell in this LCD is produced by double-sideassembly (suitable for medium to large liquid crystal panels of 2 inchesor greater), polyimide alignment films 33 and 34 are formed one surfaceof the TFT substrate 30 and on a device-mounting surface of a counterelectrode 32 having a solid indium tin oxide (ITO) electrode,respectively. The polyimide alignment films are formed by roll coatingor spin coating so that thicknesses are in a range of 50 to 100 nm andare cured at 180° C. for 2 hours.

The TFT substrate 30 and the counter substrate 32 are aligned by rubbingor by an optical method. Although rubbing may be performed using cottonor rayon, cotton is preferable in view of dust produced by rubbing andretardation. In optical alignment, liquid crystal molecules are alignedby noncontact linearly polarized UV light irradiation. Polymer alignmentfilm can also be formed by polarized or unpolarized light which isdiagonally incident, such polymer films being, for example, polymethylmethacrylate polymers containing azobenzene.

After washing, a common material is applied to the TFT substrate 30whereas a sealing agent is applied to the counter electrode 32. Thewashing is conducted with water or IPA (isopropyl alcohol), for thepurpose of removing buffing dust. The common material may be an acrylic,an epoxy-acrylate or epoxy adhesive containing a conductive filler,while the sealing agent may be an acrylic, an epoxy-acrylate or epoxyadhesive. Although curing may be performed by heating, UV irradiation,or a combination thereof, a combination of heating and UV irradiation ispreferable due to high overlapping alignment accuracy and ready workingoperations.

Spacers are distributed on the counter substrate 32 to form a given gapand the counter substrate 32 is overlapped with the TFT substrate 30.After achieving alignment such that an alignment mark of the countersubstrate 32 is precisely aligned to an alignment mark of the TFTsubstrate 30, the sealing agent is preliminarily cured by UVirradiation, and then cured by heat at once.

Then, independent liquid crystal panels each having the TFT substrate 30and the counter electrode 32 are formed by scribe-break process.

The gap between the two substrates 30 and 32 is filled with a liquidcrystal 35 through an injection port which is then sealed with anUV-curable adhesive, and washing with isopropyl alcohol is executed. Anytype of liquid crystal may be used, and a nematic liquid crystal used ina twisted nematic mode having high-speed response is generally used.

The liquid crystal 35 is aligned by heating and a subsequent quenching.

Flexible lead lines are connected to the panel electrode extractionsection of the TFT substrate 30 by thermal compressive bonding using ananisotropic conductive film, and then a polarizer is bonded to thecounter electrode 32.

When the liquid crystal panel is produced by single-side assembly(suirable for compact liquid crystal panels of 2 inches or smaller),polyimide alignment films 33 and 34 are formed one surface of the TFTsubstrate 30 and on a device-mounting surface of the counter electrode32, respectively, and then these substrates 30 and 32 are aligned byrubbing or noncontact optical alignment using linearly polarized UVlight.

The TFT substrate 30 and the counter substrate 32 are divided intosegments by dicing or scribing and are washed with water or isopropylalcohol. A common material is applied to each divided TFT substrate 30whereas a sealing agent containing spacers is applied to each countersubstrate 32, and these substrates are overlapped with each other. Thesubsequent process is substantially the same as above.

In the above-described reflective LCD, he counter substrate 32 of thereflective LCD is a color filter (CF) substrate having a color filterlayer 46 provided below the ITO electrodes 31. The light incident to thecounter substrate 32 is effectively reflected by the reflective film 29and is emitted from the counter substrate 32.

Besides the substrate structure as shown in FIG. 8, the TFT substratemay have an on-chip color filter (OCCF) structure in which the TFTsubstrate 30 has a color filter, wherein ITO electrodes or ITOelectrodes with a black masks are directly bonded to the counterelectrode 32.

When the auxiliary storage capacitor (C_(S)) described before withreference to FIG. 13 is provided in the pixel section, a dielectriclayer (not shown in the drawing) provided on the substrate 1 isconnected to the drain region 19 of the single-crystal silicon.

As described above, this embodiment offers the following noticeableadvantages.

(A) The step differences 4 having a predetermined size and a shape areformed on the substrate 1, and the single-crystal silicon layer 7 isdeposited by high-temperature graphoepitaxy using the bottom corner ofeach step difference as a seed (heating during the graphoepitaxy isperformed at a relatively low temperature of 900 to 930° C.), whereby asingle-crystal silicon layer 7 having a high electron mobility of 540cm²/v sec or more is obtained to enable production of a LCD havinghigh-performance drivers.

(B) The single-crystal silicon layer has higher electron or holemobility, comparable with that of a single-crystal silicon substrate andis higher than that of conventional amorphous or polycrystalline siliconthin-films, so that single-crystal silicon dual-gate MOSTFTs using thissingle-crystal silicon layer can implement an integral structurecomposed of a display section and a peripheral-driving-circuit section,wherein the display section has nMOSTFTs, pMOSTFTs or cMOSTFTs with LDDstructures that offer high switching performance and low-leak currentcharacteristics, while the peripheral-driving-circuit section includescMOSTFTs, nMOSTFTs and/or pMOSTFTs which exhibit high drivingperformance, thus implementing a display panel having high imagequality, high definition, a narrow frame, a large screen and a highluminescent efficiency. Since the single-crystal silicon layer 7 hassufficiently high hole mobility, the peripheral driving circuit candrive by using only electrons or holes, or by a combination thereof, andcan be combined with the display TFTs having pMOSTFT or cMOSTFTs withLDD structures, thus realizing an integrated panel structure. In compactto medium-sized panels, one of a pair of vertical peripheral drivingcircuits may be omitted.

(C) In particular, the use of dual-gate MOSTFTs in the peripheraldriving circuit makes it possible to obtain cMOS, nMOS or pMOSTFTshaving driving-power 1.5 to 2.0 times as large that obtainable with theuse of single-gate TFTs, thus achieving higher performance and greaterdriving power of the TFTs, offering advantages particularly when TFTshaving large driving power are to be used in a local portion of theperipheral driving circuit. Furthermore, the dual-gate structure caneasily be changed to a top-gate type structure or a bottom-gate typestructure through a selection of one of the upper and lower gates and,in addition, ensures safe operation even in the event of a failure inone of the upper and lower gates because the other gate can safely beused.

(D) In adition, heating during graphoepitaxy can be performed at 930° C.or less, so that the single-crystal silicon layer 7 can be uniformlyformed on the insulating substrate at a relatively low temperature of,for example, 900 to 930° C. or less. Quartz glass, crystallized glass orceramic can be used as a substrate.

(E) Since this process does not require long-term annealing at a mediumtemperature nor excimer annealing, which is essential for solid phaseepitaxy, this process has high productivity and does not requireexpensive facilities, resulting in reduced production costs.

(F) In the high-temperature graphoepitaxy, a single-crystal siliconlayer having a variety of p-type impurity concnetrations and a highmobility can be readily produced by controlling the ratio of indiumu tosilicion, the heating temperature of the substrate, and the coolingrate, allowing the threshold voltage (Vth) to be readily controlled toreduce the resistance to facilitage high-speed operations.

(G) When a color filter is provided on the display array, the apertureratio of the display panel and the luminance are improved, and costs aredecreased due to omission of a color filter substrate and improvedproductivity.

A description will be given of a second embodiment of the second aspectof the present invention with reference to FIGS. 58A to 60D.

This embodiment has, as in the case of the first embodiment, top-gateMOSTFTs in the display section and dual-gate MOSTFTs in the peripheraldriving circuit section, but pertains to a transmissive LCD, unlike thefirst embodiment. More particularly, in this embodiment, thetransmissive LCD is produced by following the procedure as Steps shownin FIGS. 1A to 1C, FIG. 57A and 57B, and FIGS. 3A to 6C as in the firstembodiment, but in the subsequent process, contact holes 19 for thedrain sections of TFTs in the display sections are formed in insulatingfilms 25 and 36, as shown in FIG. 58A, and the unnecessary SiO₂ film,PSG film and Si film in the pixel-opening section are removed to improvethe transmittance.

With reference to FIG. 58B, a planarization film 28B, which is composedof an acrylic photosensitive transparent resin and has a thickness of 2to 3 μm, is formed on the entire surface by spin coating etc., and thencontact holes for drains of TFTs in the displaying section are formed inthe transparent resin 28B, followed by curing of the transparent resin28B executed under a given condition.

With reference to FIG. 58C, an ITO film having a thickness of 130 to 150nm is formed on the entiere surface by sputtering, and then an ITOtransparent electrodes 41 in contact with the drain section 19 in thedisplay region are formed by photolithography and etching. Next, aheat-treatment in a forming gas at 200 to 250° C. for 1 hour isperformed to reduce the contact resistance between the drain of each TFTin the display section and the ITO and to improve the transparency ofthe ITO.

Then, a transmissive LCD is assembled combining this TFT substrate 1with a conter substrate 32 as in the first embodimen, as shown in FIG.59. In this embodiment, however, a polarizer is provided also on the TFTsubstrate. Although transmission light runs in this transmissive LCD asshown by a solid line in the drawing, the arrangement may be such thattransmission light is available from the counter substrate 32.

An on-chip color-filter (OCCF) structure and an on-chip black (OCB)structure can be made from this transmissive LCD, as follows.

After performing Steps shown in FIGS. 1A to 1C, FIGS. 57A and 57B, andFIG. 3A to FIG. 6A, contact holes are also formed at the drain sectionsof the PSG-SiO₂ insulating film 25 as shown in FIG. 60A, and an aluminumembedded layer 41A for a drain electrode is formed, followed bydeposition of the SiN-PSG insulating film 36.

With reference to FIG. 60B, a photoresist 61 containing a red, green, orblue pigment having a thickness of 1 to 1.5 μm is formed on thecorresponding color segments and, as shown in FIG. 60C, color filterlayers 61(R), 61(G), and 61(B) are formed by a general photolithographicprocess in such a pattern as to leave the colors only at predeterminedlocations corresponding to the pixels. (OCCF structure). Contact holesare also formed at the drain sections. This embodiment excludes the useof an opaque ceramics substrates and substrates made oflow-transmissivity glass or heat-resistant resin.

With reference to FIG. 60C, a metal shading layer 43 servable as a blackmask layer is formed over the contact holes communicating with thedrains of the display TFTs and over the color filter layer, by apatterning process using a metal. For example, a molybdenum film havinga thickness of 200 to 250 nm is formed by a sputtering process and isthen patterned to form a given shape for shading the display TFTs (OCBstructure).

With reference to FIG. 60D, a planarization film 28B composed of atransparent resin is formed, and then ITO transparent electrodes 41 areformed so as to connect to the shading layer 43 through the contactholes provided in the planarization film.

The color filter 61 and the shading layer (black mask) 43 formed on thedisplay array section improves the aperture ratio of the liquid crystaldisplay panel and decreases electrical power consumption of the displaymodule including a back light.

A description will be given of a third embodiment of the second aspectof the present invention.

This embodiment relates to an active-matrix reflective liquid crystaldisplay (LCD) including top-gate MOSTFTs formed of a single-crystalsilicon layer which is deposited by low-temperature graphoepitaxy froman indium-gallium-silicon or gallium-silicon melt, using as seeds stepdifferences (indents) on a glass substrate having a low distortionpoint.

In contrast to the first embodiment, the substrate 1 used in thisembodiment is a glass substrate having a low distortion point or maximumusable temperature as low as 600° C. or so, such as borosilicate glassor aluminosilicate glass, as the substrate employed in Step shown inFIG. 1A. Such a glass is inexpensive and can easily be produced in largesizes, e.g., 500 mm×600 mm×0.1 to 1.1 mm can be formed using long rolledglass. obviously, quartz and crystallized glass may be used as well.

After forming the step differences 4 as in the preceding embodiments, anindium-gallium (or gallium) melt containing silicon is applied to thesubstrate 1 in Step shown in FIG. 57B.

When the substrate 1 is gradually cooled, as shown in FIG. 3A, silicondissolved in indium-gallium (or indium) is deposited by graphoepitaxy onthe bottom corners of the step differences 4 serving as seeds to form asingle-crystal silicon layer 7 having a thickness of, for exmaple, 0.1μm.

In this case also, the (100) plane of the single-crystal silicon layer 7is deposited on the substrate by epitaxy and the orientation of thecrystal layer can be controlled by changing the shape of the stepdifferences 4, as shown in FIGS. 9A to 9F.

After the deposition of the single-crystal silicon layer 7 bygraphoepitaxy on the substrate 1, indium-gallium (or gullium)at thesurfae are removed by hydrochloric acid or sulfuric acid, as shown inFIG. 3B.

Using the single-crystal silicon layer 7, top gate MOSTFTs are formed inthe display section and the peripheral-driving-circuit section, as inthe first embodiment. The structure shown in FIG. 8 may also be employedin this embodiment.

This embodiment has the following noticeable advantages, in addition tothe advantages of the first embodiment.

(A) The single-crystal silicon layer 7 can be more uniformly formed onthe glass substrate 1 by graphoepitaxy at a lower temperature ofapproximately 300 to 600° C. (or 420 to 600° C.).

(B) This process enables the formation of the single-crystal siliconlayer on an insulating substrate such as an organic substrate, otherthan the glass substrate, allowing the use of any inexpensive materialhaving a low distortion point and improved physical properties as thesubstrate, thus facilitating production of large-size substrates.Accordingly, a thin, long and rolled glass or organic substrate providedwith a single-crystal silicon layer can be produced using such amaterial at a reduced cost and with high productivity. When theconstituents in the glass substrate are diffused into the upper layerand affect the transistor characteristics, a thin barrier layer, forexample, a silicon nitride layer having a thickness of 50 to 200 nm, ispreferably provided, in order to suppress such a diffusion.

(C) In the low-temperature graphoepitaxy, a single-crystal silicon layerhaving a variety of p-type impurity concentrations and a high mobilitycan be readily produced by controlling the ratio of indium to gallium ofthe indium-gallium film, the heating temperature of the substrate, andthe cooling rate, thus facilitating the control of the threshold voltage(Vth) and reducing the resistance to afford high-speed operation.

A description will be given of a fourth embodiment of the second aspectof the present invention.

In contrast to the preceding third embodiment, this embodiment relatesto a transmnissive LCD in which a single-crystal silicon layer is formedby low-temperature graphoepitacy using an indium-gallim melt, as in thesecond embodiment.

Using the single-crystal silicon layer, the transmissive LCD is producedby the process shown in FIG. 58A to FIG. 60D. opaque ceramic substratesand opaque or translucent organic substrates are not suitable for thetransmissive LCD.

Accordingly, this embodiment has the advantages of both the second andthe third embodiments. Thus, this embodiment offers the followingadvantages in addition to those produced by the first embodiment:borosilicate glass and heat-resistant organic materials which areinexpensive and facilitate the formation of long thin rolled substratescan be used as the substrate 1; the conductive type and Vth of thesingle-crystal silicon layer can be readily adjusted by the ratio ofindium to gallium; and the color filter 42 and the black mask 43provided on the display array section improve the aperture ratio of theliquid crystal display panel and decreases electrical power consumptionof the display module including a back light.

FIG. 20A to FIG. 21D, FIGS. 61A to 62D, and FIGS. 24A to 28C show afifth embodiment of the second aspect of the present invention.

In this embodiment, the peripheral-driving-circuit section includes aCMOS driving circuit including dual-gate-type pMOSTFTs and nMOSTFTs asin the first embodiment. The display section is of a reflective type andincludes TFTs having various gate configurations arranged in a variety ocombinations.

The display section shown in FIG. 20A includes top-tate nMOSLDD-TFTs asin the first embodiment, while the display section shown in FIG. 20Bincludes bottom-gate nMOSLDD-TFTs, whereas the display section shown inFIG. 20C includes dual-gate nMOSLDD-TFTs. These bottom-gate anddual-gate MOSTFTs can be produced by the same process for the dual-gateMOSTFTs of the peripheral-driving-circuit section, as will be describedlater, the dual-gate MOSTFT having higher driving ability and beingsuitable for high-speed switching by virtue of the presence of upper andlower gates and, furthermore, the upper or lower gate may be selectivelyused to implement a top- or bottom-gate type during operation.

In the bottom-gate MOSTFT shown in FIG. 20B, a gate electrode 71 iscomposed of, for example, molybdenum-tantalum, and a gate insulatingfilm is composed of a SiN film 72 and a SiO₂ film 73. A channel regionand so forth using the single-crystal silicon layer are formed on thegate insulating film as in the cse of the dual-gate MOSTFT of theperipheral-driving-circuit section. The dual-gate MOSTFT shown in FIG.20C has the lower-gate section substantially the same as that in thebottom-gate MOSTFT, whereas the upper-gate section includes anupper-gate electrode 83 formed on a gate insulating film 82 composed ofa SiO₂ film and a SiN film. In all the cases, each gate section isformed in the exterior of the step difference 4 which serves as a seedfor graphoepitaxy.

A method of producing th eabove-mentioned bottom-gate MOSTFT will bedescribed with reference to FIGS. 21A to 21D, FIGS. 61A to 61D, FIGS.62A to 62D, and FIGS. 24A to to 25C, and a method of producing thedual-gate MOSTFT will be described with reference to FIGS. 26A to 28C.The method of producing the dual-gate MOSTFT in theperipheral-driving-circuit section is the same as that described beforewith reference to FIGS. 1A to 6C and is therefore not illustrated.

With reference to FIG. 21A, ih the production of the bottom-gate MOSTFTin the display section, a molybdenum-tantalum alloy film 71 having athickness of 500 to 600 nm is formed on a substrate 1 by sputtring.

With reference to FIG. 21B, a photoresist 70 having a given pattern isformed by a processing which is the same as that described withreference to FIG. 1B, and the molybdenum-tantalum alloy film 71 issubjected to taper etching using the photoresist 70 as a mask to form agate electrode 71 having a trapezoidal side base 71 a with an angle of20 to 45 degrees.

With reference to FIG. 21C, the processing which is the same as thatshown in FIG. 1C is conducted in which, after the photoresist 70 isremoved, a SiN film 72 having a thickness of approximately 100 nm andthen a SiO₂ film 73 having a thickness of approximately 200 nm aredeposited on the substrate 1 including the molybdenum-tantalum alloyfilm 71, by a plasma-enhanced CVD process, thereby to form a gateinsulating film.

With reference to FIG. 21D, the same process as that described before inconnection with FIG. 57A is executed in which a photoresist 2 having agiven pattern is formed in at least the TFT-forming region, and aplurality of step differences 4 having a proper shape and size areformed in the gate insulating film and further in the substrate 1through a mask constituted by the photoresist 2, as described above. Thestep differences 4 function as seeds during graphoepitaxy of thesingle-crystal silicon layer as will be described later, and have adepth d of 0.3 to 0.4 μm, a width of 2 to 3 μm, a length of 10 to 20 μmperpendicular to the drawing sheet, and an basilar angle (between thebottom and the side wall) which is a right angle.

Then, after removal of the photoresist 2, the same processing as FIG.57B is conducted to apply an indium (or indium-gallium or gallium)containing silicon, as in FIG. 61A.

Then, the same process as FIG. 3A is executed to cause graphoepitaxialgrowth of a single-crystal silicon, whereby a single-crystal siliconlayer of a thickness of, for example, 0.1 μm or so is deposited, asshown in FIG. 61B. In this process, the side faces 71 a of theunderlying gate electrode 71 are gently tapered, so that these sidefaces do not cause impediment to the epitaxial growth on the seedsconstituted by the step differences, whereby the single-crystal siliconlayer 7 can grow on these side faces without discontinuity.

Then, the film 6A of indium is removed as shown in FIG. 61C and, afterexecution of Steps shown in FIGS. 3C to 4B, the processing which is thesame as that of FIG. 4C is executed in which the gate section of thenMOSTFTs in the display section are covered by the photoresist 13, andsource and drain regions of the nMOSTFTs left exposed are doped by ionimplantation with phosphor ions 14, whereby an LDD section 15 composedof an N-type layer is formed by self-alignment, as shown in FIG. 61D. Inthis process, the bottom-gate electrode 71 permits easy recognition ofthe height differences or pattern, thus facilitating positioning of thephotoresist 13, i.e., mask alignment, thereby suppressing misalignment.

With reference to FIG. 62A, the gate section and the LDD section of thenMOSTFT are covered with a photoresist 16 and the exposed region isdoped with phosphorus or arsenic ions 17 by ion implantation to form asource section 18 and a drain section 19 composed of an N⁺-type layer ofthe nMOSTFT, as in Step shown in FIG. 5A.

With reference to FIG. 62B, the entire nMOSTFT is covered with aphotoresist 20 and then doped with boron ions 21 by ion implantation toform a source section and a drain section of the p⁺ layer of thepMOSTFTS in the peripheral-driving-circuit section, as in Step shown inFIG. 5B.

With reference to FIG. 62C, a photoresist 24 is provided and then thesingle-crystal silicon layer is selectively removed by conventionalphotolithography and etching to island the active device section and thepassive device section, as in Step shown in FIG. 5C.

With reference to FIG. 62D, a SiO₂ film 53 having a thickness ofapproximately 300 nm and then a phosphosilicate glass (PSG) film 54having a thickness of approximately 300 nm are formed on the entiresurface by a plasma-enhanced CVD process, a high-density plasma-enhancedCVD process, or a catalytic CVD process, as in Step shown in FIG. 6A.The SiO₂ film 53 and the PSG film 54 correspond to the aforementionedprotective film 25. The single-crystal silicon layer is then subjectedto an activation treatment as described before.

With reference to FIG. 24A, contact holes are formed for the sourcesections by conventional photolithography and etching, as in Steps shownin FIG. 6B. An aluminum sputtering film having a thickness of 400 to 500nm is formed on the entire surface, and source electrodes 26 of theTFTs, data lines and gate lines are simultaneously formed byconventional photolithography and etching. The substrate is thensintered in a forming gas at approximately 400° C. for 1 hour.

With reference to FIG. 24B, an insulating film 36 composed of a PSG filmhaving a thickness of approximately 300 nm and a SiN film having athickness of approximately 300 nm is formed on the entire surface by ahigh-density plasma-enhanced CVD process or a catalytic CVD process, andcontact holes are formed at the drain sections of display TFTS, as inFIG. 6C.

With reference to FIG. 24C, a photosensitive resin film 28 having athickness of 2 to 3 μS is formed by spin coating, as in step 16 shown inFIG. 7A, followed by a Step shown in FIG. 24D in which an uneven patternis formed and then subjected to reflow to form a lower portion of areflective layer having an uneven surface 28A so that the pixel sectionhas optimized reflective and viewing-angle characteristics. At the sametime, contact holes are formed in the resin for allowing contact of thedrain sections of the display TFTs.

With reference to FIG. 24D, an aluminum sputtering film having athickness of 400 to 500 nm is formed on the entire surface, and then anuneven aluminum reflective section 29 connecting to the drain sections19 of the display TFTs is formed by conventional photolithography andetching, as in Step shown in FIG. 7C.

As described above, the resulting active-matrix substrate 30 integratesa display section and a peripheral-driving-circuit section, in which thedisplay section includes bottom-gate nMOSLDD-TFTs using thesingle-crystal silicon layer 7 formed by high-temperature graphoepitaxyon the step differences 4 as a seed, while theperipheral-driving-circuit section includes a cMOS driving circuithaving dual-gate pMOSTFTs and dual-gate nMOSTFTs.

FIGS. 25A to 25C show the formation of the gate insulating film of theabove-mentioned bottom-gate MOSTFT in the display section by anodicoxidation of molybdenum-tantalum.

After the step of FIG. 21B, the molybdenum-tantalum alloy film 71 issubjected to conventional anodic oxidation treatment, as shown in FIG.25A, to form on the surface a gate insulating film 74 composed of Ta₂O₅and having a thickness of 100 to 200 nm.

Next, with reference to FIG. 25B, the step differences 4 are formed anda single-crystal layer 7 is deposited thereon graphoepitaxy, as in thesteps shown in FIGS. 21A to 21D and FIGS. 61A to 61C, followed byexecution of processing similar to those of FIGS. 61D to 62D, and FIGS.23A to 24D to form an active matrix substrate 30 as shown in FIG. 25C.

When the dual-gate MOSTFTs are produced in the display section, theprocesses are executed in the same way as those shown in FIGS. 21A to21D and FIGS. 61A to 61C.

More specifically, with reference to FIG. 26A, step differences 4 areformed in the substrate 1 through the insulating films 72 and 73, andthen a single-crystal silicon layer 7 is deposited by graphoepitaxy onthe step differences 4 as a seed. Next, a step which is the same as thatshown in FIG. 4A is executed so that a SiO₂ film having a thickness ofapproximately 200 nm and then a SiN film having a thickness ofapproximately 100 nm are successively formed on the entire surface ofthe single-crystal silicon layer 7 by a plasma-enhanced CVD process or acatalytic CVD process, thereby to form an insulating film 80corresponding to the insulating film 8. Then, a molybdenum-tantalumalloy film 81 having a thickness of 500 to 600 nm, corresponding to thesputtering film 9, is formed by sputtering.

With reference to FIG. 26B, processing which is the same as that shownin FIG. 4B is executed: namely, a photoresist pattern 10 is formed andis subjected to continuous etching to form a top-gate electrode 82(corresponding to the gate electrode 12) composed of themolybdenum-tantalum alloy and a gate insulating film (corresponding tothe gate insulating film 11), thereby exposing the single-crystalsilicon layer 7.

With reference to FIG. 26C, the same processing as that shown in FIG. 4Cis executed: namely, the top-gate section of the nMOSTFT is covered witha photoresist 13, and the exposed source and drain regions of thenMOSTFT for display are doped with phosphorus ions 14 by ionimplantation to form an N⁻-type LDD section 15.

With reference to FIG. 26D, the same processing as that shown in FIG. 5Ais executed: namely, the gate section and the LDD section of the nMOSTFTare covered with a photoresist 16, and the exposed region is doped withphosphorus or arsenic ions 17 by ion implantation, thereby to form asource section 18 and a drain section 19 of nMOSTFT composed of anN⁺-type layer.

With reference to FIG. 27A, the same processing as that shown in FIG. 5Bis performed: namely, the gate section of the pMOSTFT is covered with aphotoresist 20 and the exposed region is doped with boron ions 21 by ionimplantation to form a source section and a drain section of the pMOSTFTcomposed of a P⁺-layer in the peripheral-driving-circuit section.

With reference to FIG. 27B, the same processing as that shown in FIG. 5Cis executed: namely, a photoresist layer 24 is provided and thesingle-crystal silicon layer is selectively removed at portions otherthan the active and passive device sections by conventionalphotolithography and etching, thereby to island the active devicesection and the passive device section.

With reference to FIG. 27C, the same process as that shown in FIG. 6A isperformed: namely, a SiO₂ film 53 having a thickness of approximately200 nm and a phosphosilicate glass (PSG) glass 54 having a thickness ofapproximately 300 nm are formed on the entire surface by aplasma-enhanced CVD process, a high-density plasma-enhanced CVD process,or a catalytic CVD process. These films 53 and 54 correspond to theaforesaid protective film 25. Then, an activation treatment is effectedon the single-crystal silicon layer 7.

With reference to FIG. 27D, the same processing as that shown in FIG. 6Bis executed: namely, contact holes are formed for the source sections.An aluminum sputtering film having a thickness of 400 to 500 nm isformed on the entire surface, and then source electrodes 26, data linesand gate lines are simultaneously formed by conventionalphotolithography and etching.

With reference to FIG. 28A, the same processing as that shown in FIG. 6Cis executed: namely, an insulating film 36 including a PSG film having athickness of approximately 300 nm and a SiN film having a thickness ofapproximately 300 nm is formed on the entire surface, and contact holesare formed for the drain sections of the display TFTs.

With reference to FIG. 28B, a photosensitive resin film 28 having athickness of 2 to 3 μm is formed on the entire surface by, for example,spin coating. With reference to FIG. 28C, Steps which are the same asthose of FIGS. 7A and 7B are performed: namely, a lower portion of areflective face comprising an uneven surface 28A is formed in at leastthe pixel section, contact holes are formed for the drain sections ofthe display TFTS, and an uneven aluminum reflective section 29connecting to the drain sections 19 of the display TFTs are formed sothat optimum reflective and viewing-angle characteristics are achieved.

The resulting active-matrix substrate 30 integrates a display sectionand a peripheral-driving-circuit section, in which the display sectionincludes dual-gate nMOSLDD-TFTs and the peripheral-driving-circuitsection includes a cMOS driving circuit having dual-gate nMOSTFTs anddual-gate pMOSTFTs, wherein these TFTs are formed by using thesingle-crystal silicon layer 7 deposited by high-temperaturegraphoepitaxy on the step differences 4 as seeds.

FIGS. 29A to 36B show a sixth embodiment of the second aspect of thepresent invention.

In this embodiment, the gate electrode at the top gate section iscomposed of a material having relatively low thermal resistance, such asaluminum, unlike the preceding embodiments.

For the purpose of forming top-gate MOSTFTs in the display section whileforming dual-gate MOSTFTs in the peripheral-driving-circuit section, thesame steps as those shown in FIGS. 1A to 3B are executed as in the firstembodiment and, thereafter, an N-type well 7A is formed in the pMOSTFTsections of the peripheral-driving-circuit section, as shown in FIG.29A.

With reference to FIG. 29B, all of the nMOSTFTs and pMOSTFTs in theperipheral-driving-circuit section and the gate sections of the nMOSTFTsin the display section are covered with a photoresist 13, and theexposed source and drain regions of the nMOSTFTs are doped withphosphorus ions 14 by ion implantation, for example, at 20 kV and at adosage of 5×10¹³ atoms/cm² to form by self-alignment a LDD section 15composed of an N⁻-type layer.

With reference to FIG. 30A, all of the pMOSTFTs in theperipheral-driving-circuit section, the gate sections of the nMOSTFTs inthe peripheral-driving-circuit section, and the gate section and the LDDsection of the nMOSTFTs in the display section are covered with aphotoresist 16, and the exposed region is doped with phosphorus orarsenic ions 17, for example, at 20 kV and at a dosage of 5×10¹⁵atoms/cm² by ion implantation, thereby to form a source section 18,drain section 19 and an LDD section 15 of nMOSTFT composed of an N⁺-typelayer. Preferably, the resist 13 is left unremoved, as shown by thedotted line in the drawing, and the resist 16 is provided so as to coverthe resist 13, so that, in the formation process of the resist 16, amask is readily aligned with high accuracy by using the resist 13 as areference, thus diminishing the risk of misalignment.

With reference to FIG. 30B, all of the nMOSTFTs in theperipheral-driving-circuit section and all of the nMOSTFTs and the gatesections of the pMOSTFTs in the display section are covered with aphotoresist 20, and the exposed regions are doped with boron ions 21 byion implantation at 10 kV and at a dose of 5×10¹⁵ atoms/cm² to formsource sections 22 and drain sections 23 of the pMOSTFTs composed of aP⁺-type layer.

With reference to FIG. 30C, after the removal of the resist 20, thesingle-crystal silicon layers 7 and 7A are activated in the same way asthat described before, followed by deposition of a gate insulating film12 and a gate electrode material layer 11 which is of aluminum oraluminum alloy containing 1 percent by weight of Si. The gate electrodematerial layer 11 may be formed by a vacuum evaporation process or asputtering process.

After a patterning of the respective gate sections, the active devicesection and the passive device section are isolated, in the same way asthat described before and, as shown in FIG. 31A, a SiO₂ film having athickness of approximately 200 nm and then a phosphosilicate glass (PSG)film having a thickness of approximately 300 nm are deposited on theentire surface, thereby to form a protective film 25.

With reference to FIG. 31B, contact holes are formed for the source anddrain sections of all TFTs in the peripheral-driving-circuit section andthe source sections of the display TFTS, by conventionalphotolithography and etching.

A film having a thickness of 500 to 600 nm is formed on the entiresurface by sputtering, with aluminum or an aluminum alloy containing 1weight percent of Si and, thereafter, the source electrodes 26 of allTFTs in the peripheral-driving-circuit section and the display section,drain electrodes 27 in the peripheral-driving-circuit section, datalines and gate lines are simultaneously formed by conventionalphotolithography and etching. The substrate is then subjected tosintering treatment in a forming gas (N₂+H₂) at approximately 400° C.for 1 hour.

Then, Steps which are the same as those shown in FIGS. 6C to 7C areexecuted, whereby an active-matrix substrate 30 is obtained integratinga display section and a peripheral-driving-circuit section by using thesingle-crystal silicon layer 7, in which the display section includestop-gate nMOSLDD-TFTs having gate electrodes of aluminum or aluminumalloy containing 1 weight percent of Si, while theperipheral-driving-circuit section has a CMOS driving circuit havingdual-gate pMOSTFTS and dual-gate nMOSTFTs.

Since the aluminum or aluminum-alloy gate electrodes 11 are formed afterthe activation treatment of the single-crystal silicon layer 7, the gateelectrode material is not subject to the heat during the activationtreatment, so that inexpensive material having relatively low heatresistance, such as aluminum or 1 wt % Si aluminum alloy, can be used asthe gate electrode, offering a wider selection of the electrodematerials. This applies also to the case where the display sectionincludes bottom-gate MOSTFTs.

For implementing a configuration in which dual-gate MOSTFTs are formedboth in the display section and the peripheral-driving-circuit section,respectively, the processes shown in FIGS. 21A to 21D, and FIGS. 61A to61C are performed, and then an N-type well 7A is formed at the pMOSTFTsection in the peripheral-driving-circuit section, as shown in FIG. 32A.

With reference to FIG. 32B, the TFT s in the display section are dopedwith phosphorus ions 14 to form LDD sections 15, as in the step shown inFIG. 61D.

With reference to FIG. 33A, the same processing as that shown in FIG.62A is executed: namely, the nMOSTFT sections in the display section andthe peripheral-driving-circuit section are doped with phosphorus ions 17to form N⁺-type source regions 18 and drain regions 19.

With reference to FIG. 33B, the same process as that shown in FIG. 62Bis executed: namely, the pMOSTFT section in theperipheral-driving-circuit section is doped with boron ions 21 to form aP⁺-type source region 22 and a drain region 23.

With reference to FIG. 33C, after the removal of the resist 20, thesingle-crystal silicon layer 7 is patterned to island the active devicesection and the passive device section and, thereafter, as shown in FIG.34A, the single-crystal silicon layers 7 and 7A are activated in thesame way as that described before, followed by formation of a gateinsulating film 80 in the display section and formation of a gateinsulating film 12 in the peripheral-driving-circuit section,respectively.

With reference to FIG. 34B, an aluminum film sputtered on the entiresurface is patterned to form upper-gate electrodes 83 in the displaysection and upper-gate electrodes 11 in the peripheral-driving-circuitsection.

With reference to FIG. 34C, a SiO₂ film having a thickness ofapproximately 200 nm and then a PSG film having a thickness ofapproximately 300 nm are deposited to form a protective film 25.

Source electrodes 26 of all TFTs in the peripheral-driving-circuitsection and the display section and drain electrodes 27 in theperipheral-driving-circuit section are formed by the same process asthat described before, whereby an active-matrix substrate 30 is obtainedintegrating the display section and the peripheral-driving-circuitsection using the single-crystal silicon layer 7, wherein the displaysection includes dual-gate nMOSLDD-TFTs having aluminum top gateelectrodes, while the peripheral-driving-circuit section includes a cMOSdriving circuit having dual-gate pMOSTFTs and dual-gate nMOSTFT.

Since the gate electrodes 11 and 83 are formed after the activationtreatment of the single-crystal silicon layer 7 in this embodiment, thegate electrode material does not undergo the heat applied during theactivation treatment, so that any inexpensive material having relativelylow heat resistance, such as aluminum, may be used for the gateelectrode, thus widening the selection of the electrode materials. Thesource electrodes 26 (and the drain electrodes also) may besimultaneously formed in Step shown in FIG. 34B, thus offeringadvantages in the production process.

When the bottom-gate or top-gate or dual-gate MOSTFTs are formed in anyof above-described embodiments, the single-crystal silicon layer 7deposited on the step difference 4 may have discontinuity or thinnedportions, as schematically shown in FIG. 35A, leading to connectionfailure or increase in the resistance and, therefore, the sourceelectrode 26 (or the drain electrode 27) is preferably provided in aregion including the step difference 4 in order to ensure the connectionto the single-crystal silicon layer 7, as shown in FIGS. 35B and 35C.

As an alternative to Step shown in FIG. 29B or Step shown in FIG. 32B,after the formation of the top-gate insulating film on thesingle-crystal silicon layer 7, ion implantation and activationtreatment may be performed and then the top-gate electrodes and sourceand drain electrodes may be simultaneously formed.

The step differences 4 are formed in the substrate 1 (and in theoverlying SiN film) in the described embodiment as shown in FIG. 36A,this is only illustrative and the step differences 4 may be formed on aSiN film 51 on the substrate 1, as shown in FIG. 36B so that the SiNfilm 51 inhibits diffusion of ions from the glass substrate 1. Thearrangement also may be such that the gate insulating films 72 and 73are formed in place of the SiN film 51 or on the SiN film 51 and thestep differences are formed in these gate insulating films.

FIGS. 37A to FIGS. 39 show a seventh embodiment of the second aspect ofthe present invention.

In this embodiment, TFTs are formed at the exterior of the stepdifferences 4, that is, in regions other than the step differences 4. Inthese drawings, the single-crystal silicon layer 7 and the gateelectrodes 11, source electrodes 26 and drain electrodes 27 are shownonly schematically.

FIGS. 37A to 37E show top-gate MOSTFTS. Referring first to FIG. 37A, theindented section formed by the step difference 4 is located along and onone side of the source region, and the gate insulating film 12 and thegate electrodes 11 are formed on the areas of the single-crystal siliconlayer 7 where there is no indented section. FIG. 37B shows anarrangement in which the indented section has an L-like shape, with oneleg extending along the side of the source region and the other legextending in the direction of length of the channel down to the end ofthe drain region. FIG. 37C shows an arrangement in which the indentedsection has a rectangular form with four sides surrounding the TFTactive region. FIG. 37D shows an arrangement in which the indentedsection has three sides. In FIG. 37E, an indented section has an L-shapewith two sides. In all these cases, adjacent indented sections 4 arediscrete and isolated from each other.

Thus, the indented sections or step differences 4 may have any suitableshape, and the TFTs are formed on the areas other than these stepdifferences 4, so that the TFTs can be fabricated without difficulty.

FIGS. 38A to 38C show bottom-gate MOSTFTs. Any type of step difference 4shown in FIGS. 37A to 37E may be employed also in this type of MOSTFTs.In FIG. 38A corresponding to FIG. 37A, the bottom-gate MOSTFT is formedon the flat portion other than the step difference 4. Likewise, FIG. 38Bcorresponds to FIGS. 37B, and FIG. 38C corresponds to FIG. 37C or 37D.

FIG. 39 shows a dual-gate MOSTFT. Any type of step difference 4 shown inFIGS. 37A to 37E may also be employed in this type. For example, thedual-gate MOSTFT may be formed on the flat portion in the interior ofthe step difference 4 shown in FIG. 37C or 37D.

FIGS. 40A to 42C show an eighth embodiment of the second aspect of thepresent invention.

FIGS. 40A and 40B show a self-alignment type LDD-TFT, for example, adouble-gate MOSTFT including a plurality of top-gate MOSLDD-TFTs.

A gate electrode 11 has two branches, that is, a first gate 11A and asecond gate 11B, wherein the first gate 11A is used for a first LDD-TFT51 and the second gate is used for a second LDD-TFT 52, and preferablyAn N⁺-type region 100 is provided in the center of the single-crystalsilicon layer between these gates in order to decrease resistance.Different voltages may be applied to these gates and, in the event thatone gate has become inoperable due to any reason, the other gate willperform transfer of carriers between the source and the drain, thusoffering high reliability of the device. The first LDD-TFT 51 and thesecond LDD-TFT 52 are connected in series and function as a thin-filmtransistor for driving a pixel, so that the voltage applied between thesource and the drain of each thin-film transistor can be significantlyreduced in the OFF mode of operation. Thus, the leakage current in theOFF mode can be reduced, resulting in improved contrast and imagequality in the liquid crystal display. Since these two LDD transistorsare connected to each other only through the semiconductor layer whichis the same as the low-concentration drain region, the conductivedistance between the transistors can be shortened, avoiding an increasein the transistor area despite the dual LDD transistor configuration.The first and second gates may be isolated from each other forindependent operation.

FIG. 41A shows a double gate configuration of bottomgate MOSTFTS, andFIG. 41B shows a double gate configuration of dual-gate MOSTFTS.

These double-gate MOSTFTs have the same advantages as those in theabove-described top-gate type. Use of dual-gate structure offers afurther advantage in that, if one gate section is not operable in thedual-gate type, the other gate section can be used.

FIGS. 42A to 42C are equivalent circuit diagrams of the respective typesof the double-gate configuration. The gate may be branched or dividedinto three or more, although in the illustrated embodiment it isbranched into two. In the double- or multi-gate configuration, thebranched gate electrodes having the same potential, or gate electrodesisolated by the division and having the same potential or differentpotentials, may be provided in the channel region.

FIGS. 43A and 43B show a ninth embodiment of the second aspect of thepresent invention, wherein one of the upper and lower-gate sections of adual-gate type nMOSTFT is used in a transistor operation, whereas theother operates as follows.

In an nMOSTFT shown in FIG. 43A, an appropriate negative voltage isconstantly applied to the gate electrode at the top gate side to reducethe leakage current in the back channel. When the top gate electrode isopened, this is used as a bottom-gate type. In FIG. 43B, an appropriatenegative voltage is constantly applied to the gate electrode at thebottom gate side to reduce the leakage current in the back channel. Whenthe bottom gate electrode is opened, this is used as a top-gate type. Incase of a pMOSTFT, leakage current in the back channel can be reduced byconstantly applying an appropriate positive voltage to the gateelectrode.

The interface between the single-crystal silicon layer 7 and theinsulating film has low crystallinity and readily causes a leakagecurrent, but the above-mentioned negative voltage applied to the gateelectrode can effectively reduce the leakage current. This advantage isadded to that offered by the LDD structure. Furthermore, the bottom gateelectrode shades the light incident on the substrate 1, so that theleakage current caused by the incident light can be reduced.

FIG. 44 to FIG. 52 show a tenth embodiment of the second aspect of thepresent invention.

As described above, the top-gate, bottom-gate and dual gate TFTs havedifferent structures, functions and characteristics. A variety ofcombinations of these TFTs may be employed in the display section andthe peripheral-driving-circuit section to obtain various advantageouseffects.

For example, as shown in FIG. 44, when any one of the top-gate MOSTFT,the bottom-gate MOSTFT and the dual-gate MOSTFT is used in the displaysection, at least the dual-gate type is used alone or in a combinationwith at least one of the other types, in the peripheral-driving-circuitsection. In this case, there are 12 types of combination identified byNos. 1 to 12. When a dual-gate structure is employed in the MOSTFT inthe peripheral-driving-circuit section, this dual-gate structurefunctions as a top-gate type or a bottom-gate type by selecting theupper or lower gate, and the dual-gate type structure also is preferredwhen a local portion of the peripheral driving circuit requires TFTshaving large driving power. For example, electrooptical devices usingorganic EL or FED will require such TFTs having large driving power.

A variety of combinations (Nos. 1 to 216) of channel conduction typesare available for the MOSTFTs to be used in theperipheral-driving-circuit section and the display section,specifically: FIGS. 45 and 46 show combinations possible when theMOSTFTs in the display section do not have a LDD structure; FIGS. 47 and48 show combinations possible when the MOSTFTs in the display sectionhave a LDD structure; FIGS. 49 and 50 show combinations possible whenthe peripheral-driving-circuit section includes TFTs having a LDDstructure; and FIGS. 51 and 52 show combinations possible when both theperipheral-driving-circuit section and the display section include TFTshaving a LDD structure.

Thus, the details of the combinations shown in FIG. 44 are shown inFIGS. 45 to 52. These combinations are also available when theperipheral-driving-circuit section includes the top-gate MOSTFT and theother-type MOSTFT(s). These combinations shown in FIGS. 44 to 52 areapplicable not only when the channel regions of the TFTs are formed of asingle-crystal silicon but also when the channel region of the TFT isformed of polycrystalline silicon or amorphous silicon (only in thedisplay section).

FIGS. 53A to FIG. 54 show a thirteenth embodiment of the second aspectof the present invention.

This embodiment is an active-matrix LCD which includes TFTs having highdriving power and using the above-mentioned single-crystal silicon layerin the peripheral-driving-circuit section, in order to attain a greaterdriving power. This, however, is not exclusive and the TFTs may employnot only dual-gate MOSTFTs but also other gate types together with thedual-gate type, as well as a variety of channel conduction types, andmay further include MOSTFTs using polycrystalline silicon layer. Incontrast, the MOSTFTs of the display section are preferably use asingle-crystal silicon layer, although they may use a polycrystalline oramorphous silicon layer or at least two out of the three types ofsilicon layers in combination. It is to be noted, however, when thedisplay section is constituted by nMOSTFTs, a single-crystal orpolycrystalline silicon layer is preferably used because such types ofsilicon layer enables a reduction in the areas of TFTs and is preferredto amorphous silicon also from the viewpoint of reduction in pixeldefects, although a practically acceptable switching speed is stillattainable also with the amorphous silicon layer. Polysilicon, inaddition to single-crystal silicon, may be formed during graphoepitaxy,thereby forming a continuous grain silicon (CGS) structure which can beadvantageously used for the formation of the active device and thepassive device in some cases.

FIGS. 53A to 53C show possible combinations of various MOSTFTs. FIG. 54shows the details of these combinations. The use of single-crystalsilicon causes improved current driving ability. The use ofsingle-crystal silicon causes improved current driving ability. The useof a single-crystal silicon serves to improve current driving power,thus offering advantages such as a reduction in the device size, anincrease in the screen size, and an increase in the aperture ratio.

In the peripheral-driving-circuit section, an electric circuitintegrating diodes, capacitors, resistors, and inductors, in addition tothe MOSTFTs, can be consolidated on the insulating substrate such as aglass substrate.

FIG. 55 shows a twelfth embodiment of the second aspect of the presentinvention.

This embodiment implements a passive-matrix drive, in contrast to thepreceding embodiments that are focused on active-matrix driveconfigurations.

In this embodiment, therefore, the display section does not haveswitching devices such as MOSTFTs, and modulation of the incident orreflected light in the display section is performed only by thevariation in the voltage applied between a pair of electrodes formed ontwo opposing substrates. Examples of such modulation devices includereflective or transmissive LCDs, organic or inorganic EL devices(electroluminescent devices), FEDs (field emission display devices),LEPDs (light-emitting polymer display devices), and LEDs (light-emittingdiodes).

FIGS. 56A and 56B show a thirteenth embodiment of the second aspect ofthe present invention.

This embodiment is directed to an electrooptical device other than anLCD, such as an organic or inorganic EL device (electroluminescentdevice), FED (field emission display device), LEPD (light-emittingpolymer display device), and LED (light-emitting diode).

FIG. 56A shows an active-matrix EL device, comprising a substrate 1, anorganic EL layer 90 composed of, for example, an amorphous organiccompound or, alternatively, an inorganic EL layer such as of ZnS:Mn,formed on the substrate 1, a transparent ITO electrode 41 provided belowthe EL layer 90, and a cathode 91 is formed on the EL layer 90, wherebycolored light is emitted through a color filter 61 in response to avoltage applied to these electrodes 41 and 91.

In order to apply a data voltage to the transparent electrode 41 byactive-matrix drive, the substrate 1 is provided with a single-crystalsilicon MOSTFT, i.e., nMOSLDD-TFT, formed thereon by using asingle-crystal silicon layer deposited by graphoepitaxy on a stepdifference 4 serving as a seed on the substrate 1. Similar TFTs are alsoformed in a peripheral driving circuit. Since this EL device is drivenby MOSLDD-TFTs using the single-crystal silicon layer, the EL device hasa high switching rate and a reduced leakage current. The color filter 61may be omitted if the EL layer 90 emits a specified color.

Since the EL device requires a high driving voltage, the peripheraldriving circuit preferably has driver devices having high dielectricstrength, such as high-dielectric-strength cMOSTFTs and bipolar devices,in addition to the MOSTFTS.

FIG. 56B shows a passive-matrix FED in which, when a voltage is appliedbetween electrodes 92 and 93, electrons are emitted from a cold cathode94 in a vacuum section 98 between two opposing glass substrates 1 and32, and are incident on a fluorescent layer 96 under selection by a gateline 95, whereby light having a predetermined color is emitted.

The emitter line 92 is connected to a peripheral driving circuit and isdriven by a data voltage, the peripheral driving circuit includingMOSTFTs using a single-crystal silicon layer based on the presentinvention and contributing to high-speed driving of the emitter line 92.In FIG. 55B, numeral 99 represents a resistance film. In this FED, theabove-mentioned MOSTFT may be connected to each pixel electrode so thatthe FED is driven by an active-matrix matrix system.

When a conventional light-emitting polymer is used instead of the ELlayer 90 in the EL device shown in FIG. 56A, this device functions as apassive-matrix or an active-matrix light-emitting polymer device (LEPD).In the FED shown in FIG. 56B, a diamond thin-film may be used as thecathode to implement a device similar to FED. In a light emitting diode,a light emitting section composed of a gallium-based film, such asgallium-aluminum-arsenic, may be driven by MOSTFTs of single-crystalsilicon epitaxially grown in accordance with the present invention.

The above-described embodiments of the present invention may have thefollowing modifications without departing from the spirit of the presentinvention.

When the melt 6 of the low-melting-point metal is applied, thepolycrystalline silicon or amorphous silicon film 5 may be doped with aGroup III or V element having high solubility, e.g., boron, phosphorus,antimony, arsenic, aluminum, gallium, indium, or bismuth, in an adequateamount to control the channel conductive type (P or N) of and thecarrier content in the epitaxial silicon layer 7.

In order to avoid diffusion of ions from the glass substrate, a SiN filmhaving a thickness of, for example, 50 to 200 nm and a SiO₂ film havinga thickness of 100 nm, if necessary, may be formed on the substratesurface, and the above-described step differences 4 may be formed inthese films. The step differences may be formed by ion milling insteadof the above-mentioned RIE process.

A description will now be given of first to fifteenth embodiments of athird aspect of the present invention which employs a low-melting-pointmetal layer and which has the step of forming a bottom-gate firstthin-film transistor.

The first embodiment of the third aspect of the present invention willbe described with reference to FIGS. 1A to 3C, FIGS. 63A to 66C, andFIGS. 8 to 14.

The first embodiment relates to an active-matrix reflective liquidcrystal display (LCD) having a peripheral driving circuit incorporatingbottom-gate MOSTFTs formed by a single-crystal silicon layer which areformed by graphoepitaxy of indium-silicon at high temperature using as aseed an indented section defined by a step difference provided on asubstrate as a seed. FIGS. 12 to 14 show an overall layout of thereflective LCD.

The structural and operational features of this active-matrix reflectiveLCD is basically the same as those of the first embodiment of the firstaspect described before with reference to FIG. 12 and other Figures,except for the use of bottom-gate MOSTFTs in place of the dual-gateMOSTFTS used in the first aspect of the invention. The descriptiontherefore will be mainly focused on the features peculiar to thisembodiment, and the features common to the first aspect are not fullydescribed.

With reference to FIGS. 1A to 3C, FIGS. 63A to 66C, and FIG. 8 to FIG.10, the active-matrix reflective LCD in this embodiment will bedescribed in accordance with the production steps. In FIGS. 1A to 3C andFIGS. 63A to 66C, the left side of each drawing shows the productionsteps for the display section and the right side shows the productionsteps for the peripheral-driving-circuit section.

The production process begins with the step shown in FIG. 1A in which afilm 71 of about 500 to 600 nm thick is formed from amolybdenum/tantalum (Mo—Ta) alloy by sputtering on a major surface of aninsulating substrate 1 made of, for example, a quartz glass or atransparent crystalline glass. The process then proceeds to the stepshown in FIG. 3C in which an N-type well 7A is formed, via the samesteps as those described before with reference to FIGS. 1B to 3B.

With reference to FIG. 63A, a SiO₂ film having a thickness ofapproximately 200 nm and then a SiN film having a thickness ofapproximately 100 nm are continuously deposited on the entiresingle-crystal silicon layer 7 by a plasma-enhanced CVD process, ahigh-density plasma-enhanced CVD process or a catalytic CVD process toform a gate insulating film 8, followed by a sputtering to deposit amolybdenum-tantalum (Mo—Ta) alloy film 9 of 500 to 600 nm thereon.

With reference to FIG. 63B, photoresist patterns 10 are formed in thestep difference regions (indented sections) of the TFT sections in thedisplay region of the TFT sections of the peripheral driving region byany conventional photolithographic process, and a continuous etching isexecuted, whereby gate electrodes 11 of the Mo—Ta alloy film and gateinsulating films 12 of SiN—SiO₂ are formed and the single-crystalsilicon layer 7 is exposed. The Mo—Ta alloy film 9 is etched using anacidic etchant, SiN is etched by plasma etching using CF₄ gas, and SiO₂is etched using a hydrofluoric acidic etchant.

With reference to FIG. 63C, all of the nMOSTFTs and pMOSTFTs in theperipheral driving region, as well as the gate sections of the nMOSTFTsin the display region, are covered with a photoresist 13, and theexposed source and drain regions of the nMOSTFTs are doped with, forexample, phosphorus ions 14 by ion implantation at 20 kV and at a dosageof 5×10¹³ atoms/cm² to form LDD sections 15 of an N⁻-type layer byself-alignment.

With reference to FIG. 64A, all of the pMOSTFTs in the peripheraldriving region, the gate sections of the nMOSTFTs in the peripheraldriving region, and the gate sections and the LDD sections of thenMOSTFTs in the display region are covered with a photoresist 16, andthe exposed regions are doped with phosphorus or arsenic ions 17 by ionimplantation at 20 kV and at a dosage of 5×10¹⁵ atoms/cm² to form sourcesections 18, drain sections 19 and the LDD sections 15 of an N⁺-typelayer of the nMOSTFTs.

With reference to FIG. 64B, all of the nMOSTFTs in the peripheraldriving region and the display region and the gate sections of thepMOSTFTs in the peripheral driving region are covered with a photoresist20, and the exposed regions are doped with boron ions 21 by ionimplantation at 10 kV and at a dosage of 5×10¹⁵ atoms/cm² to form sourcesections 22 and drain sections 23 of an P⁺-type layer of the pMOSTFTs.In the case of an nMOS peripheral driving circuit, this step is notnecessary since the circuit does not have a pMOSTFT.

With reference to FIG. 64C, in order to island the active devicesections including TFTs and diodes and the passive device sectionsincluding resistors and inductors, photoresist layers 24 are provided onall of the active device sections and the passive device sections in theperipheral driving region and the display section, and thesingle-crystal silicon layer 7 in other sections is removed by aconventional photolithographic process or an etching process using ahydrofluoric acid solution.

With reference to FIG. 65A, a SiO₂film having a thickness ofapproximately 200 nm and then a phosphosilicate glass (PSG) film havinga thickness of approximately 300 nm are continuously deposited to form aprotective film 25 on the entire surface by a plasma-enhanced CVDprocess, a high-density plasma-enhanced CVD process or a catalytic CVDprocess.

In such a state, the single-crystal silicon layer is activated.Activation treatment is performed at approximately 1,000° C. forapproximately 10 seconds using, for example, a halogen lamp, and thegate electrode composed of the Mo—Ta alloy having a high melting pointis durable during the annealing for activation. The Mo—Ta alloy can beused not only for the gate section but also as lead lines over a widerange. In the activation, excimer laser annealing requiring high processcosts is generally not used. If excimer laser annealing is used,overlapping scanning of 90% or more is preferably performed on theentire surface or selectively the active device section and the passivedevice section using XeCl (wavelength: 308 nm).

With reference to FIG. 65B, contact holes are formed for all of thesource-drain sections of the TFTs in the peripheral driving circuit andthe source sections of the TFTs in the display region, by a conventionalphotolithographic process and an etching process.

A film having a thickness of 500 to 600 nm is formed on the entiresurface, from aluminum or an aluminum alloy, e.g., an aluminum alloycontaining 1 wt % Si or 1 to 2 wt % copper and, by a conventionalphotolithographic process and an etching process, source electrodes 26of all TFTs both in the peripheral driving circuit section and thedisplay section, as well as the drain electrodes 27 in the peripheraldriving circuit section, are formed, simultaneously with the formationof data lines and gate lines. The substrate is then subjected tosintering treatment in a forming gas (N₂+H₂) at approximately 400° C.for 1 hour.

With reference to FIG. 65C, an insulating film 36 composed of a PSG filmwith a thickness of approximately 300 nm and a SiN film with a thicknessof approximately 300 nm is formed on the entire surface by aplasma-enhanced CVD process, a high-density plasma-enhanced CVD process,or a catalytic CVD process. Next, contact holes are formed for the drainsections of TFTS in the display region. It is not necessary to removethe SiO₂, PSG and SiN films in the pixel sections.

Basic requirements of a reflective liquid crystal display are to reflectthe light incident on the display towards the interior of the liquidcrystal panel and, at the same time, to scatter the light. This isbecause the direction of the incident light is uncertain whereas theposition of the observer with respect to the display is substantiallyfixed. Thus, the reflector must be designed on an assumption that pointlight sources are present at arbitrary positions. As shown in FIG. 66A,a photosensitive resin film 28 having a thickness of 2 to 3 μm is formedon the entire surface by spin coating and, as shown in FIG. 66B, anuneven pattern is formed in at least the pixel region by a conventionalphotolithographic process and an etching process so that the pixelsection has optimized reflective characteristics and viewing-anglecharacteristics, followed by a reflow to form a lower portion of thereflective face of an uneven surface 28A. At the same time, contactholes are formed in the resin for allowing contact of the drain sectionsof the display TFTs.

With reference to 66C, a sputtering film having a thickness of 400 to500 nm is deposited from aluminum or an aluminum alloy, e.g., an alloycontaining 1 wt % Si, on the entire surface, and the sputtering film atthe region other than the pixel sections is removed by a generalphotolithographic process and an etching process, thereby to form anuneven aluminum reflective sections 29 which are connected to the drainsections 19. The reflective sections 29 are used as pixel electrodes fordisplaying. Next, these are subjected to sintering at approximately 300°C. for 1 hour in a forming gas to enhance the contact. Silver or asilver alloy may be used instead of aluminum to increase thereflectance.

As described above, a single-crystal silicon layer 7 is formed byhigh-temperature graphoepitaxy using the step differences as the seeds,and an active-matrix substrate 30 integrating a display section and aperipheral-driving-circuit section is produced by forming, both in thedisplay section and in the peripheral-driving circuit section whichemploy the single-crystal silicon layer 7, top-gate nMOSLDD-TFTs andCMOS circuits which are composed of bottom-gate pMOSTFTs and bottom-gatenMOSTFTs.

With reference to FIG. 8, a method of producing a reflective liquidcrystal display using the active-matrix substrate (driving substrate) 30will now be described. Hereinafter, the active-matrix substrate isreferred to as a TFT substrate.

When a liquid crystal cell in this LCD is produced by double-sideassembly (suitable for medium to large liquid crystal panels of 2 inchesor greater), polyimide alignment films 33 and 34 are formed one surfaceof the TFT substrate 30 and on a device-mounting surface of a counterelectrode 32 having a solid indium tin oxide (ITO) electrode,respectively. The polyimide alignment films are formed by roll coatingor spin coating so that thicknesses are in a range of 50 to 100 nm andare cured at 180° C. for 2 hours.

Subsequent steps of the process, such as alignment by, for example,rubbing, washing, spacing the substrate 1 and the counter substrate,filling the liquid crystal, and so forth are basically the same as thoseof the first embodiment of the first aspect of the present invention asdescribed before. Advantages brought about by this embodiment are thesame as those of the first embodiment of the first aspect except for theadvantages peculiar to the use of the dual-gate structure of the firstaspect, and are not described to avoid redundancy.

FIGS. 15A to 15C show a second embodiment of the third aspect of thepresent invention.

This embodiment also is an active-matrix reflective LCD as is the caseof the first embodiment, but is different from the first embodiment inthat, after the processing shown in FIG. 2A, for example, an indium film6 having a thickness of 10 to 20 μm is formed on the entire surfaceincluding the step differences 4 by a sputtering process or a vacuumevaporation process, as shown in FIG. 15A. Although an indium-galliumfilm or a gallium film can be used in place of the indium film 6, thefollowing description proceeds assuming the use of the indium film 6 byway of example.

With reference to FIG. 15B, an amorphous silicon film 5 having athickness of several μm to 0.005 μm (for example, 0.1 μm) is formed onthe indium film 6 by a known plasma-enhanced CVD process.

Since the temperature for forming the single-crystal silicon film mustnot significantly exceed the melting point of the low-melting-pointmetal 6 (156° C. for indium or 29.77° C. for gallium), it is difficultto form a polycrystalline silicon film which is optimally formed at 600°C. to 650° C. Therefore, the amorphous silicon film 5 is formed on theindium film 6 by a plasma-enhanced CVD process.

The substrate 1 is maintained in a hydrogen atmosphere at 1,000° C. orless (particularly 900 to 930° C.) for approximately 5 minutes so thatthe amorphous silicon film 5 is dissolved in the indium melt.

With reference to FIG. 15C, the substrate 1 is gradually cooled so thatthe silicon dissolved in the indium melt is deposited by graphoepitaxyon the substrate 1 using the step differences 4 as the seeds, whereby asingle-crystal silicon layer 7 having a thickness of, for example,approximately 0.1 μm is formed.

Thus, the features of the second embodiment are the same as those of thefirst embodiment, except for the process step shown in Figs. FIGS. 15Ato 15C, and advantages are also the same as those of the secondembodiment of the first aspect.

FIGS. 16A and 16B show a third embodiment of the third aspect of thepresent invention.

This embodiment also is an active-matrix reflective LCD as is the caseof the first embodiment, but is different from the first embodiment inthat, after the processing shown in FIG. 2A, an indium film 6A having athickness of 10 to 20 μm and containing a given amount (for exampleapproximately 1 percent by weight) of silicon is formed on the entiresurface including the step differences 4 by a sputtering process or avacuum evaporation process, as shown in FIG. 16A.

The substrate 1 is maintained in a hydrogen atmosphere at 1,000° C. orless (particularly 900 to 930° C.) for approximately 5 minutes, so thatthe silicon is dissolved in the indium melt.

The substrate 1 is gradually cooled so that the silicon dissolved in theindium melt is deposited by graphoepitaxy on the substrate 1 using thestep differences 4 as a seed, whereby a single-crystal silicon layer 7having a thickness of approximately 0.1 μm is formed, as shown in FIG.16B.

The (100) plane of the single-crystal silicon layer 7 is deposited onthe substrate by epitaxy as described before, and the orientation of thecrystal layer can be controlled by changing the shape of the stepdifferences as shown in FIGS. 9A to 9F.

After the deposition of the single-crystal silicon layer 7 bygraphoepitaxy, indium at the surface is removed by hydrochloric acid asin the first embodiment, and each TFT in the display section and theperipheral-driving-circuit section is produced after effecting apredetermined treatment on the single-crystal silicon layer 7.

In this embodiment, heat-melting and cooling treatments are performedafter forming the amorphous silicon layer 5 on the low-melt-point metallayer 6 which is formed to cover the step differences 4, but thegraphoepitaxial growth of the single-crystal silicon from the melt ofthe low-melt-point metal takes place as in the case of the precedingembodiment.

A fourth embodiment of the third aspect will now be described withreference to FIGS. 17A to 19D.

This embodiment has, as in the case of the first embodiment, top-gateMOSTFTs in the display section and bottom-gate MOSTFTs in the peripheraldriving circuit section, but pertains to a transmissive LCD, unlike thefirst embodiment. More specifically, in this embodiment, thetransmissive LCD is produced by following the procedure as Steps shownin FIGS. 1A to 3C and FIGS. 63A to 65C as in the first embodiment, butin the subsequent process, contact holes 19 for the drain sections ofTFTs in the display section are formed in insulating films 25 and 36, asshown in FIG. 17A, and the unnecessary SiO₂ film, PSG film and Si filmin the pixel-opening section are removed to improve the transmittance.

With reference to FIG. 17B, a planarization film 28B, which is composedof an acrylic photosensitive transparent resin and has a thickness of 2to 3 μm, is formed on the entire surface by spin coating etc., and thencontact holes for drains of TFTs in the displaying section (displayTFTs) are formed in the transparent resin 28B, followed by curing of thetransparent resin 28B executed under a given condition.

With reference to FIG. 17C, an ITO film having a thickness of 130 to 150nm is formed on the entire surface by sputtering, and then an ITOtransparent electrodes 41 in contact with the drain section 19 in thedisplay region are formed by photolithography and etching. Next, aheat-treatment in a forming gas at 200 to 250° C. for 1 hour isperformed to reduce the contact resistance between the drain of each TFTin the display section and the ITO and to improve the transparency ofthe ITO.

Then, a transmissive LCD is assembled combining this TFT substrate 1with a counter substrate 32 as in the first embodiment, as shown in FIG.18. In this embodiment, however, a polarizer is provided also on the TFTsubstrate. Although transmission light runs in this transmissive LCD asshown by a solid line in the drawing, the arrangement may be such thattransmission light is available from the counter substrate 32.

An on-chip color-filter (OCCF) structure and an on-chip black (OCB)structure can be made from this transmissive LCD, as follows.

Thus, after performing Steps shown in FIGS. 1A to 3C and FIGS. 63A to65B which are executed as described before, contact holes are alsoformed at the drain sections of the PSG-SiO₂ insulating film 25 as shownin FIG. 19A, and an aluminum embedded layer 41A for a drain electrode isformed, followed by deposition of the SiN-PSG insulating film 36.

With reference to FIG. 19B, a photoresist 61 containing a red, green orblue pigment having a thickness of 1 to 1.5 μm is formed on thecorresponding color segments and, as shown in FIG. 19C, color filterlayers 61(R), 61(G) and 61(B) are formed by a general photolithographicprocess in such a pattern as to leave the colors only at predeterminedlocations corresponding to the pixels. (OCCF structure). Contact holesare also formed at the drain sections. This embodiment excludes the useof opaque ceramics substrates and substrates made of low-transmissivityglass or heat-resistant resin.

With reference to FIG. 19C, a metal shading layer 43 servable as a blackmask layer is formed over the contact holes communicating with thedrains of the display TFTs and over the color filter layer, by apatterning process using a metal. For example, a molybdenum film havinga thickness of 200 to 250 nm is formed by a sputtering process and isthen patterned to form a given shape for shading the display TFTs (OCBstructure).

With reference to FIG. 19D, a planarization film 28B composed of atransparent resin is formed, and then ITO transparent electrodes 41 areformed so as to connect to the shading layer 43 through the contactholes provided in the planarization film.

The color filter 61 and the shading layer (black mask) 43 formed on thedisplay array section improves the aperture ratio of the liquid crystaldisplay panel and decreases electrical power consumption of the displaymodule including a back light.

A fifth embodiment of the third aspect of the present invention will nowbe described.

This embodiment relates to an active-matrix reflective liquid crystaldisplay (LCD) including top-gate MOSTFTs formed of a single-crystalsilicon layer which is deposited by low-temperature graphoepitaxy froman indium-gallium-silicon or gallium-silicon melt, using as seeds stepdifferences (indents) on a glass substrate having a low distortionpoint.

In contrast to the first embodiment, the substrate 1 used in thisembodiment is a glass substrate having a low distortion point or maximumusable temperature as low as 600° C. or so, such as borosilicate glassor aluminosilicate glass, as the substrate employed in Step shown inFIG. 1A. Such a glass is inexpensive and can easily be produced in largesizes, e.g., 500 mm×600 mm×0.1 to 1.1 mm can be formed using long rolledglass. Obviously, quartz and crystallized glass may be used as well.

After forming the step differences 4 as in the preceding embodiments andsubsequent deposition of the polycrystalline silicon layer 5, anindium-gallium (or gallium) film is formed in Step shown in FIG. 2C onthe polycrystalline silicon film 5 by a MOCVD, sputtering or vacuumevaporation process using trimethyl indium gallium or trimethyl galliumso that the thickness thereof becomes several ten to several hundredtimes the thickness of the polycrystalline silicon film 5, for example,the thickness becomes 10 to 20 μm.

The substrate 1 is maintained in a hydrogen atmosphere at 300 to 600° C.(or 420 to 600° C.) for 5 minutes. As a result, the polycrystallinesilicon 6 (or amorphous silicon) is dissolved into the indium-gallium orgallium melt. Silicon in this melt can be precipitated at a temperaturewhich is significantly lower than the original precipitationtemperature.

When the substrate 1 is gradually cooled, as shown in FIG. 3A, silicondissolved in indium-gallium (or indium) is deposited by graphoepitaxy onthe bottom corners of the step differences 4 serving as seeds to form asingle-crystal silicon layer 7 having a thickness of, for example, 0.1μm.

In this case also, the (100) plane of the single-crystal silicon layer 7is deposited on the substrate by epitaxy and the orientation of thecrystal layer can be controlled by changing the shape of the stepdifferences 4, as shown in FIGS. 9A to 9F.

After the deposition of the single-crystal silicon layer 7 bygraphoepitaxy on the substrate 1, indium and gallium at the surface areremoved by hydrochloric acid or sulfuric acid, as shown in FIG. 2C.

Using the single-crystal silicon layer 7, top-gate MOSTFTs are formed inthe display section and bottom-gate MOSTFTs are formed in theperipheral-driving-circuit section, as in the first embodiment. Thestructure shown in FIG. 8 may also be employed in this embodiment.

This embodiment offers advantages which are the same as those of thefifth embodiment of the first aspect of the present invention.

A sixth embodiment of the third aspect of the present invention will nowbe described.

In contrast to the preceding fifth embodiment, this embodiment relatesto a transmissive LCD in which a single-crystal silicon layer is formedby low-temperature graphoepitaxy using an indium-gallium film, as in thefourth embodiment.

Using the single-crystal silicon layer, the transmissive LCD is producedby the process shown in FIGS. 17A to FIG. 19D, as in the fourthembodiment. Opaque ceramic substrates and opaque or translucent organicsubstrates are not suitable for the transmissive LCD. Opaque ceramicsubstrates and opaque or translucent organic substrates are not suitablefor the transmissive LCD.

Accordingly, this embodiment has the advantages of both the fourth andfifth embodiments. Thus, this embodiment offers the following advantagesin addition to those produced by the first embodiment: borosilicateglass and heat-resistant organic materials which are inexpensive andfacilitate the formation of long thin rolled substrates can be used asthe substrate 1; the conductive type and Vth of the single-crystalsilicon layer can be readily adjusted by the ratio of indium to gallium;and the color filter 42 and the black mask 43 provided on the displayarray section improve the aperture ratio of the liquid crystal displaypanel and decreases electrical power consumption of the display moduleincluding a back light.

FIGS. 67A to 67C and FIGS. 21A to 28C show a seventh embodiment of thethird aspect of the present invention.

In this embodiment, the peripheral-driving-circuit section includes aCMOS driving circuit including bottom-gate-type pMOSTFTs and nMOSTFTs asin the first embodiment. The display section is of a reflective type andincludes TFTs having various gate configurations arranged in a variety ocombinations.

The display section shown in FIG. 67A includes top-gate nMOSLDD-TFTs asin the first embodiment, while the display section shown in FIG. 67Bincludes bottom-gate nMOSLDD-TFTs, whereas the display section shown inFIG. 67C includes dual-gate nMOSLDD-TFTs. These bottom-gate anddual-gate MOSTFTs can be produced by the same process for thebottom-gate MOSTFTs of the peripheral-driving-circuit section, as willbe described later, the dual-gate MOSTFT having higher driving abilityand being suitable for high-speed switching by virtue of the presence ofupper and lower gates and, furthermore, the upper or lower gate may beselectively used to implement a top- or bottom-gate type duringoperation.

In the bottom-gate MOSTFT shown in FIG. 67B, a gate electrode 71 iscomposed of, for example, molybdenum-tantalum, and a gate insulting filmis composed of a SiN film 72 and a SiO₂ film 73. A channel region and soforth using the single-crystal silicon layer are formed on the gateinsulating film as in the case of the bottom-gate MOSTFT of theperipheral-driving-circuit section. The dual-gate MOSTFT shown in FIG.67C has the lower-gate section substantially the same as that in thebottom-gate MOSTFT, whereas the upper-gate section includes anupper-gate electrode 83 formed on a gate insulating film 82 composed ofa SiO₂film and a SiN film. In all the cases, each gate section is formedin the exterior of the step difference 4 which serves as a seed forgraphoepitaxy.

A method of producing the above-mentioned bottom-gate MOSTFT will bedescribed with reference to FIGS. 21A to 25C, and a method of producingthe dual-gate MOSTFT will be described with reference to FIGS. 26A to28C. The method of producing the dual-gate MOSTFT in theperipheral-driving-circuit section is the same as that described beforewith reference to FIGS. 1A to 3C and FIGS. 63A to 65C and is thereforenot illustrated.

With reference to FIG. 21A, in the production of the bottom-gate MOSTFTin the display section, a molybdenum-tantalum alloy film 71 having athickness of 500 to 600 nm is formed on a substrate 1 by sputtering.

With reference to FIG. 21B, a photoresist 70 having a given pattern isformed by a processing which is the same as that described withreference to FIG. 1B, and the molybdenum-tantalum alloy film 71 issubjected to taper etching using the photoresist 70 as a mask to form agate electrode 71 having a trapezoidal side base 71 a with an angle of20 to 45 degrees.

With reference to FIG. 21C, the processing which is the same as thatshown in FIG. 1C is conducted in which, after the photoresist 70 isremoved, a SiN film 72 having a thickness of approximately 100 nm andthen a SiO₂film 73 having a thickness of approximately 200 nm aredeposited on the substrate 1 including the molybdenum-tantalum alloyfilm 71, by a plasma-enhanced CVD process, thereby to form a gateinsulating film.

With reference to FIG. 21D, the same process as that described before inconnection with FIG. 2A is executed in which a photoresist 2 having agiven pattern is formed in at least the TFT-forming region, and aplurality of step differences 4 having a proper shape and size areformed in the gate insulating film and further in the substrate 1through a mask constituted by the photoresist 2, as described above. Thestep differences 4 function as seeds during graphoepitaxy of thesingle-crystal silicon layer as will be described later, and have adepth d of 0.3 to 0.4 μm, a width of 2 to 3 μm, a length of 10 to 20 μmperpendicular to the drawing sheet, and an basilar angle (between thebottom and the side wall) which is a right angle.

Then, after removal of the photoresist 2, the same processing as FIG. 2Bis conducted to form a polysilicon film 5, as in FIG. 22A.

The same processing as that shown in FIG. 2C is conducted so as todeposit a film 6 of indium, or of indium-gallium, as shown in FIG. 22B.

Then, the same process as FIG. 3A is executed to cause graphoepitaxialgrowth of a single-crystal silicon, whereby a single-crystal siliconlayer of a thickness of, for example, 0.1 μm or so is deposited. In thisprocess, the side faces 71 a of the underlying gate electrode 71 aregently tapered, so that these side faces do not cause impediment to theepitaxial growth on the seeds constituted by the step differences,whereby the single-crystal silicon layer 7 can grow on these side faceswithout discontinuity.

Then, the film 6A of indium is removed as shown in FIG. 22D and, afterexecution of Steps shown in FIGS. 3C, 63A and 63B, the processing whichis the same as that of FIG. 63C is executed in which the gate section ofthe nMOSTFTs in the display section are covered by the photoresist 13,and source and drain regions of the nMOSTFTs left exposed are doped byion implantation with phosphor ions 14, whereby an LDD section 15composed of an N-type layer is formed by self-alignment. In thisprocess, the bottom-gate electrode 71 permits easy recognition of theheight differences or pattern, thus facilitating positioning of thephotoresist 13, i.e., mask alignment, thereby suppressing misalignment.

With reference to FIG. 23A, the gate section and the LDD section of thenMOSTFT are covered with a photoresist 16 and the exposed region isdoped with phosphorus or arsenic ions 17 by ion implantation to form asource section 18 and a drain section 19 composed of an N⁺-type layer ofthe nMOSTFT, as in Step shown in FIG. 64A.

With reference to FIG. 23B, the entire nMOSTFT is covered with aphotoresist 20 and then doped with boron ions 21 by ion implantation toform a source section and a drain section of the p+ layer of thepMOSTFTs in the peripheral-driving-circuit section, as in Step shown inFIG. 64B.

With reference to FIG. 23C, a photoresist 24 is provided and then thesingle-crystal silicon layer is selectively removed by conventionalphotolithography and etching to island the active device section and thepassive device section, as in Step shown in FIG. 64C.

With reference to FIG. 23D, a SiO₂film 53 having a thickness ofapproximately 300 nm and then a phosphosilicate glass (PSG) film 54having a thickness of approximately 300 nm are formed on the entiresurface by a plasma-enhanced CVD process, a high-density plasma-enhancedCVD process, or a catalytic CVD process, as in Step shown in FIG. 65A.The SiO₂ film 53 and the PSG film 54 correspond to the aforementionedprotective film 25. The single-crystal silicon layer is then subjectedto an activation treatment as described before.

With reference to FIG. 24A, contact holes are formed for the sourcesections by conventional photolithography and etching, as in Steps shownin FIG. 65B. An aluminum sputtering film having a thickness of 400 to500 nm is formed on the entire surface, and source electrodes 26 of theTFTS, data lines and gate lines are simultaneously formed byconventional photolithography and etching. The substrate is thensintered in a forming gas at approximately 400° C. for 1 hour.

With reference to FIG. 24B, an insulating film 36 composed of a PSG filmhaving a thickness of approximately 300 nm and a SiN film having athickness of approximately 300 nm is formed on the entire surface by ahigh-density plasma-enhanced CVD process or a catalytic CVD process, andcontact holes are formed at the drain sections of display TFTs, as inFIG. 65C.

With reference to FIG. 24C, a photosensitive resin film 28 having athickness of 2 to 3 μm is formed by spin coating, as in the step shownin FIG. 66A, followed by a Step shown in FIG. 24D in which an unevenpattern is formed and then subjected to reflow to form a lower portionof a reflective layer having an uneven surface 28A so that the pixelsection has optimized reflective and viewing-angle characteristics. Atthe same time, contact holes are formed in the resin for allowingcontact of the drain sections of the display TFTS. At the same time,contact holes are formed in the resin for allowing contact of the drainsections of the display TFTS.

With reference to FIG. 24D, an aluminum sputtering film having athickness of 400 to 500 nm is formed on the entire surface, as in thestep shown in FIG. 66C, and then an uneven aluminum reflective section29 connecting to the drain sections 19 of the display TFTs is formed byconventional photolithography and etching.

As described above, the resulting active-matrix substrate 30 integratesa display section and a peripheral-driving-circuit section, in which thedisplay section includes bottom-gate nMOSLDD-TFTs using thesingle-crystal silicon layer 7 formed by high-temperature graphoepitaxyon the step differences 4 as a seed, while theperipheral-driving-circuit section includes a CMOS driving circuithaving bottom-gate pMOSTFTs and bottom-gate nMOSTFTs.

FIGS. 24A to 24D show the formation of the gate insulating film of theabove-mentioned bottom-gate MOSTFT in the display section by anodicoxidation of molybdenum-tantalum.

After the step of FIG. 21B, the molybdenum-tantalum alloy film 71 issubjected to conventional anodic oxidation treatment, as shown in FIG.25A, to form on the surface a gate insulating film 74 composed of Ta₂O₅and having a thickness of 100 to 200 nm.

Next, with reference to FIG. 25B, the step differences 4 are formed anda single-crystal layer 7 is deposited thereon graphoepitaxy, as in thesteps shown in FIGS. 21D to 22D, followed by execution of processingsimilar to those of FIGS. 22E to 24D to form an active matrix substrate30 as shown in FIG. 25C.

When the dual-gate MOSTFTs are produced in the display section, theprocesses are executed in the same way as those shown in FIGS. 21A to22D.

More specifically, with reference to FIG. 26A, step differences 4 areformed in the substrate 1 through the insulating films 72 and 73, andthen a single-crystal silicon layer 7 is deposited by graphoepitaxy onthe step differences 4 as a seed. Next, a step which is the same as thatshown in FIG. 63A is executed so that a SiO₂ film having a thickness ofapproximately 200 nm and then a SiN film having a thickness ofapproximately 100 nm are successively formed on the entire surface ofthe single-crystal silicon layer 7 by a plasma-enhanced CVD process or acatalytic CVD process, thereby to form an insulating film 80corresponding to the insulating film 8. Then, a molybdenum-tantalumalloy film 81 having a thickness of 500 to 600 nm, corresponding to thesputtering film 9, is formed by sputtering.

With reference to FIG. 26B, processing which is the same as that shownin FIG. 63B is executed: namely, a photoresist pattern 10 is formed andis subjected to continuous etching to form a top-gate electrode 82(corresponding to the gate electrode 12) composed of themolybdenum-tantalum alloy and a gate insulating film (corresponding tothe gate insulating film 11), thereby exposing the single-crystalsilicon layer 7.

With reference to FIG. 26C, the same processing as that shown in FIG.63C is executed: namely, the top-gate section of the nMOSTFT is coveredwith a photoresist 13, and the exposed source and drain regions of thenMOSTFT for display are doped with phosphorus ions 14 by ionimplantation to form an N⁻-type LDD section 15.

With reference to FIG. 26D, the same processing as that shown in FIG.64A is executed: namely, the gate section and the LDD section of thenMOSTFT are covered with a photoresist 16, and the exposed region isdoped with phosphorus or arsenic ions 17 by ion implantation, thereby toform a source section 18 and a drain section 19 of nMOSTFT composed ofan N⁺-type layer.

With reference to FIG. 27A, the same processing as that shown in FIG.64B is performed: namely, the gate section of the pMOSTFT is coveredwith a photoresist 20 and the exposed region is doped with boron ions 21by ion implantation to form a source section and a drain section of thepMOSTFT composed of a P⁺-layer in the peripheral-driving-circuitsection.

With reference to FIG. 27B, the same processing as that shown in FIG.64C is executed: namely, a photoresist layer 24 is provided and thesingle-crystal silicon layer is selectively removed at portions otherthan the active and passive device sections by conventionalphotolithography and etching, thereby to island the active devicesection and the passive device section.

With reference to FIG. 27C, the same process as that shown in FIG. 65Ais performed: namely, a SiO₂ film 53 having a thickness of approximately200 nm and a phosphosilicate glass (PSG) glass 54 having a thickness ofapproximately 300 nm are formed on the entire surface by aplasma-enhanced CVD process, a high-density plasma-enhanced CVD process,or a catalytic CVD process. These films 53 and 54 correspond to theaforesaid protective film 25. Then, an activation treatment is effectedon the single-crystal silicon layer 7.

With reference to FIG. 27D, the same processing as that shown in FIG.65B is executed: namely, contact holes are formed for the sourcesections. An aluminum sputtering film having a thickness of 400 to 500nm is formed on the entire surface, and then source electrodes 26, datalines and gate lines are simultaneously formed by conventionalphotolithography and etching.

With reference to FIG. 28A, the same processing as that shown in FIG.65C is executed: namely, an insulating film 36 including a PSG filmhaving a thickness of approximately 300 nm and a SiN film having athickness of approximately 300 nm is formed on the entire surface, andcontact holes are formed for the drain sections of the display TFTS.

With reference to FIG. 28B, a photosensitive resin film 28 having athickness of 2 to 3 μm is formed on the entire surface by, for example,spin coating. With reference to FIG. 28C, Steps which are the same asthose of FIGS. 66B and 66C are performed: namely, a lower portion of areflective face comprising an uneven surface 28A is formed in at leastthe pixel section, contact holes are formed for the drain sections ofthe display TFTs, and an uneven aluminum reflective section 29connecting to the drain sections 19 of the display TFTs are formed sothat optimum reflective and viewing-angle characteristics are achieved.

The resulting active-matrix substrate 30 integrates a display sectionand a peripheral-driving-circuit section, in which the display sectionincludes dual-gate nMOSLDD-TFTs and the peripheral-driving-circuitsection includes a CMOS driving circuit having bottom-gate nMOSTFTs andbottom-gate pMOSTFTs, wherein these TFTs are formed by using thesingle-crystal silicon layer 7 deposited by high-temperaturegraphoepitaxy on the step differences 4 as seeds.

An eighth embodiment of the third aspect of the present invention willbe described with specific reference to FIGS. 29A to 30C, FIGS. 32A to33C and FIGS. 35A to 36B, as well as to FIGS. 68A and 68B and FIGS. 69Ato 69C.

In this embodiment, the gate electrode at the top gate section iscomposed of a material having relatively low thermal resistance, such asaluminum, an aluminum alloy, e.g., aluminum alloy containing 1 wt % ofsilicon or 1 to 2 wt % of copper, or copper, unlike the precedingembodiments.

The process of this embodiment is similar to the eighth embodiment ofthe first aspect, except that bottom-gate MOSTFTs are formed in theperipheral-driving circuit section, in contrast to the first aspect inwhich dual-gate MOSTFTs are used in the peripheral-driving circuitsection. Thus, steps are followed from that of FIG. 1A down to thatshown in FIG. 3C, whereby an N-type well 7A is formed in the pMOSTFTregion of the peripheral-driving circuit section, as shown in FIG. 29A.The process then proceeds from the step shown in FIG. 29B down to thestep shown in FIG. 30C, in the same way as that described before inconjunction with the eighth embodiment of the first aspect withreference to these Figures.

After a patterning of the respective gate sections, the active devicesection and the passive device section are isolated, in the same way asthat described before and, as shown in FIG. 68A, a SiO₂ film having athickness of approximately 200 nm and then a phosphosilicate glass (PSG)film having a thickness of approximately 300 nm are deposited on theentire surface, thereby to form a protective film 25.

With reference to FIG. 68B, contact holes are formed for the source anddrain sections of all TFTs in the peripheral-driving-circuit section andthe source sections of the display TFTs, by conventionalphotolithography and etching.

A film having a thickness of 500 to 600 nm is formed on the entiresurface by sputtering, with aluminum or an aluminum alloy containing 1weight percent of Si and, thereafter, the source electrodes 26 of allTFTs in the peripheral-driving-circuit section and the display section,drain electrodes 27 in the peripheral-driving-circuit section, datalines and gate lines are simultaneously formed by conventionalphotolithography and etching. The substrate is then subjected tosintering treatment in a forming gas (N₂+H₂) at approximately 400° C.for 1 hour.

Then, Steps which are the same as those shown in FIG. 65C to FIG. 66Care executed, whereby an active-matrix substrate 30 is obtainedintegrating a display section and a peripheral-driving-circuit sectionby using the single-crystal silicon layer 7, in which the displaysection includes top-gate nMOSLDD-TFTs having gate electrodes ofaluminum or aluminum alloy containing 1 weight percent of Si, while theperipheral-driving-circuit section has a CMOS driving circuit havingbottom-gate pMOSTFTs and bottom-gate nMOSTFTs.

Since the aluminum or aluminum-alloy gate electrodes 11 are formed afterthe activation treatment of the single-crystal silicon layer 7, the gateelectrode material is not subject to the heat during the activationtreatment, so that inexpensive material having relatively low heatresistance, such as aluminum or 1 wt % Si aluminum alloy, can be used asthe gate electrode, offering a wider selection of the electrodematerials. This applies also to the case where the display sectionincludes bottom-gate MOSTFTs.

For implementing a configuration in which dual-gate MOSTFTs are formedin the display section while bottom-gate MOSTFTs are used in theperipheral-driving-circuit section, respectively, the processes shown inFIG. 21A to 22D are performed, and then an N-type well 7A is formed atthe PMOSTFT section in the peripheral-driving-circuit section, as shownin FIG. 32A.

With reference to FIG. 32B, the TFT s in the display section are dopedwith phosphorus ions 14 to form LDD sections 15, as in the step shown inFIG. 29B.

With reference to FIG. 33A, the same processing as that shown in FIG.30A is executed: namely, the nMOSTFT sections in the display section andthe peripheral-driving-circuit section are doped with phosphorus ions 17to form N⁺-type source regions 18 and drain regions 19.

With reference to FIG. 33B, the same process as that shown in FIG. 30Bis executed: namely, the pMOSTFT section in theperipheral-driving-circuit section is doped with boron ions 21 to form aP⁺-type source region 22 and a drain region 23.

With reference to FIG. 33C, after the removal of the resist 20, thesingle-crystal silicon layer 7 is patterned to island the active devicesection and the passive device section and, thereafter, as shown in FIG.69A, the single-crystal silicon layers 7 and 7A are activated in thesame way as that described before, followed by formation of a gateinsulating film 80 in the display section.

With reference to FIG. 69B, an aluminum film sputtered on the entiresurface is patterned to form upper-gate electrodes 83 in the displaysection.

With reference to FIG. 69C, a SiO₂ film having a thickness ofapproximately 200 nm and then a PSG film having a thickness ofapproximately 300 nm are deposited to form a protective film 25.

Source electrodes 26 of all TFTs in the peripheral-driving-circuitsection and the display section and drain electrodes 27 in theperipheral-driving-circuit section are formed by the same process asthat described before, whereby an active-matrix substrate 30 is obtainedintegrating the display section and the peripheral-driving-circuitsection using the single-crystal silicon layer 7, wherein the displaysection includes dual-gate nMOSLDD-TFTs having aluminum top gateelectrodes, while the peripheral-driving-circuit section includes a CMOSdriving circuit having bottom-gate pMOSLDD-TFTs and bottom-gatenMOSTFTs.

Since the gate electrodes 83 are formed after the activation treatmentof the single-crystal silicon layer 7 in this embodiment, the gateelectrode material does not undergo the heat applied during theactivation treatment, so that any inexpensive material having relativelylow heat resistance, such as aluminum, aluminum alloy or copper may beused for the gate electrode, thus widening the selection of theelectrode materials. The source electrodes 26 (and the drain electrodesalso) may be simultaneously formed in Step shown in FIG. 69B, thusoffering advantages in the production process.

When the bottom-gate or top-gate or dual-gate MOSTFTs are formed in anyof above-described embodiments, the single-crystal silicon layer 7deposited on the step difference 4 may have discontinuity or thinnedportions, as schematically shown in FIG. 35A, leading to connectionfailure or increase in the resistance and, therefore, the sourceelectrode 26 (or the drain electrode 27) is preferably provided in aregion including the step difference 4 in order to ensure the connectionto the single-crystal silicon layer 7, as shown in FIGS. 35B and 35C.

As an alternative to Step shown in FIG. 2B or Step shown in FIG. 32B,after the formation of the top-gate insulating film on thesingle-crystal silicon layer 7, ion implantation and activationtreatment may be performed and then the top-gate electrodes and sourceand drain electrodes may be simultaneously formed.

The step differences 4 are formed in the substrate 1 (and in theoverlying SiN film) in the described embodiment as shown in FIG. 36A,this is only illustrative and the step differences 4 may be formed on-aSiN film 51 on the substrate 1 so that the SiN film 51 inhibitsdiffusion of ions from the glass substrate 1.

FIGS. 37A to FIGS. 39 show a ninth embodiment of the third aspect of thepresent invention.

In this embodiment, TFTs are formed at the exterior of the stepdifferences 4, that is, in regions other than the step differences 4. Inthese drawings, the single-crystal silicon layer 7 and the gateelectrodes 11, source electrodes 26 and drain electrodes 27 are shownonly schematically.

Referring first to FIG. 37A, the indented section formed by the stepdifference 4 is located along and on one side of the source region, andthe gate insulating film 12 and the gate electrodes 11 are formed on theareas of the single-crystal silicon layer 7 where there is no indentedsection. FIG. 37B shows an arrangement in which the indented section hasan L-like shape, with one leg extending along the side of the sourceregion and the other leg extending in the direction of length of thechannel down to the end of the drain region. FIG. 37C shows anarrangement in which the indented section has a rectangular form withfour sides surrounding the TFT active region. FIG. 37D shows anarrangement in which the indented section has three sides. In FIG. 37E,an indented section has an L-shape with two sides. In all these cases,adjacent indented sections 4 are discrete and isolated from each other.

Thus, the indented sections or step differences 4 may have any suitableshape, and the TFTs are formed on the areas other than these stepdifferences 4, so that the TFTS can be fabricated without difficulty.

FIGS. 38A to 38C show bottom-gate MOSTFTs. Any type of step difference 4shown in FIGS. 36A to 36E may be employed also in this type of MOSTFTS.In FIG. 38A corresponding to FIG. 37A, the bottom-gate MOSTFT is formedon the flat portion other than the step difference 4. Likewise, FIGS.38B corresponds to FIG. 37B, and FIG. 38C corresponds to FIG. 37C or37D.

FIG. 39 shows a dual-gate MOSTFT. Any type of step difference 4 shown inFIGS. 37A to 37E may also be employed in this type. For example, thedual-gate MOSTFT may be formed on the flat portion in the interior ofthe step difference 4 shown in FIG. 37C or 37D.

FIGS. 40A to 42 show a tenth embodiment of the third aspect of thepresent invention. The tenth embodiment is basically the same as thetenth embodiment of the first aspect, except for the use of bottom-gateMOSTFTs graphoepitaxially grown from the single-crystal silicon layer inplace of the dual-gate MOSTFTs used in the first embodiment, and offersthe same advantages as those obtained with the tenth embodiment of thefirst aspect. Further description of the tenth embodiment, therefore, isomitted to avoid redundancy.

FIGS. 43A and 43B show an eleventh embodiment of the third aspect of thepresent invention, wherein one of the upper and lower-gate sections of adual-gate type nMOSTFT is used in a transistor operation, whereas theother operates as follows.

In an nMOSTFT shown in FIG. 43A, an appropriate negative voltage isconstantly applied to the gate electrode at the top gate side to reducethe leakage current in the back channel. When the top gate electrode isopened, this is used as a bottom-gate type. In FIG. 43B, an appropriatenegative voltage is constantly applied to the gate electrode at thebottom gate side to reduce the leakage current in the back channel. Whenthe bottom gate electrode is opened, this is used as a top-gate type. Incase of a PMOSTFT, leakage current in the back channel can be reduced byconstantly applying an appropriate positive voltage to the gateelectrode.

The interface between the single-crystal silicon layer 7 and theinsulating film has low crystallinity and readily causes a leakagecurrent, but the above-mentioned negative voltage applied to the gateelectrode can effectively reduce the leakage current. This advantage isadded to that offered by the LDD structure. Furthermore, the bottom gateelectrode shades the light incident on the substrate 1, so that theleakage current caused by the incident light can be reduced.

A twelfth embodiment of the third aspect of the present invention willnow be described with reference to FIGS. 51 and 52 and also to FIGS. 70to 76.

As described above, the top-gate, bottom-gate and dual gate TFTs havedifferent structures, functions and characteristics. A variety ofcombinations of these TFTs may be employed in the display section andthe peripheral-driving-circuit section to obtain various advantageouseffects.

For example, as shown in FIG. 70, when any one of the top-gate MOSTFT,the bottom-gate MOSTFT and the dual-gate MOSTFT is used in the displaysection, at least the bottom-gate type is used alone or in a combinationwith at least one of the other types, in the peripheral-driving-circuitsection. In this case, there are 12 types of combination identified byNos. 1 to 12. When a dual-gate structure is employed in the MOSTFT inthe peripheral-driving-circuit section, this dual-gate structurefunctions as a top-gate type or a bottom-gate type by selecting theupper or lower gate, and the dual-gate type structure also is preferredwhen a local portion of the peripheral driving circuit requires TFTshaving large driving power. For example, electrooptical devices usingorganic EL or FED will require such TFTs having large driving power.

A variety of combinations (Nos. 1 to 216) of channel conduction typesare available for the MOSTFTs to be used in theperipheral-driving-circuit section and the display section,specifically: FIGS. 71 and 72 show combinations possible when theMOSTFTs in the display section do not have a LDD structure; FIGS. 73 and74 show combinations possible when the MOSTFTs in the display sectionhave a LDD structure; FIGS. 75 and 76 show combinations possible whenthe peripheral-driving-circuit section includes TFTs having a LDDstructure; and FIGS. 77 and 78 show combinations possible when both theperipheral-driving-circuit section and the display section include TFTshaving a LDD structure.

Thus, the details of the combinations shown in FIG. 70 are shown inFIGS. 71 to 78. These combinations are also available when theperipheral-driving-circuit section includes the top-gate MOSTFT and theother-type MOSTFT(s). These combinations are applicable not only whenthe channel regions of the TFTs are formed of a single-crystal siliconbut also when the channel region of the TFT is formed of polycrystallinesilicon or amorphous silicon (only in the display section).

FIGS. 53A to FIG. 54 show a thirteenth embodiment of the presentinvention.

This embodiment is an active-matrix LCD which includes TFTs having highdriving power and using the above-mentioned single-crystal silicon layerin the peripheral-driving-circuit section, in order to attain a greaterdriving power. This, however, is not exclusive and the TFTs may employnot only bottom-gate MOSTFTs but also other gate types together with thedual-gate type, as well as a variety of channel conduction types, andmay further include MOSTFTs using polycrystalline silicon layer. Incontrast, the MOSTFTs of the display section preferably use asingle-crystal silicon layer, although they may use a polycrystalline oramorphous silicon layer or at least two out of the three types ofsilicon layers in combination. It is to be noted, however, when thedisplay section is constituted by nMOSTFTs, a single-crystal orpolycrystalline silicon layer is preferably used because such types ofsilicon layer enables a reduction in the areas of TFTs and is preferredto amorphous silicon also from the viewpoint of reduction in pixeldefects, although a practically acceptable switching speed is stillattainable also with the amorphous silicon layer. Polysilicon, inaddition to single-crystal silicon, may be formed during graphoepitaxy,thereby forming a continuous grain silicon (CGS) structure which can beadvantageously used for the formation of the active device and thepassive device in some cases. Other features are the same as those ofthe thirteenth embodiment of the first aspect described before, and arenot described any more to avoid redundancy.

FIG. 55 shows a fourteenth embodiment of the present invention.

This embodiment implements a passive-matrix drive, in contrast to thepreceding embodiments that are focused on active-matrix driveconfigurations. This embodiment is basically the same as the fourteenthembodiment of the first aspect of the present invention, except that theMOSTFTs formed from the graphoepitaxially-grown single-crystal siliconlayer are of bottom-gate type unlike the first aspect in which dual-gateMOSTFTs are used. This embodiment therefore produces the same advantagesas those offered by the fourteenth embodiment of the first aspect of thepresent invention.

FIGS. 56A and 56B show a fifteenth embodiment of the present invention.

This embodiment is directed to an electrooptical device other than anLCD, such as an organic or inorganic EL device (electroluminescentdevice), FED (field emission display device), LEPD (light-emittingpolymer display device), and LED (light-emitting diode). This embodimentis basically the same as the fifteenth embodiment of the first aspect ofthe present invention, except that the MOSTFTs formed from thegraphoepitaxially-grown single-crystal silicon layer are of bottom-gatetype unlike the first aspect in which dual-gate MOSTFTs are used. Thisembodiment therefore produces the same advantages as those offered bythe fifteenth embodiment of the first aspect of the present invention.

A description will now be given of first to thirteenth embodiments of afourth aspect of the present invention which employs a melt layer of alow-melting-point metal and which has the step of forming a bottom-gatefirst thin-film transistor.

The first embodiment of the fourth aspect of the present invention willbe described with reference to FIGS. 1A to 3C, FIGS. 63A to 66C, andFIGS. 8 to 14.

The present invention will now be described in more detail withreference to the following preferred embodiments.

The first embodiment of the fourth aspect of the present invention willbe described with reference to FIGS. 1A to 3C, FIGS. 63A to 66C, andFIGS. 8 to 14.

The first embodiment relates to an active-matrix reflective liquidcrystal display (LCD) having a peripheral driving circuit incorporatingbottom-gate MOSTFTs formed by a single-crystal silicon layer which areformed by graphoepitaxy from a melt of indium-silicon at hightemperature using as a seed an indented section defined by a stepdifference provided on a substrate as a seed. FIGS. 12 to 14 show anoverall layout of the reflective LCD.

FIGS. 12 to 14 show an overall layout of the reflective LCD.

The basic structure of the LCD is substantially the same as those of thefirst aspect described before, so that description is omitted with suchbasic structure for the purpose of simplification of the specification.

With reference to FIGS. 1A to 3C, FIGS. 66A to 66C and FIGS. 8 to FIG.10F, the active-matrix reflective LCD in this embodiment will bedescribed in accordance with the production steps. In FIGS. 1A to 6C,the left side of each drawing shows the production steps for the displaysection and the right side shows the production steps for theperipheral-driving-circuit section.

Referring first to FIG. 1A, a film 71 of about 500 to 600 nm thick isformed from a molybdenum/tantalum (Mo—Ta) alloy by sputtering on a majorsurface of an insulating substrate 1 made of, for example, a quartzglass or a transparent crystalline glass.

Then, as shown in FIG. 1B, a photoresist 70 is formed in a given patternand the Mo—Ta film 71 is taper-etched through a mask constituted by thephotoresist 70, whereby a gate electrode 71 is formed to have side facesthat are gently slanted at an angle of 20 to 45 degrees to provide asubstantially trapezoidal cross-section.

Then, as shown in FIG. 1C, a gate insulating film composed of an SiNfilm 72 (about 100 nm thick) and an SiO₂ film 73 (about 200 nm thick)laminated in this order is deposited by, for example, a plasma CVDprocess on the substrate 1 having the molybdenum-tantalum alloy film 71,after removal of the photoresist 70.

Subsequently, as shown in FIG. 57A, a photoresist 2 having a givenpattern is formed in at least a TFT-forming region, and the surface isirradiated with, for example, F⁺ ions 3 of CF₄ plasma through the maskconstituted by the photoresist 2, and a plurality of step differences 4having a given shape and a given size are formed in the gate insulatingfilm (and further in the substrate 1) by typical photolithography, suchas reactive ion etching (RIE), and then by etching (photoetching).

The insulating substrate 1 may be composed of a highly-heat-resistantsubstrate having a diameter of 8 to 12 inches and a thickness of 700 to800 am, such as quartz glass, crystallized glass, or ceramic, althoughin a transmissive LCD described below an opaque ceramic substrate cannotbe used. The step differences 4 function as seeds for graphoepitaxy ofsingle-crystal silicon. Each step difference 4 has, for example, a depthd of 0.3 to 0.4 μm, a width w of 2 to 10 μm, and a length 1 of 10 to 20μm (in the direction perpendicular to the drawing sheet). The basilarangle defined by the bottom face and the side face is a right angle. Inorder to prevent diffusion of ions such as Na ions from the glasssubstrate, an SiN film of, for example, 50 to 200 nm thick and, asdesired, a silicon oxide film (referred to as SiO₂ film, hereinafter)of, for example, 100 nm thick may be formed on the glass substrate, inadvance of the steps described heretofore.

Subsequently, a silicon-indium melt 6 containing about 1 weight percentof silicon is applied to the substrate 1 which has been heated to atemperature of from 900 to 930° C., after removal of the photoresist 2,as shown in FIG. 57B. Alternatively, the surface of the substrate 1 iscoated with the silicon-indium melt by a dipping in which the substrate1 is dipped in the melt, a floating in which the substrate 1 is moved inor on the melt, or through a contact under by aplication of a jet of themelt or under the influence of supersonic waves.

The substrate 1 is held in this state for a period of several minutes toseveral tens of minutes, followed by a slow cooling. In case of dipping,the slow cooling is effected by slowly pulling the substrrate out of themelt. Consequently, the silicon that has been dissolved in the indiumgrows by graphoepitaxy, using the bottom corners of the step differences4 as the seeds for the growth, whereby a P-type single-crystal siliconlayer 7 of, for example, 0.1 μm, as shown in FIG. 3A. In this process,the side faces 71 a of the underlying gate electrode 71 are gentlytapered, so that these side faces do not cause impediment to theepitaxial growth on the seeds constituted by the step differences,whereby the single-crystal silicon layer 7 can grow on these side faceswithout discontinuity. Dipping or floating method permits easyadministration of factors such as the composition of the melt,temperature of the melt, and pulling rate, thus facilitating the controlof the thickness and carrier impurity concentration of the epitaxialgrowth layer.

In the single-crystal silicon layer 7 as deposited, a (100) plane isepitaxially grown on the substrate, and this is known as graphoepitaxy.With reference to FIGS. 9A and 9B, a vertical wall, such as theabove-mentioned step difference 4, is formed on the amorphous substrate1, such as a glass substrate and an epitaxial layer is formed thereon,so that the (100) plane of a single-crystal is grown along the side faceof the step difference 4 as shown in FIG. 9B, whereas a crystal havingrandom plane orientation is grown on a flat amorphous substrate 1, asshown in FIG. 9A. The size of the single-crystal grain increases inproportion to the temperature and the time: when the temperature islowered or when the time is shortened, the distance between the stepdifferences should be decreased. The orientation of the grown crystalcan be controlled by changing the shape of the step differences, asshown in FIGS. 10A to 10F. When MOS transistors are formed, the (100)plane is most frequently used. Accordingly, the step difference 4 canhave any cross-sectional shape which facilitates crystal growth, forexample, the angle at the bottom corner (basilar angle) may be a rightangle or, alternatively, the side wall may be inclined inwardly oroutwardly towards the lower end. The basilar angle of the stepdifference 4 is preferably a right angle or smaller, and the bottomcorners are preferably rounded slightly.

Subsequent to the deposition of the single-crystal silicon layer 7 onthe substrate 1 through the graphoepitaxy, the indium film 6Aprecipitating on the surface is removed b, for example, hydrochloricacid or sulfuric aci, as shown in FIG. 3. The removing treatment isconducted so as not to allow formation of a lower silicon-oxide film,whereby a bottom-gate MOSTFT having a channel region constituted by thesingle-crystal silicon layer 7 is formed in theperipheral-driving-circuit section, while a top-gate MOSTFT is formed inthe display section.

The single-crystal silicon layer 7 deposited by graphoepitaxy containsis a p-type layer due to its indium content, and the concentration ofthe P-type impurity fluctuates, so that adjustment of the specificresistance is performed by doping with p-type impurity ions such as B+at 10 kV and at a dosage of 2.7×10¹¹ atoms/cm², with the p-channelMOSTFT section masked by a photoresist (not shown in the drawing). Withreference to FIG. 3C, in order to control the concentration of theimpurity in the pMOSTFT-forming region, the nMOSTFT section is maskedwith a photoresist 60 and is doped with n-type impurity ions 65 such asP⁺ at 10 kV and at a dosage of 1×10¹¹ atoms/cm² to form an n-type well7A.

With reference to FIG. 63A, a SiO₂ film having a thickness ofapproximately 200 nm and then a SiN film having a thickness ofapproximately 100 nm are continuously deposited on the entiresingle-crystal silicon layer 7 by a plasma-enhanced CVD process, ahigh-density plasma-enhanced CVD process or a catalytic CVD process toform a gate insulating film 8, followed by a sputtering to deposit amolybdenum-tantalum (Mo—Ta) alloy film 9 of 500 to 600 nm thereon.

With reference to FIG. 63B, photoresist patterns 10 are formed in thestep difference regions (indented sections) of the TFT sections in thedisplay region of the TFT sections of the peripheral driving region byany conventional photolithographic process, and a continuous etching isexecuted, whereby gate electrodes 11 of the Mo—Ta alloy film and gateinsulating films 12 of SiN—SiO₂ are formed and the single-crystalsilicon layer 7 is exposed. The Mo—Ta alloy film 9 is etched using anacidic etchant, SiN is etched by plasma etching using CF₄ gas, and SiO₂is etched using a hydrofluoric acidic etchant.

With reference to FIG. 63C, all of the nMOSTFTs and pMOSTFTs in theperipheral driving region, as well as the gate sections of the nMOSTFTsin the display region, are covered with a photoresist 13, and theexposed source and drain regions of the nMOSTFTs are doped with, forexample, phosphorus ions 14 by ion implantation at 20 kV and at a dosageof 5×10¹³ atoms/cm² to form LDD sections 15 of an N⁻-type layer byself-alignment.

With reference to FIG. 64A, all of the pMOSTFTs in the peripheraldriving region, the gate sections of the nMOSTFTs in the peripheraldriving region, and the gate sections and the LDD sections of thenMOSTFTs in the display region are covered with a photoresist 16, andthe exposed regions are doped with phosphorus or arsenic ions 17 by ionimplantation at 20 kV and at a dosage of 5×10¹⁵ atoms/cm² to form sourcesections 18, drain sections 19 and the LDD sections 15 of an N⁺-typelayer of the nMOSTFTs.

With reference to FIG. 64B, all of the nMOSTFTs in the peripheraldriving region and the display region and the gate sections of thepMOSTFTs in the peripheral driving region are covered with a photoresist20, and the exposed regions are doped with boron ions 21 by ionimplantation at 10 kV and at a dosage of 5×10¹⁵ atoms/cm² to form sourcesections 22 and drain sections 23 of an P⁺-type layer of the pMOSTFTs.In the case of an nMOS peripheral driving circuit, this step is notnecessary since the circuit does not have a MOSTFT.

With reference to FIG. 64C, in order to island the active devicesections including TFTs and diodes and the passive device sectionsincluding resistors and inductors, photoresist layers 24 are provided onall of the active device sections and the passive device sections in theperipheral driving region and the display section, and thesingle-crystal silicon layer 7 in other sections is removed by aconventional photolithographic process or an etching process using ahydrofluoric acid solution.

With reference to FIG. 65A, a SiO₂film having a thickness ofapproximately 200 nm and then a phosphosilicate glass (PSG) film havinga thickness of approximately 300 nm are continuously deposited to form aprotective film 25 on the entire surface by a plasma-enhanced CVDprocess, a high-density plasma-enhanced CVD process or a catalytic CVDprocess.

In such a state, the single-crystal silicon layer is activated.Activation treatment is performed at approximately 1,000° C. forapproximately 10 seconds using, for example, a halogen lamp, and thegate electrode composed of the Mo—Ta alloy having a high melting pointis durable during the annealing for activation. The Mo—Ta alloy can beused not only for the gate section but also as lead lines over a widerange. In the activation, excimer laser annealing requiring high processcosts is generally not used. If excimer laser annealing is used,overlapping scanning of 90% or more is preferably performed on theentire surface or selectively the active device section and the passivedevice section using XeCl (wavelength:308 nm).

With reference to FIG. 65B, contact holes are formed for all of thesource-drain sections of the TFTs in the peripheral driving circuit andthe source sections of the TFTs in the display region, by a conventionalphotolithographic process and an etching process.

A film having a thickness of 500 to 600 nm is formed on the entiresurface, from aluminum or an aluminum alloy, e.g., an aluminum alloycontaining 1 wt % Si or 1 to 2 wt % copper and, by a conventionalphotolithographic process and an etching process, source electrodes 26of all TFTs both in the peripheral driving circuit section and thedisplay section, as well as the drain electrodes 27 in the peripheraldriving circuit section, are formed, simultaneously with the formationof data lines and gate lines. The substrate is then subjected tosintering treatment in a forming gas (N₂+H₂) at approximately 400° C.for 1 hour.

With reference to FIG. 65C, an insulating film 36 composed of a PSG filmwith a thickness of approximately 300 nm and a SiN film with a thicknessof approximately 300 nm is formed on the entire surface by aplasma-enhanced CVD process, a high-density plasma-enhanced CVD process,or a catalytic CVD process. Next, contact holes are formed for the drainsections of TFTS in the display region. It is not necessary to removethe SiO₂, PSG and SiN films in the pixel sections.

Basic requirements of a reflective liquid crystal display are to reflectthe light incident on the display towards the interior of the liquidcrystal panel and, at the same time, to scatter the light. This isbecause the direction of the incident light is uncertain whereas theposition of the observer with respect to the display is substantiallyfixed. Thus, the reflector must be designed on an assumption that pointlight sources are present at arbitrary positions. As shown in FIG. 66A,a photosensitive resin film 28 having a thickness of 2 to 3 μm is formedon the entire surface by spin coating and, as shown in FIG. 66B, anuneven pattern is formed in at least the pixel region by a conventionalphotolithographic process and an etching process so that the pixelsection has optimized reflective characteristics and viewing-anglecharacteristics, followed by a reflow to form a lower portion of thereflective face of an uneven surface 28A. At the same time, contactholes are formed in the resin for allowing contact of the drain sectionsof the display TFTs.

With reference to 66C, a sputtering film having a thickness of 400 to500 nm is deposited from aluminum or an aluminum alloy, e.g., an alloycontaining 1 wt % Si, on the entire surface, and the sputtering film atthe region other than the pixel sections is removed by a generalphotolithographic process and an etching process, thereby to form anuneven aluminum reflective sections 29 which are connected to the drainsections 19. The reflective sections 29 are used as pixel electrodes fordisplaying. Next, these are subjected to sintering at approximately 300°C. for 1 hour in a forming gas to enhance the contact. Silver or asilver alloy may be used instead of aluminum to increase thereflectance.

As described above, a single-crystal silicon layer 7 is formed byhigh-temperature graphoepitaxy using the step differences as the seeds,and an active-matrix substrate 30 integrating a display section and aperipheral-driving-circuit section is produced by forming, both in thedisplay section and in the peripheral-driving circuit section whichemploy the single-crystal silicon layer 7, top-gate nMOSLDD-TFTs andCMOS circuits which are composed of bottom-gate pMOSTFTs and bottom-gatenMOSTFTs.

With reference to FIG. 8, a method of producing a reflective liquidcrystal display using the active-matrix substrate (driving substrate) 30will now be described. Hereinafter, the active-matrix substrate isreferred to as a TFT substrate.

When a liquid crystal cell in this LCD is produced by double-sideassembly (suitable for medium to large liquid crystal panels of 2 inchesor greater), polyimide alignment films 33 and 34 are formed one surfaceof the TFT substrate 30 and on a device-mounting surface of a counterelectrode 32 having a solid indium tin oxide (ITO) electrode,respectively. The polyimide alignment films are formed by roll coatingor spin coating so that thicknesses are in a range of 50 to 100 nm andare cured at 180° C. for 2 hours.

This embodiment offers advantages substantially the same as thoseoffered by the first embodiment of the first aspect of the presentinvention.

In addition, this embodiment produces the following advantageouseffects.

The single-crystal silicon layer has higher electron or hole mobility,comparable with that of a single-crystal silicon substrate and is higherthan that of conventional amorphous or polycrystalline siliconthin-films, so that single-crystal silicon bottom-gate MOSTFTs usingthis single-crystal silicon layer can implement an integral structurecomposed of a display section and a peripheral-driving-circuit section,wherein the display section has nMOSTFTs, pMOSTFTs or cMOSTFTs with LDDstructures that offer high switching performance and low-leak currentcharacteristics, while the peripheral-driving-circuit section includescMOSTFTs, nMOSTFTs and/or pMOSTFTs which exhibit high drivingperformance, thus implementing a display panel having high imagequality, high definition, a narrow frame, a large screen and a highluminescent efficiency. Since the single-crystal silicon layer 7 hassufficiently high hole mobility, the peripheral driving circuit candrive by using only electrons or holes, or by a combination thereof, andcan be combined with the display TFTs having pMOSTFT or CMOSTFTS withLDD structures, thus realizing an integrated panel structure. In compactto medium-sized panels, one of a pair of vertical peripheral drivingcircuits may be omitted.

In compact to medium-sized panels, one of a pair of vertical peripheraldriving circuits may be omitted.

In the high-temperature heteroepitaxy, a single-crystal silicon layerhaving a variety of p-type impurity concentrations and a high mobilitycan be readily produced by controlling the factors such as ratio ofindium to silicon, shape of the step difference, substrate heatingtemperature, melt temperature, cooling rate, and N- or P-type carrierimpurities added, allowing the threshold voltage (Vth) to be readilycontrolled to reduce the resistance to facilitate high-speed operations.

A second embodiment of the fourth aspect of the present invention willbe described with reference to FIGS. 58A to 58C, 59, 60A to 60D, and 79Ato 79C.

This embodiment has, as in the case of the first embodiment, top-gateMOSTFTs in the display section and bottom-gate MOSTFTs in the peripheraldriving circuit section, but pertains to a transmissive LCD, unlike thefirst embodiment. More specifically, in this embodiment, thetransmissive LCD is produced by following the foregoing procedurestarting from the step shown in FIGS. 1A and ending at the step shown inFIG. 65B as in the first embodiment, but in the subsequent process,contact holes 19 for the drain sections of TFTs in the display sectionare formed in insulating films 25 and 36, as shown in FIG. 58A, and theunnecessary SiO₂ film, PSG film and Si film in the pixel-opening sectionare removed to improve the transmittance.

With reference to FIG. 58B, a planarization film 28B, which is composedof an acrylic photosensitive transparent resin and has a thickness of 2to 3 μm, is formed on the entire surface by spin coating etc., and thencontact holes for drains of TFTs in the displaying section (displayTFTs) are formed in the transparent resin 28B, followed by curing of thetransparent resin 28B executed under a given condition.

With reference to FIG. 58C, an ITO film having a thickness of 130 to 150nm is formed on the entire surface by sputtering, and then an ITOtransparent electrodes 41 in contact with the drain section 19 in thedisplay region are formed by photolithography and etching. Next, aheat-treatment in a forming gas at 200 to 250° C. for 1 hour isperformed to reduce the contact resistance between the drain of each TFTin the display section and the ITO and to improve the transparency ofthe ITO.

Next, a heat-treatment in a forming gas at 200 to 250° C. for 1 hour isperformed to reduce the contact resistance between the drain of each TFTin the display section and the ITO and to improve the transparency ofthe ITO.

Then, a transmissive LCD is assembled combining this TFT substrate 1with a counter substrate 32 as in the first embodiment, as shown in FIG.18. In this embodiment, however, a polarizer is provided also on the TFTsubstrate. Although transmission light runs in this transmissive LCD asshown by a solid line in the drawing, the arrangement may be such thattransmission light is available from the counter substrate 32. Althoughtransmission light runs in this transmissive LCD as shown by a solidline in the drawing, the arrangement may be such that transmission lightis available from the counter substrate 32.

An on-chip color-filter (OCCF) structure and an on-chip black (OCB)structure can be made from this transmissive LCD, as follows.

Thus, after performing the procedure starting from the step of FIG. 1Ato 3C and terminating in the step shown in FIG. 65B, contact holes arealso formed at the drain sections of the PSG-SiO₂ insulating film 25 asshown in FIG. 19A, and an aluminum embedded layer 41A for a drainelectrode is formed, followed by deposition of the SIN-PSG insulatingfilm 36.

With reference to FIG. 19B, a photoresist 61 containing a red, green orblue pigment having a thickness of 1 to 1.5 μm is formed on thecorresponding color segments and, as shown in FIG. 19C, color filterlayers 61(R), 61(G) and 61(B) are formed by a general photolithographicprocess in such a pattern as to leave the colors only at predeterminedlocations corresponding to the pixels. (OCCF structure). Contact holesare also formed at the drain sections. This embodiment excludes the useof an opaque ceramics substrates and substrates made oflow-transmissivity glass or heat-resistant resin.

With reference to FIG. 19C, a metal shading layer 43 servable as a blackmask layer is formed over the contact holes communicating with thedrains of the display TFTs and over the color filter layer, by apatterning process using a metal. For example, a molybdenum film havinga thickness of 200 to 250 nm is formed by a sputtering process and isthen patterned to form a given shape for shading the display TFTS (OCBstructure).

With reference to FIG. 19D, a planarization film 28B composed of atransparent resin is formed, and then ITO transparent electrodes 41 areformed so as to connect to the shading layer 43 through the contactholes provided in the planarization film.

The color filter 61 and the shading layer (black mask) 43 formed on thedisplay array section improves the aperture ratio of the liquid crystaldisplay panel and decreases electrical power consumption of the displaymodule including a back light.

A description will now be given of a third embodiment of the fourthaspect of the present invention.

This embodiment relates to an active-matrix reflective liquid crystaldisplay (LCD) including top-gate MOSTFTs formed of a single-crystalsilicon layer which is deposited by low-temperature graphoepitaxy froman indium-gallium-silicon or gallium-silicon melt, using as seeds stepdifferences (indents) on a glass substrate having a low distortionpoint.

In contrast to the first embodiment, the substrate 1 used in thisembodiment is a glass substrate having a low distortion point or maximumusable temperature as low as 600° C. or so, such as borosilicate glassor aluminosilicate glass, as the substrate employed in Step shown inFIG. 1A. Such a glass is inexpensive and can easily be produced in largesizes, e.g., 500 mm×600 mm×0.1 to 1.1 mm can be formed using long rolledglass. Obviously, quartz and crystallized glass may be used as well.

After forming the step differences 4 as in the preceding embdiments, amelt of indium-galliu (or of gallium) containing silicon is aplied tothe substrate 1 in the step shownin FIG. 57B.

The substrate 1 is gradually cooled so that the silicon dissolved in theindium melt is deposited by graphoepitaxy on the substrate 1 using thestep differences 4 as the seeds, whereby a single-crystal silicon layer7 having a thickness of, for example, approximately 0.1 μm is formed, asshown in FIG. 3A.

In this case also, the (100) plane of the single-crystal silicon layer 7is deposited on the substrate by epitaxy and the orientation of thecrystal layer can be controlled by changing the shape of the stepdifferences 4, as shown in FIGS. 9A to 9F.

After the deposition of the single-crystal silicon layer 7 bygraphoepitaxy on the substrate 1, indium-gallium (or gallium) at thesurface is removed by hydrochloric acid or sulfuric acid.

Then, top-gate MOSTFTs and bottom-gate MOSTFTs are formed in the displaysection and in the peripheral-driving-circuit section, respectively, byusing the single-crystal silicon layer in the same way as the firstembodiment. The structure shown in FIG. 8 may also be employed in thisembodiment.

This embodiment has the following noticeable advantages, in addition tothe advantages of the first embodiment.

This embodiment makes it possible to deposite a uniform single-crystalsilicon layer on the glass substrate 1, through a graphoepitaxyperformed at a further lowered temperature of about 300 to 600 C orabout 420 to 600 C.

This process enables the formation of the single-crystal silicon layeron an insulating substrate such as an organic substrate, other than theglass substrate, allowing the use of any inexpensive material having alow distortion point and improved physical properties as the substrate,thus facilitating production of large-size substrates. Accordingly, athin, long and rolled glass or organic substrate provided with asingle-crystal silicon layer can be produced using such a material at areduced cost and with high productivity. When the constituents in theglass substrate are diffused into the upper layer and affect thetransistor characteristics, a thin barrier layer, for example, a siliconnitride layer having a thickness of 50 to 200 nm, is preferablyprovided, in order to suppress such a diffusion.

The low-temperature graphoepitaxyenables easy formation of asingle-crystal silicon thin film having a wide variety of P-typeimpurity concentration and high electron mobility, through the controlof the factors such as the indium/gallium composition ratio of theindium-gallium film, heating temperature and cooling rate, thus offeringan easy control of the threshold value Vth to allow high-speed operationof the product device.

A description will now be given of a fourth embodiment of the fourthaspect of the present invention.

In contrast to the preceding third embodiment, this embodiment relatesto a transmissive LCD in which a single-crystal silicon layer is formedby low-temperature graphoepitaxy using an indium-gallium melt, as in thesecond embodiment.

Using the single-crystal silicon layer, the transmissive LCD is producedby the process shown in FIGS. 17A to FIG. 19D, as in the secondembodiment. Opaque ceramic substrates and opaque or translucent organicsubstrates are not suitable for the transmissive LCD.

Accordingly, this embodiment has the advantages of both the second andthird embodiments. Thus, this embodiment offers the following advantagesin addition to those produced by the first embodiment: borosilicateglass and heat-resistant organic materials which are inexpensive andfacilitate the formation of long thin rolled substrates can be used asthe substrate 1; the conductive type and Vth of the single-crystalsilicon layer can be readily adjusted by the ratio of indium to gallium;and the color filter 42 and the black mask 43 provided on the displayarray section improve the aperture ratio of the liquid crystal displaypanel and decreases electrical power consumption of the display moduleincluding a back light.

A fifth embodiment of the fourth aspect of the present invention willnow be described.

In this embodiment, the peripheral-driving-circuit section includes aCMOS driving circuit including bottom-gate-type pMOSTFTs and nMOSTFTs asin the first embodiment. The display section is of a reflective type andincludes TFTs having various gate configurations arranged in a variety ocombinations.

The display section shown in FIG. 79A includes top-gate nMOSLDD-TFTs asin the first embodiment, while the display section shown in FIG. 79Bincludes bottom-gate nMOSLDD-TFTs, whereas the display section shown inFIG. 79C includes dual-gate nMOSLDD-TFTs. These bottom-gate anddual-gate MOSTFTs can be produced by the same process for the dual-gateMOSTFTs of the peripheral-driving-circuit section, as will be describedlater, the dual-gate MOSTFT having higher driving ability and beingsuitable for high-speed switching by virtue of the presence of upper andlower gates and, furthermore, the upper or lower gate may be selectivelyused to implement a top- or bottom-gate type during operation.

In the bottom-gate MOSTFT shown in FIG. 79B, a gate electrode 71 iscomposed of, for example, molybdenum-tantalum, and a gate insulting filmis composed of a SiN film 72 and a SiO₂ film 73. A channel region and soforth using the single-crystal silicon layer are formed on the gateinsulating film as in the case of the dual-gate MOSTFT of theperipheral-driving-circuit section. The dual-gate MOSTFT shown in FIG.79C has the lower-gate section substantially the same as that in thebottom-gate MOSTFT, whereas the upper-gate section includes anupper-gate electrode 83 formed on a gate insulating film 82 composed ofa SiO₂ film and a SiN film. In all the cases, each gate section isformed in the exterior of the step difference 4 which serves as a seedfor graphoepitaxy.

A description will now be given of a method of producing theabove-mentioned bottom-gate MOSTFT and a method of producing thedual-gate MOSTFT. The method of producing the dual-gate MOSTFT in theperipheral-driving-circuit section is the same as that described beforewith reference to FIGS. 1A to 3C and FIGS. 63A to 65C and is thereforenot illustrated.

With reference to FIG. 80A, in the production of the bottom-gate MOSTFTin the display section, a molybdenum-tantalum alloy film 71 having athickness of 500 to 600 nm is formed on a substrate 1 by sputtering asin the step shown in FIG. 1A.

With reference to FIG. 80B, a photoresist 70 having a given pattern isformed by a processing which is the same as that described withreference to FIG. 1B, and the molybdenum-tantalum alloy film 71 issubjected to taper etching using the photoresist 70 as a mask to form agate electrode 71 having a trapezoidal side base 71 a with an angle of20 to 45 degrees.

With reference to FIG. 80C, the processing which is the same as thatshown in FIG. 1C is conducted in which, after the photoresist 70 isremoved, a SiN film 72 having a thickness of approximately 100 nm andthen a SiO₂ film 73 having a thickness of approximately 200 nm aredeposited on the substrate 1 including the molybdenum-tantalum alloyfilm 71, by a plasma-enhanced CVD process, thereby to form a gateinsulating film.

With reference to FIG. 80D, the same process as that described before inconnection with FIG. 2A is executed in which a photoresist 2 having agiven pattern is formed in at least the TFT-forming region, and aplurality of step differences 4 having a proper shape and size areformed in the gate insulating film and further in the substrate 1through a mask constituted by the photoresist 2, as described above. Thestep differences 4 function as seeds during graphoepitaxy of thesingle-crystal silicon layer as will be described later, and have adepth d of 0.3 to 0.4 μm, a width of 2 to 3 μm, a length of 10 to 20 μmperpendicular to the drawing sheet, and an basilar angle (between thebottom and the side wall) which is a right angle.

Then, as shown in FIG. 61A, a melt 6 of indium (or indium-gallium orgallium) containing silicon is applied as in the step shown in FIG. 2B.

Then, the same process as FIG. 3B is executed to cause graphoepitaxialgrowth of a single-crystal silicon, whereby a single-crystal siliconlayer of a thickness of, for example, 0.1 μm or so is deposited, asshown in FIG. 61B. In this process, the side faces 71 a of theunderlying gate electrode 71 are gently tapered, so that these sidefaces do not cause impediment to the epitaxial growth on the seedsconstituted by the step differences, whereby the single-crystal siliconlayer 7 can grow on these side faces without discontinuity.

Then, the film 6A of indium is removed as shown in FIG. 61C and theprocessing which is the same as that of FIG. 63C is executed in whichthe gate section of the nMOSTFTs in the display section are covered bythe photoresist 13, and source and drain regions of the nMOSTFTs leftexposed are doped by ion implantation with phosphor ions 14, whereby anLDD section 15 composed of an N-type layer is formed by self-alignment,as shown in FIG. 61D. In this process, the bottom-gate electrode 71permits easy recognition of the height differences or pattern, thusfacilitating positioning of the photoresist 13, i.e., mask alignment,thereby suppressing misalignment. In this process, the bottom-gateelectrode 71 permits easy recognition of the height differences orpattern, thus facilitating positioning of the photoresist 13, i.e., maskalignment, thereby suppressing misalignment.

With reference to FIG. 62A, the gate section and the LDD section of thenMOSTFT are covered with a photoresist 16 and the exposed region isdoped with phosphorus or arsenic ions 17 by ion implantation to form asource section 18 and a drain section 19 composed of an N⁺-type layer ofthe nMOSTFT, as in Step shown in FIG. 64A.

With reference to FIG. 62B, the entire nMOSTFT is covered with aphotoresist 20 and then doped with boron ions 21 by ion implantation toform a source section and a drain section of the p+ layer of thepMOSTFTs in the peripheral-driving-circuit section, as in Step shown inFIG. 64B.

With reference to FIG. 62C, a photoresist 24 is provided and then thesingle-crystal silicon layer is selectively removed by conventionalphotolithography and etching to island the active device section and thepassive device section, as in Step shown in FIG. 64C.

With reference to FIG. 62D, a SiO₂ film 53 having a thickness ofapproximately 300 nm and then a phosphosilicate glass (PSG) film 54having a thickness of approximately 300 nm are formed on the entiresurface by a plasma-enhanced CVD process, a high-density plasma-enhancedCVD process, or a catalytic CVD process, as in Step shown in FIG. 65A.The SiO₂ film 53 and the PSG film 54 correspond to the aforementionedprotective film 25. The single-crystal silicon layer is then subjectedto an activation treatment as described before.

With reference to FIG. 24A, contact holes are formed for the sourcesections by conventional photolithography and etching, as in Steps shownin FIG. 65B. An aluminum sputtering film having a thickness of 400 to500 nm is formed on the entire surface, and source electrodes 26 of theTFTs, data lines and gate lines are simultaneously formed byconventional photolithography and etching. The substrate is thensintered in a forming gas at approximately 400° C. for 1 hour.

With reference to FIG. 24B, an insulating film 36 composed of a PSG filmhaving a thickness of approximately 300 nm and a SiN film having athickness of approximately 300 nm is formed on the entire surface by ahigh-density plasma-enhanced CVD process or a catalytic CVD process, andcontact holes are formed at the drain sections of display TFTs, as inFIG. 65B.

With reference to FIG. 24C, a photosensitive resin film 28 having athickness of 2 to 3 μm is formed by spin coating, as in the step shownin FIG. 66A, followed by a Step shown in FIG. 24D in which an unevenpattern is formed and then subjected to reflow to form a lower portionof a reflective layer having an uneven surface 28A so that the pixelsection has optimized reflective and viewing-angle characteristics. Atthe same time, contact holes are formed in the resin for allowingcontact of the drain sections of the display TFTs.

With reference to FIG. 24D, an aluminum sputtering film having athickness of 400 to 500 nm is formed on the entire surface, as in thestep shown in FIG. 66C, and then an uneven aluminum reflective section29 connecting to the drain sections 19 of the display TFTs is formed byconventional photolithography and etching.

As described above, the resulting active-matrix substrate 30 integratesa display section and a peripheral-driving-circuit section, in which thedisplay section includes bottom-gate nMOSLDD-TFTs using thesingle-crystal silicon layer 7 formed by high-temperature graphoepitaxyon the step differences 4 as a seed, while theperipheral-driving-circuit section includes a CMOS driving circuithaving bottom-gate pMOSTFTs and bottom-gate nMOSTFTs.

FIGS. 81A to 81C show the formation of the gate insulating film of theabove-mentioned bottom-gate MOSTFT in the display section by anodicoxidation of molybdenum-tantalum.

After the step of FIG. 80B, the molybdenum-tantalum alloy film 71 issubjected to conventional anodic oxidation treatment, as shown in FIG.81A, to form on the surface a gate insulating film 74 composed of Ta₂O₅and having a thickness of 100 to 200 nm.

Next, with reference to FIG. 81B, the step differences 4 are formed anda single-crystal layer 7 is deposited thereon graphoepitaxy, asdescribed before, followed by execution of processing similar to thoseof FIGS. 22E to 24C to form an active matrix substrate 30 as shown inFIG. 25C.

When the dual-gate MOSTFTs are produced in the display section, theprocesses are executed in the same way as that described before.

More specifically, with reference to FIG. 26A, step differences 4 areformed in the substrate 1 through the insulating films 72 and 73, andthen a single-crystal silicon layer 7 is deposited by graphoepitaxy onthe step differences 4 as a seed. Next, a step which is the same as thatshown in FIG. 63A is executed so that a SiO₂ film having a thickness ofapproximately 200 nm and then a SiN film having a thickness ofapproximately 100 nm are successively formed on the entire surface ofthe single-crystal silicon layer 7 by a plasma-enhanced CVD process or acatalytic CVD process, thereby to form an insulating film 80corresponding to the insulating film 8. Then, a molybdenum-tantalumalloy film 81 having a thickness of 500 to 600 nm, corresponding to thesputtering film 9, is formed by sputtering.

With reference to FIG. 26B, processing which is the same as that shownin FIG. 63B is executed: namely, a photoresist pattern 10 is formed andis subjected to continuous etching to form a top-gate electrode 82(corresponding to the gate electrode 12) composed of themolybdenum-tantalum alloy and a gate insulating film (corresponding tothe gate insulating film 11), thereby exposing the single-crystalsilicon layer 7.

With reference to FIG. 26C, the same processing as that shown in FIG.63C is executed: namely, the top-gate section of the nMOSTFT is coveredwith a photoresist 13, and the exposed source and drain regions of thenMOSTFT for display are doped with phosphorus ions 14 by ionimplantation to form an N⁻-type LDD section 15.

With reference to FIG. 26D, the same processing as that shown in FIG.64A is executed: namely, the gate section and the LDD section of thenMOSTFT are covered with a photoresist 16, and the exposed region isdoped with phosphorus or arsenic ions 17 by ion implantation, thereby toform a source section 18 and a drain section 19 of nMOSTFT composed ofan N⁺-type layer.

With reference to FIG. 27A, the same processing as that shown in FIG.64B is performed: namely, the gate section of the pMOSTFT is coveredwith a photoresist 20 and the exposed region is doped with boron ions 21by ion implantation to form a source section and a drain section of thepMOSTFT composed of a P⁺-layer in the peripheral-driving-circuitsection.

With reference to FIG. 27B, the same processing as that shown in FIG.64C is executed: namely, a photoresist layer 24 is provided and thesingle-crystal silicon layer is selectively removed at portions otherthan the active and passive device sections by conventionalphotolithography and etching, thereby to island the active devicesection and the passive device section.

With reference to FIG. 27C, the same process as that shown in FIG. 65Ais performed: namely, a SiO₂ film 53 having a thickness of approximately200 nm and a phosphosilicate glass (PSG) glass 54 having a thickness ofapproximately 300 nm are formed on the entire surface by aplasma-enhanced CVD process, a high-density plasma-enhanced CVD process,or a catalytic CVD process. These films 53 and 54 correspond to theaforesaid protective film 25. Then, an activation treatment is effectedon the single-crystal silicon layer 7.

With reference to FIG. 27D, the same processing as that shown in FIG.65B is executed: namely, contact holes are formed for the sourcesections. An aluminum sputtering film having a thickness of 400 to 500nm is formed on the entire surface, and then source electrodes 26, datalines and gate lines are simultaneously formed by conventionalphotolithography and etching.

With reference to FIG. 28A, the same processing as that shown in FIG.65C is executed: namely, an insulating film 36 including a PSG filmhaving a thickness of approximately 300 nm and a SiN film having athickness of approximately 300 nm is formed on the entire surface, andcontact holes are formed for the drain sections of the display TFTs.

With reference to FIG. 28B, a photosensitive resin film 28 having athickness of 2 to 3 μm is formed on the entire surface by, for example,spin coating. With reference to FIG. 28C, Steps which are the same asthose of FIGS. 66B and 66C are performed: namely, a lower portion of areflective face comprising an uneven surface 28A is formed in at leastthe pixel section, contact holes are formed for the drain sections ofthe display TFTs, and an uneven aluminum reflective section 29connecting to the drain sections 19 of the display TFTs are formed sothat optimum reflective and viewing-angle characteristics are achieved.

The resulting active-matrix substrate 30 integrates a display sectionand a peripheral-driving-circuit section, in which the display sectionincludes dual-gate nMOSLDD-TFTs and the peripheral-driving-circuitsection includes a CMOS driving circuit having bottom-gate nMOSTFTs andbottom-gate pMOSTFTs, wherein these TFTs are formed by using thesingle-crystal silicon layer 7 deposited by high-temperaturegraphoepitaxy on the step differences 4 as seeds.

The fourth aspects of the present invention can be carried out invarious other forms.

For instance, an electrooptical device or a driving substrate can beimplemented in accordance with the fourth aspect of the presentinvention, such that the gate electrode at the top gate section iscomposed of a material having relatively low thermal resistance, such asaluminum, an aluminum alloy, e.g., aluminum alloy containing 1 wt % ofsilicon or 1 to 2 wt % of copper, or copper. This embodiment can becarried out substantially in the same way as the eighth embodiment ofthe third aspect of the invention described before.

Further, the TFTs may be formed at the exterior of the step differences,rather than in the step differences, as in the ninth embodiment of thethird aspect of the present invention.

Likewise, as in the tenth embodiment of the first aspect of the presentinvention, a self-alignment type LDD-TFT, for example, a double-gateMOSTFT including a plurality of top-gate MOSLDD-TFTs, can be implementedin accordance with the fourth aspect of the present invention.

It is also possible to implement an electrooptical device such that, asin the eleventh embodiment of the first aspect of the present invention,one of the upper and lower-gate sections of a dual-gate type nMOSTFT isused in a transistor operation, whereas the other operates in a specificmanner.

Further, a variety of combinations of TFTS may be employed in thedisplay section and the peripheral-driving-circuit section, as in thecase of the twelfth embodiment of the third aspect which was describedbefore with reference to FIGS. 70 to 78.

Although the invention has been described through its preferred forms,it is to be understood that the described embodiments are not exclusiveand various changes and modifications may be imparted thereto within thescope of the present invention which is limited solely by the appendedclaims.

What is claimed is:
 1. A method of producing an electrooptical devicehaving a first substrate carrying a display section provided with pixelelectrodes and a peripheral-driving-circuit section provided on aperiphery of the display section, a second substrate, and an opticalmaterial disposed between the first substrate and the second substrate;the method comprising the steps of: a gate-forming step for forming agate portion including a gate electrode and a gate insulating film onone face of said first substrate; a step-forming step for forming a stepdifference on said one face of the first substrate; a layer-forming stepfor forming a polycrystalline or amorphous silicon layer having apredetermined thickness on the first substrate having the gate portionand the step difference and then forming a low-melting-point metal layeron or under the polycrystalline or amorphous silicon layer, or offorming a low-melting-point metal layer containing silicon on the firstsubstrate having the step difference; a heating step for dissolvingsilicon of the polycrystalline or amorphous layer or of thelow-melting-point metal layer into said low-melting-point metal layer byheating; a deposition step for depositing on said first substrate asingle-crystal silicon layer by allowing the silicon of saidpolycrystalline or amorphous silicon layer or of the low-melting-pointmetal layer to grow by graphoepitaxy by a cooling treatment using as aseed the step difference on the substrate; a step for effecting apredetermined treatment on said single-crystal silicon layer, therebyforming a channel region, a source region and a drain region; and a stepfor forming a first thin-film transistor of dual-gate type having thegate portions on the above and below said channel region andconstituting at least part of said peripheral-driving-circuit section.2. A method of producing an electrooptical device according to claim 1,wherein the step difference is formed as an indented section so that across-sectional side face is perpendicular to the bottom face or slantedto the bottom face, and the step difference is used as a seed forgraphoepitaxy of the single-crystal silicon layer.
 3. A method ofproducing an electrooptical device according to claim 1, wherein thepolycrystalline or amorphous silicon layer is formed by alow-temperature deposition process and the low-melting-point metal layeris deposited thereon or thereunder, or the low-melting-point metal layercontaining the silicon is deposited, followed by the heating and coolingsteps.
 4. A method of producing an electrooptical device according toclaim 1, wherein the first substrate comprises one of a glass substrateand a heat-resistant organic substrate, and the low-melting-point metallayer comprises at least one metal selected from the group consisting ofindium, gallium, tin, bismuth, lead, zinc, antimony, and aluminum.
 5. Amethod of producing an electrooptical device according to claim 4,wherein, when the low-melting-point metal layer comprises indium, theheating step is performed in a hydrogen atmosphere at a temperature of850 to 1,100° C. and, when the low-melting-point metal layer comprisesan indium-gallium alloy, at a temperature of 300 to 1,100° C., whereas,when the low-melting-point metal layer comprises gallium, at atemperature of 400 to 1,100° C.
 6. A method of producing anelectrooptical device according to claim 1, wherein a diffusion-barrierlayer is formed on the first substrate, and the polycrystalline oramorphous silicon layer or the low-melting-point metal layer containingthe silicon is formed on said diffusion barrier layer.
 7. A method ofproducing an electrooptical device according to claim 1, wherein a GroupIII or V element is introduced into the polycrystalline or amorphoussilicon layer or the low-melting-point metal layer containing thesilicon material in the layer-forming step so as to control the type andthe concentration of the impurity in the single-crystal silicon layer.8. A method of producing an electrooptical device according to claim 1,wherein an upper gate portion having a gate insulating film and a gateelectrode is formed on the deposited single-crystal silicon layer, andintroducing the Group III or V element while using said upper gateportion as a mask, thereby forming said channel region, said sourceregion and said drain region.
 9. A method of producing an electroopticaldevice according to claim 1, wherein the step difference is formed insaid first substrate and/or a film formed on the first substrate, andthe first thin-film transistor is formed on at least one of the interiorand the exterior of the indented section formed by the step difference.10. A method of producing an electrooptical device according to claim 1,wherein the step difference is formed along at least one side of adevice region including the channel region, the source region and thedrain region of the first thin-film transistor.
 11. A method ofproducing an electrooptical device according to claim 1, wherein saidgate electrode underlying said single-crystal silicon layer is taperedat its side edges so as to form a trapezoidal shape.
 12. A method ofproducing an electrooptical device according to claim 1, wherein thesingle-crystal silicon layer deposited in the depositing step is dopedwith a Group III or V impurity to form the channel region, the sourceregion, and the drain region.
 13. A method of producing anelectrooptical device according to claim 1, wherein theperipheral-driving-circuit section further comprises at least one of atop-gate thin-film transistor, a bottom-gate thin-film transistor and adual-gate thin-film transistor, each having a channel region of apolycrystalline or amorphous silicon layer and a gate region formedabove or below the channel region, or comprises at least one of a diode,a resistor, a capacitor and an inductor, each comprising thesingle-crystal, polycrystalline or amorphous silicon layer.
 14. A methodof producing an electrooptical device according to claim 1, furthercomprising a switching device provided on said first substrate forswitching the pixel electrodes of said display section.
 15. A method ofproducing an electrooptical device according to claim 14, wherein thefirst thin-film transistor comprises at least the dual-gate type among atop-gate type having a gate section above the channel region, abottom-gate type having a gate section below the channel region, and adual-gate type having one gate section above and one below the channelregion, and the switching device comprises one of a top-gate secondthin-film transistor, a bottom-gate second thin-film transistor and adual-gate second thin-film transistor.
 16. A method of producing anelectrooptical device according to claim 15, wherein when the secondthin-film transistor is a bottom-gate or dual-gate type, a lowerelectrode of a heat-resistant material is provided below the channelregion, and a gate insulating film is formed on the gate electrode toform a lower gate section, and the second thin-film transistor is formedby the same process including the step-forming step as that for thefirst thin-film transistor.
 17. A method of producing an electroopticaldevice according to claim 15, wherein after the single-crystal siliconlayer is formed on the lower gate section, the single-crystal siliconlayer is doped with a Group III or V impurity to form the source regionand the drain region, followed by an activation treatment.
 18. A methodof producing an electrooptical device according to claim 15, whereinsource and drain regions of the first and second thin-film transistorsare formed by ion implantation of the impurity through a resist maskafter forming the single-crystal silicon layer, the activation treatmentis performed, a gate insulating film is formed, and then a gateelectrode of the first thin-film transistor and optionally an upper gateelectrode of the second thin-film transistor are formed.
 19. A method ofproducing an electrooptical device according to claim 15, wherein, whenthe second thin-film transistor is a top-gate type, the source regionand the drain region of each of the first thin-film transistor and thesecond thin-film transistor are formed by ion implantation of animpurity element through a resist mask after the formation of thesingle-crystal silicon layer, an activation treatment is performed, andthen gate sections including gate insulating films and gate electrodesof the first thin-film transistor and the second thin-film transistorare formed.
 20. A method of producing an electrooptical device accordingto claim 15, wherein, when the thin-film transistor is the top-gatetype, gate sections including gate insulating films and gate electrodesof the first thin-film transistor and the second thin-film transistorare formed after the formation of the single-crystal silicon layer, thesource regions and the drain regions of the first thin-film transistorand the second thin-film transistor are formed by ion implantation of animpurity element through the gate sections and resists as masks, andthen an activation treatment is performed.
 21. A method of producing anelectrooptical device according to claim 15, wherein thin-filmtransistors in the peripheral-driving-circuit section and the displaysection comprise n-channel, p-channel or complementary insulating-gatefield-effect transistors.
 22. A method of producing an electroopticaldevice according to claim 21, wherein the thin-film transistors in theperipheral-driving-circuit section are formed by a combination of acomplementary type and an n-channel type, a combination of acomplementary type and a p-channel type, or a combination of acomplementary type, an n-channel type and a p-channel type thin-film.23. A method of producing an electrooptical device according to claim15, wherein at least a part of the thin-film transistors in theperipheral-driving-circuit section and the display section has alightly-doped drain (LDD) structure of a single type having a LDDsection between the gate and the source or drain or of a double typehaving LDD sections between the gate and source and between the gate andthe drain.
 24. A method of producing an electrooptical device accordingto claim 23, wherein the resist mask used when the LDD structure isformed is left unremoved and the ion implantation for forming the sourceregion and the drain region is performed through a resist mask thatcovers the remaining resist mask.
 25. A method of producing anelectrooptical device according to claim 15, wherein the step differenceis formed on one surface of the first substrate, a single-crystal,polycrystalline, or amorphous silicon layer is formed on the surfacehaving the step difference, and the second thin-film transistor isformed to have a channel region, a source region, and a drain regionconstituted by the single-crystal, polycrystalline, or the amorphoussilicon layer, with at least one gate section provided above and/orbelow the single-crystal, polycrystalline, or the amorphous siliconlayer.
 26. A method of producing an electrooptical device according toclaim 25, wherein the thin-film transistor of saidperipheral-drive-circuit section is constituted by said first thin-filmtransistor of the n-channel type, p-channel type or complementary type,while said thin-film transistor of said display section is of then-channel type, p-channel type or the complementary type when saidsingle-crystal silicon layer is used as the channel region, n-channeltype, p-channel type or the complementary type when said polycrystallinesilicon layer is used as the channel region, and n-channel type,p-channel type or the complementary type when said amorphous siliconlayer is used as the channel region.
 27. A method of producing anelectrooptical device according to claim 25, wherein the step differenceforms an indented section having a cross-section in which a side face isperpendicular to or slanted to the bottom face, and the step differencefunctions as a seed for graphoepitaxy of the single-crystal siliconlayer.
 28. A method of producing an electrooptical device according toclaim 24, wherein source or drain electrodes of the first and/or secondthin-film transistors are formed in a region including the stepdifference.
 29. A method of producing an electrooptical device accordingto claim 25, wherein the step difference is formed on at least one ofthe first substrate and a film formed on the first substrate, and thesecond thin-film transistor is formed on at least one of the interiorand the exterior of the indented section formed by the step difference.30. A method of producing an electrooptical device according to claim25, wherein at least one of the type and the concentration of a GroupIII or V impurity in the single-crystal, polycrystalline or amorphoussilicon layer is controlled.
 31. A method of producing an electroopticaldevice according to claim 25, wherein the step difference is formedalong at least one side of a device region including the channel region,the source region and the drain region of the second thin-filmtransistor.
 32. A method of producing an electrooptical device accordingto claim 25, wherein a gate electrode below the single-crystal,polycrystalline or amorphous silicon layer is tapered at its side edgesto have a trapezoidal form.
 33. A method of producing an electroopticaldevice according to claim 25, wherein a diffusion-barrier layer isprovided between the first substrate and the single-crystal,polycrystalline or amorphous silicon layer.
 34. A method of producing anelectrooptical device according to claim 1, wherein the first substrateis one of a glass substrate and a heat-resistant organic substrate. 35.A method of producing an electrooptical device according to claim 1,wherein the first substrate is optically opaque or transparent.
 36. Amethod of producing an electrooptical device according to claim 1,wherein the pixel electrodes are provided for a reflective ortransmissive display.
 37. A method of producing an electrooptical deviceaccording to claim 1, wherein the display section comprises a laminatedconfiguration having the pixel electrodes and a color filter layer. 38.A method of producing an electrooptical device according to claim 1,wherein, when the pixel electrodes are reflective electrodes, unevennessis formed on a resin film and said pixel electrodes are provided on saidresin having the unevenness and, when the pixel electrodes aretransparent electrodes, the surface is planarized by a transparentplanarization film and the pixel electrodes are formed on the planarizedplane.
 39. A method of producing an electrooptical device according toclaim 14, wherein the display section is illuminated or dimmed bydriving the switching device.
 40. A method of producing anelectrooptical device according to claim 14, wherein a plurality of thepixel electrodes are arranged in a matrix in the display section and aswitching device is connected to each of the plurality of pixelelectrodes.
 41. A method of producing an electrooptical device accordingto claim 1, wherein the display section comprises one of a liquidcrystal display, an electroluminescent display, a field emissiondisplay, a light-emitting polymer display, and a light-emitting diodedisplay.